Patents by Inventor Shinichiro Saisho

Shinichiro Saisho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11021783
    Abstract: An apparatus is provided, comprising: a film formation chamber; a substrate holder provided in the film formation chamber and holding a substrate (S) to be formed with a film; a decompressor configured to reduce a pressure in the film formation chamber to a predetermined pressure; a discharge gas introducer configured to introduce a discharge gas into the film formation chamber; two or more sputtering electrodes each provided with a target (T1, T2) to be a film-forming material, the sputtering electrodes facing the substrate as a single substrate; a DC power source configured to supply electric power to the sputtering electrodes; two or more pulse-wave conversion switches connected between the DC power source and the sputtering electrodes, the pulse-wave conversion switches each being configured to convert a DC voltage to be applied to each of the sputtering electrodes to a pulse-wave voltage; a programmable transmitter configured to be programmable with a pulse generation control signal pattern corresponding
    Type: Grant
    Filed: April 20, 2018
    Date of Patent: June 1, 2021
    Assignee: SHINCRON CO., LTD.
    Inventor: Shinichiro Saisho
  • Publication number: 20200040440
    Abstract: An apparatus is provided, comprising: a film formation chamber; a substrate holder provided in the film formation chamber and holding a substrate (S) to be formed with a film; a decompressor configured to reduce a pressure in the film formation chamber to a predetermined pressure; a discharge gas introducer configured to introduce a discharge gas into the film formation chamber; two or more sputtering electrodes each provided with a target (T1, T2) to be a film-forming material, the sputtering electrodes facing the substrate as a single substrate; a DC power source configured to supply electric power to the sputtering electrodes; two or more pulse-wave conversion switches connected between the DC power source and the sputtering electrodes, the pulse-wave conversion switches each being configured to convert a DC voltage to be applied to each of the sputtering electrodes to a pulse-wave voltage; a programmable transmitter configured to be programmable with a pulse generation control signal pattern corresponding
    Type: Application
    Filed: April 20, 2018
    Publication date: February 6, 2020
    Applicant: Shincron Co., Ltd.
    Inventor: Shinichiro SAISHO
  • Publication number: 20180135657
    Abstract: Provided is an oil diffusion pump equipped with an oil vapor generator capable of eliminating a problem that arises when a heater wire is used as a heating source for a hydraulic oil. The oil diffusion pump is a vacuum pump in which an oil vapor generator (70) is arranged in a casing (51) and operated to vaporize a hydraulic oil (8) and produce oil vapor, and this oil vapor is sprayed from a jet (53, 53a) to exhaust an intake air. The oil vapor generator (70) comprises a tubular case (71) (object to be heated) extending in an upright direction, an induction coil (75) wound around the tubular member (71) via an insulating material (73), and a power supply means for applying an alternating current to the induction coil (75). The case (71) and the coil (75) are installed in the casing so as to be immersed in the hydraulic oil (8) stored in the casing (51).
    Type: Application
    Filed: June 24, 2014
    Publication date: May 17, 2018
    Inventor: Shinichiro Saisho
  • Patent number: 9933159
    Abstract: Provided is an oil diffusion pump equipped with an oil vapor generator capable of eliminating the problems occurring when a heater wire is used as a heating source for an operating oil. The present invention is a vacuum pump for which an oil vapor generator (70) is arranged within a casing (51) and this oil vapor generator is operated to vaporize an operating oil (8), thereby producing oil vapor and this oil vapor is sprayed from a jet (53, 53a) to exhaust intake air. The oil vapor generator (70) is equipped with: a container (71, 72) in the interior of which oil is stored, with the lower end of the tubular member (71), which comprises a material to be heated, being closed; and induction coil (75) wrapped around the atmosphere-side perimeter of the tubular member (71) (in particular, the case inner wall (71b)) with an insulating material (73) therebetween; and a power supply means that applies a low-frequency alternating current of several tens of Hz to several hundreds of Hz to the induction coil (75).
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: April 3, 2018
    Assignee: SHINCRON CO., LTD.
    Inventor: Shinichiro Saisho
  • Publication number: 20160037587
    Abstract: Provided is an oil diffusion pump equipped with an oil vapor generator capable of eliminating the problems occurring when a heater wire is used as a heating source for an operating oil. The present invention is a vacuum pump for which an oil vapor generator (70) is arranged within a casing (51) and this oil vapor generator is operated to vaporize an operating oil (8), thereby producing oil vapor and this oil vapor is sprayed from a jet (53, 53a) to exhaust intake air. The oil vapor generator (70) is equipped with: a container (71, 72) in the interior of which oil is stored, with the lower end of the tubular member (71), which comprises a material to be heated, being closed; and induction coil (75) wrapped around the atmosphere-side perimeter of the tubular member (71) (in particular, the case inner wall (71b)) with an insulating material (73) therebetween; and a power supply means that applies a low-frequency alternating current of several tens of Hz to several hundreds of Hz to the induction coil (75).
    Type: Application
    Filed: March 14, 2013
    Publication date: February 4, 2016
    Inventor: Shinichiro Saisho
  • Patent number: 6287430
    Abstract: The present invention is drawn to an apparatus for forming a thin film. The apparatus includes a vacuum chamber; a vacuum apparatus connected to the vacuum chamber; a holder placed in the vacuum chamber, which holder holds a substrate and is rotated by means of a rotating mechanism; a plasma CVD apparatus; and a sputtering apparatus, wherein the plasma CVD apparatus and the sputtering apparatus are placed in a single vacuum chamber and a thin film having an medium refractive index is formed on the substrate held by the holder, by means of the plasma CVD apparatus and the sputtering apparatus. The method making use of such an apparatus is also disclosed.
    Type: Grant
    Filed: December 21, 1999
    Date of Patent: September 11, 2001
    Assignee: Shincron Co., Ltd.
    Inventors: Shigeharu Matsumoto, Kazuo Kikuchi, Yizhou Song, Takeshi Sakurai, Shinichiro Saisho
  • Patent number: 5414506
    Abstract: A method of measuring the refractive index of a thin film is composed the steps of: (a) forming a dielectric thin film which is transparent, uniform and geometrically and optically identical, on each of a first substrate and a second substrate, with the refractive indexes of the first substrate and the second substrate being different; and (b) measuring the reflectivities of the first and second substrates, each bearing the dielectric thin film thereon, with the application of a light with an identical wavelength to the two substrates, thereby measuring the refractive index of the dielectric thin film.
    Type: Grant
    Filed: August 31, 1993
    Date of Patent: May 9, 1995
    Assignee: Shincron Co., Ltd.
    Inventors: Shinichiro Saisho, Toshinobu Ikeda, Akira Odagiri