Abstract: An exposure method includes the steps of: detecting an alignment mark of a work W and an alignment mark of a mask M by an alignment camera 152; calculating a positional shift amount between the mask M and the work W and a distortion amount of the work W, based on a shift amount between both the alignment marks detected by the alignment camera 152; adjusting an alignment between the work W and the mask M, based on the calculated positional shift amount; and correcting a curvature of a plane mirror 166 for reflecting a light beam of exposure light from a light source 161, based on the calculated distortion amount, at the same timing as the alignment adjustment step or at a different timing from the alignment adjustment step.