Patents by Inventor Shinichiro Furuse

Shinichiro Furuse has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10374108
    Abstract: A photovoltaic device includes: a silicon substrate having a front surface having a texture; and an amorphous silicon layer having an uneven surface corresponding to the texture, wherein the amorphous silicon layer is amorphous in peak portions and slope portions extending between the peak portions and valley portions of the uneven surface, and has crystalline regions which grow, in a pillar manner, approximately perpendicularly from a substrate surface of the silicon substrate in the valley portions, the crystalline regions being discretely present along upper ends of the valley portions, the upper ends being opposite lower ends of the valley portions, the lower ends being in contact with the silicon substrate, wherein coverage of the crystalline regions in the valley portions is higher than coverage of amorphous regions in the valley portions.
    Type: Grant
    Filed: September 12, 2017
    Date of Patent: August 6, 2019
    Assignee: Panasonic Intellectual Property Management Co., Ltd.
    Inventor: Shinichiro Furuse
  • Publication number: 20180006168
    Abstract: A photovoltaic device includes: a silicon substrate having a front surface having a texture; and an amorphous silicon layer having an uneven surface corresponding to the texture, wherein the amorphous silicon layer is amorphous in peak portions and slope portions extending between the peak portions and valley portions of the uneven surface, and has crystalline regions which grow, in a pillar manner, approximately perpendicularly from a substrate surface of the silicon substrate in the valley portions, the crystalline regions being discretely present along upper ends of the valley portions, the upper ends being opposite lower ends of the valley portions, the lower ends being in contact with the silicon substrate, wherein coverage of the crystalline regions in the valley portions is higher than coverage of amorphous regions in the valley portions.
    Type: Application
    Filed: September 12, 2017
    Publication date: January 4, 2018
    Inventor: Shinichiro FURUSE
  • Patent number: 8181823
    Abstract: A pouch and a production method for a spout pouch container are provided, which suppress curling of an opened spout attachment edge portion and offset of a filling port defining edge portion adjacent to the spout attachment edge portion when a spout is heat-sealed to the spout attachment edge portion. The pouch (10) is of a bottom gusset type, which includes a pair of front and rear exterior sheets (11, 12) and a gusset sheet (13) folded inward from lower portions of the exterior sheets (11, 12) to define a bottom gusset portion.
    Type: Grant
    Filed: April 15, 2005
    Date of Patent: May 22, 2012
    Assignee: Fuji Seal International, Inc.
    Inventors: Takashi Fukuizumi, Shinichiro Furuse, Kazuya Takagi, Osao Ueda
  • Publication number: 20070257047
    Abstract: A pouch and a production method for a spout pouch container are provided, which suppress curling of an opened spout attachment edge portion and offset of a filling port defining edge portion adjacent to the spout attachment edge portion when a spout is heat-sealed to the spout attachment edge portion. The pouch (10) is of a bottom gusset type, which includes a pair of front and rear exterior sheets (11, 12) and a gusset sheet (13) folded inward from lower portions of the exterior sheets (11, 12) to define a bottom gusset portion.
    Type: Application
    Filed: April 15, 2005
    Publication date: November 8, 2007
    Applicant: Fuji Seal International, Inc.
    Inventors: Takashi Fukuizumi, Shinichiro Furuse, Kazuya Takagi, Osao Ueda