Abstract: Methods for selective etching of one layer or material relative to another layer or material adjacent thereto. In an example, a SiGe layer is etched relative to or selective to another silicon containing layer which either contains no germanium or geranium in an amount less than that of the target layer.

Abstract: Disclosed is a method for controlling the Young’s modulus of a three-dimensional tissue containing cells and an extracellular matrix by adjusting the average diameter of an extracellular matrix in production of the three-dimensional tissue.

Abstract: The present invention relates to a cell structure including cells containing at least hepatocytes and vascular endothelial cells, and extracellular matrix component, wherein the extracellular matrix components are disposed between the cells, and a liver sinusoidal network is provided between the cells.

Abstract: A method of assessing a possibility of cancerization including culturing a cell structure including normal cells and having a vascular network structure in a presence of a biological specimen from a subject, and assessing a possibility of cancerization in the subject based on a state of vessels in the cell structure after the culturing. The biological specimen is a body fluid specimen from the subject, a cell extract of cells from the subject, or a culture supernatant of cells from the subject, and the possibility of cancerization is assessed as high in the subject when a number of cells forming the vessels in the cell structure is larger than a number of cells cultured in an absence of the body fluid specimen, or when the vascular network structure in the cell structure extends.

Abstract: Provided is a cell structure including: a connective tissue structure; and an epithelial structure placed on the connective tissue structure, in which the connective tissue structure contains a fragmented extracellular matrix component and first cells including mesenchymal cells, at least a part of the fragmented extracellular matrix component is placed between the first cells, and the epithelial structure contains epithelial cells.

Abstract: Disclosed is a cell structure comprising: a fragmented extracellular matrix component; and cells, wherein the cell structure comprises an intercellular vascular network, and the cells comprise at least adipocytes and vascular endothelial cells.

Abstract: The present invention relates to an extracellular matrix-containing composition containing a fragmented extracellular matrix component and a compound bound or adsorbed to the fragmented extracellular matrix component.

Abstract: A method may comprises bringing cells suspended in an aqueous medium into contact with a plurality of fragmented collagen pieces and, after the cells brought into contact with the plurality of fragmented collagen pieces and the plurality of fragmented collagen pieces are concentrated, culturing the cells brought into contact with the fragmented collagen pieces, with the plurality of fragmented collagen pieces, to form a three-dimensional tissue.

Abstract: Embodiments provide a non-plasma etch, such as a gas-phase and/or remote plasma etch, of titanium-containing material layers with tunable selectivity to other material layers. A substrate is received within a process chamber, and the substrate has exposed material layers including a titanium-containing material layer and at least one additional material layer. The additional material layer is selectively etched with respect to the titanium-containing material layer by exposing the substrate to a controlled environment including a halogen-containing gas. For one embodiment, the halogen-containing gas includes a fluorine-based gas. For one embodiment, the titanium-containing material layer is a titanium or a titanium nitride material layer. For one embodiment, the additional material layer includes tungsten, tungsten oxide, hafnium oxide, silicon oxide, silicon-germanium, silicon, silicon nitride, and/or aluminum oxide.

Abstract: A method of promoting spheroid formation, including: a preparation step of preparing a mixture obtained by mixing a cell sample with a promoter; and a culture step of culturing, inside a spheroid formation-culture vessel, the mixture obtained in the preparation step, in which the promoter is a polymer in which one or more selected from the group consisting of D-glucosamine, D-galactosamine, D-glucuronic acid, L-iduronic acid, and D-galactose are polymerized.

Abstract: A method of assessing an anti-cancer drug including culturing a cell structure including cancer cells and stromal cells in a presence of at least one anti-cancer drug, and assessing an anti-cancer effect of the at least one anti-cancer drug based on a number of viable cancer cells in the cell structure after the culturing.

Abstract: The present invention relates to a method for producing a three-dimensional tissue construct, the method comprising: a culture step of culturing cells in a culture liquid comprising fragmented extracellular matrix components, fibrin, and an aqueous medium.

Abstract: A method of producing drug resistant cells including contacting exosomes from a living organism exhibiting drug resistance with cells exhibiting no drug resistance such that drug resistant cells are formed, and culturing the drug resistant cells.

Abstract: There is provided a method of etching a silicon-containing film formed on a substrate, the method including: etching the silicon-containing film by using both a first fluorine-containing gas and a second fluorine-containing gas, the first fluorine-containing gas including at least an F2 gas and the second fluorine-containing gas including at least a ClF3 gas, an IF7 gas, an IF5 gas or an SF6 gas.

Abstract: Disclosed is a three-dimensional tissue comprising cells and collagen including endogenous collagen, wherein at least a portion of the cells is adhered to the collagen, and the content of the collagen is from 10 wt % to 90 wt % based on the three-dimensional tissue.

Abstract: An etching method includes a step of preparing a substrate having a portion to be etched, a step of plasma-etching the portion to be etched of the substrate into a predetermined pattern using plasma of a processing gas containing a CF-based gas, and then a step of removing a CF-based deposit which remains as an etching residue. The step of removing the CF-based deposit includes a step of forming an oxide including an oxide of the CF-based deposit using oxygen-containing radicals, and a step of removing the generated oxide by radical processing or chemical processing using gas.

Abstract: The present invention relates to an extracellular-matrix-containing composition comprising: a fragmented extracellular matrix component, wherein at least a part of the fragmented extracellular matrix component is crosslinked.

Abstract: The present invention relates to an extracellular-matrix-containing composition comprising: a fragmented extracellular matrix component; and an aqueous medium.

Abstract: The present invention relates to an abnormal cardiac rhythm myocardial model composed of a three-dimensional tissue containing cells including the cardiomyocytes and collagen, wherein at least a portion of the cells adheres to the collagen.

Abstract: Embodiments provide a non-plasma etch, such as a gas-phase and/or remote plasma etch, of titanium-containing material layers with tunable selectivity to other material layers. A substrate is received within a process chamber, and the substrate has exposed material layers including a titanium-containing material layer and at least one additional material layer. The additional material layer is selectively etched with respect to the titanium-containing material layer by exposing the substrate to a controlled environment including a halogen-containing gas. For one embodiment, the halogen-containing gas includes a fluorine-based gas. For one embodiment, the titanium-containing material layer is a titanium or a titanium nitride material layer. For one embodiment, the additional material layer includes tungsten, tungsten oxide, hafnium oxide, silicon oxide, silicon-germanium, silicon, silicon nitride, and/or aluminum oxide.