Patents by Inventor Shinishi Ito

Shinishi Ito has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming a mask on a semiconductor substrate via photosensitive resin deposition, ammonia treatment and selective silylation
    Patent number: 5407786
    Abstract: A photosensitive organic resin layer is formed on a semiconductor substrate. The resin layer is treated with ammonia before or after the resin layer is exposed. Then, the exposed organic resin layer is easily silylated. Due to the ammonia treatment, non-exposed portions of the organic resin layer is hardly silylated so that a high aspect ratio of patterning is realized.
    Type: Grant
    Filed: December 14, 1992
    Date of Patent: April 18, 1995
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Shinishi Ito, Haruo Okano, Makoto Nakase