Patents by Inventor Shinichirou Yanaka

Shinichirou Yanaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10557941
    Abstract: To inspect a positioning machine by a laser tracking interferometer that tracks a retroreflector using a laser beam, the positioning accuracy of the positioning machine is evaluated by comparing a distance ?dij,C with a distance ?dij,L measured by the laser tracking interferometer, the distance ?dij,C being acquired by orthogonal projection of the position vectors of measurement points pi and pj measured by the positioning machine to the straight line gk passing through the rotation center M of the laser tracking interferometer.
    Type: Grant
    Filed: June 23, 2017
    Date of Patent: February 11, 2020
    Assignee: MITUTOYO CORPORATION
    Inventors: Shinichirou Yanaka, Masayuki Nara
  • Publication number: 20180038960
    Abstract: To inspect a positioning machine by a laser tracking interferometer that tracks a retroreflector using a laser beam, the positioning accuracy of the positioning machine is evaluated by comparing a distance ?dij,C with a distance ?dij,L measured by the laser tracking interferometer, the distance ?dij,C being acquired by orthogonal projection of the position vectors of measurement points pi and pj measured by the positioning machine to the straight line gk passing through the rotation center M of the laser tracking interferometer.
    Type: Application
    Filed: June 23, 2017
    Publication date: February 8, 2018
    Applicant: MITUTOYO CORPORATION
    Inventors: Shinichirou YANAKA, Masayuki NARA
  • Patent number: 7388674
    Abstract: A laser tracking interferometer directs a laser beam to a retroreflector serving as an object to be measured to sense a displacement of the retroreflector using interference with a laser beam back reflected from the retroreflector. The laser tracking interferometer includes: a reference sphere; a carriage that rotates about a center of the reference sphere; a laser interferometer; a displacement gage for providing a displacement signal corresponding to a relative displacement between the reference sphere and the displacement gage; a data processing apparatus for computing a displacement of the retroreflector; a position sensitive detector for providing a position signal corresponding to deviation of a laser beam; and a controller for controlling rotation of the carriage based on the position signal so that the amount of deviation becomes zero.
    Type: Grant
    Filed: July 19, 2006
    Date of Patent: June 17, 2008
    Assignee: Mitutoyo Corporation
    Inventors: Shinichirou Yanaka, Makoto Abe, Shinichi Hara, Naoyuki Taketomi
  • Publication number: 20070024861
    Abstract: A laser tracking interferometer; a carriage rotatable about a center of the reference sphere; a laser interferometer that provides a retroreflector displacement signal, and a displacement gage that provides a displacement signal. A data processing apparatus computes displacement of the retroreflector with respect to the reference sphere. A position sensitive detector provides a position signal corresponding to the amount of deviation of a laser beam when the laser beam is reflected off the retroreflector back into the laser interferometer and deviated in a direction orthogonal to its optical axis. A controller controls rotation of the carriage based on the position signal from the position detector so that the amount of deviation becomes zero.
    Type: Application
    Filed: July 19, 2006
    Publication date: February 1, 2007
    Applicant: MITUTOYO CORPORATION
    Inventors: Shinichirou Yanaka, Makoto Abe, Shinichi Hara, Naoyuki Taketomi
  • Patent number: 6797911
    Abstract: An electric discharge machining electrode adapted to improve the quality of a finished surface of an article by increasing a machining speed by improving the electric discharge generation rate &eegr; even in a fine machining process; and by rendering it possible to maintain constant the electric discharge generation rate &eegr; even when a time width and a voltage of the electric discharge pulses are reduced. In an electrode used in the electric discharge machining process carried out by generating electric discharge pulses between the electrode and an article, a radioactive metal is contained in the portion of the electrode in which the electric discharge pulses occur, or in the portion thereof which is in the vicinity of the portion in which the electric discharge pulses occur.
    Type: Grant
    Filed: February 18, 2004
    Date of Patent: September 28, 2004
    Assignee: Mitutoyo Corporation
    Inventors: Sotomitsu Hara, Shinichirou Yanaka
  • Publication number: 20040164054
    Abstract: An electric discharge machining electrode adapted to improve the quality of a finished surface of an article by increasing a machining speed by improving the electric discharge generation rate &eegr; even in a fine machining process; and by rendering it possible to maintain constant the electric discharge generation rate &eegr; even when a time width and a voltage of the electric discharge pulses are reduced. In an electrode used in the electric discharge machining process carried out by generating electric discharge pulses between the electrode and an article, a radioactive metal is contained in the portion of the electrode in which the electric discharge pulses occur, or in the portion thereof which is in the vicinity of the portion in which the electric discharge pulses occur.
    Type: Application
    Filed: February 18, 2004
    Publication date: August 26, 2004
    Applicant: MITUTOYO CORPORATION
    Inventors: Sotomitsu Hara, Shinichirou Yanaka