Patents by Inventor Shinji Ozoe

Shinji Ozoe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11459410
    Abstract: The present invention provides a high-purity arylsulfonic acid amine salt vinyl monomer which is an extremely industrially useful arylsulfonic acid monomer with excellent storage stability and amphiphilic solubility in both water and organic solvents, a simple and practical method for producing the same, a polyarylsulfonic acid amine salt which is a polymer thereof, and a method for producing the same. In the arylsulfonic acid amine salt vinyl monomer, a tertiary amine having 2 or 3 different substituents that each have 1 to 7 carbon atoms and also containing at least one or more of tertiary carbon or quaternary carbon or cyclic skeleton in the structure is applied to an amine moiety thereof, and in addition, a polyarylsulfonic acid amine salt having high purity in terms of sulfonation rate and polymerization conversion rate and a polymer thereof are used.
    Type: Grant
    Filed: August 6, 2018
    Date of Patent: October 4, 2022
    Assignee: TOSOH FINECHEM CORPORATION
    Inventors: Yusuke Shigeta, Shinji Ozoe, Akihiro Fuji
  • Publication number: 20220073661
    Abstract: Provided is a novel polystyrene-based polyampholyte having upper critical solution temperature (UCST)-type thermoresponsiveness and a method for producing the same. When monomers having halogenated vinylbenzyl trialkyl ammonium and p-styrenesulfonate as main components are radically polymerized in an aqueous solvent, a polyampholyte having an upper critical solution temperature is produced by optimizing the mole ratio between cationic groups and anionic groups and the amount of a radical initiator and a chain transfer agent to be added to thereby control the copolymer composition and the molecular weight.
    Type: Application
    Filed: September 20, 2021
    Publication date: March 10, 2022
    Applicant: TOSOH FINECHEM Corporation
    Inventors: Shinichi YUSA, Kanta Sharker KOMOL, Yuki OHARA, Yusuke SHIGETA, Shinji OZOE
  • Publication number: 20200172643
    Abstract: The present invention provides a high-purity arylsulfonic acid amine salt vinyl monomer which is an extremely industrially useful arylsulfonic acid monomer with excellent storage stability and amphiphilic solubility in both water and organic solvents, a simple and practical method for producing the same, a polyarylsulfonic acid amine salt which is a polymer thereof, and a method for producing the same. In the arylsulfonic acid amine salt vinyl monomer, a tertiary amine having 2 or 3 different substituents that each have 1 to 7 carbon atoms and also containing at least one or more of tertiary carbon or quaternary carbon or cyclic skeleton in the structure is applied to an amine moiety thereof, and in addition, a polyarylsulfonic acid amine salt having high purity in terms of sulfonation rate and polymerization conversion rate and a polymer thereof are used.
    Type: Application
    Filed: August 6, 2018
    Publication date: June 4, 2020
    Inventors: Yusuke SHIGETA, Shinji OZOE, Akihiro FUJI
  • Patent number: 9505713
    Abstract: Provided are high purity sodium p-styrenesulfonate with an excellent hue which is useful as a reactive emulsifier or dispersant for producing a polymer emulsion, or synthetic starch for clothing ironing and poly(sodium p-styrene-sulfonate) with an excellent hue using the same or sodium p-styrenesulfonate improved in fluidity while keeping good solubility. An aqueous p-?-bromoethylbenzenesulfonic acid solution and an aqueous sodium hydroxide solution are reacted under specific conditions to control the particle size, thereby obtaining sodium p-styrenesulfonate particles improved in a balance between fluidity and solubility, and further, impurities such as isomers are reduced, thereby obtaining high-purity sodium p-styrenesulfonate with an excellent hue.
    Type: Grant
    Filed: September 2, 2013
    Date of Patent: November 29, 2016
    Assignee: TOSOH ORGANIC CHEMICAL CO., LTD
    Inventors: Shinji Ozoe, Kenichi Yamanoi, Hideaki Matsunaga
  • Publication number: 20150246876
    Abstract: Provided are high purity sodium p-styrenesulfonate with an excellent hue which is useful as a reactive emulsifier or dispersant for producing a polymer emulsion, or synthetic starch for clothing ironing and poly(sodium p-styrene-sulfonate) with an excellent hue using the same or sodium p-styrenesulfonate improved in fluidity while keeping good solubility. An aqueous p-?-bromoethylbenzenesulfonic acid solution and an aqueous sodium hydroxide solution are reacted under specific conditions to control the particle size, thereby obtaining sodium p-styrenesulfonate particles improved in a balance between fluidity and solubility, and further, impurities such as isomers are reduced, thereby obtaining high-purity sodium p-styrenesulfonate with an excellent hue.
    Type: Application
    Filed: September 2, 2013
    Publication date: September 3, 2015
    Applicant: TOSOH ORGANIC CHEMICAL CO., LTD.
    Inventors: Shinji Ozoe, Kenichi Yamanoi, Hideaki Matsunaga
  • Publication number: 20090036608
    Abstract: An object of the present invention is to provide a novel polychloroprene-based copolymer, a soapless polychloroprene-based latex, and a process for producing the same in a simple and convenient manner, which are intended to be used for the improvement in adhesiveness and water resistance of a conventional polychloroprene adhesive or the improvement in oil resistance and adhesiveness of a styrene-butadiene block copolymer. The invention relates to a chloroprene-based block copolymer comprising a polymer (A) having a composition represented by the following formula (1) and a chloroprene-based polymer (B), the polymer (A) being linked to one terminal or both terminals of the chloroprene-based polymer (B), and the total amount of the 1,2-bond and the isomerized 1,2-bond in the chloroprene-based polymer (B) as determined by carbon-13 nuclear magnetic resonance spectrometry being 2.
    Type: Application
    Filed: July 7, 2006
    Publication date: February 5, 2009
    Applicant: TOSOH CORPORATION
    Inventor: Shinji Ozoe
  • Publication number: 20080125572
    Abstract: To provide a polychloroprene-base latex having improved adhesiveness and water resistance over conventional polychloroprene-base latex adhesives. A polychloroprene-base latex containing 2% or less by weight of a conventional emulsifier, and an acid functional group-terminated polychloroprene-type polymer represented by the following formula (1) or a polychloroprene-base random copolymer with hydrophilic group, and a method for producing the polychloroprene-base latex: (polychloroprene-type polymer)-S—R—X ??(1) (wherein X represents a carboxyl group or its salt; represents an alkyl group, an aryl group, a substituted alkyl group or a substituted aryl group).
    Type: Application
    Filed: November 28, 2007
    Publication date: May 29, 2008
    Applicant: TOSOH CORPORATION
    Inventor: Shinji OZOE
  • Patent number: 6335391
    Abstract: A latex adhesive for rubber/metal adhesion, which contains a copolymer consisting of, based on the weight of the copolymer, (A) 90.0 to 97.0% by weight of 2,3-dichloro-1,3-butadiene units, (B) 1.5 to 5.0% by weight of 1,2-dichloro-1,3-butadiene units, and (C) 1.5 to 5.0% by weight of 1,3-dichloro-1,3-butadiene units. The latex adhesive is prepared by polymerizing a monomer mixture consisting of the stated amounts of the monomers (A), (B) and (C) in the presence of a free-radical initiator, preferably a redox catalyst system, by an emulsion polymerization procedure. The latex adhesive has good mechanical stability and exhibits enhanced adhesion for rubber/metal adhesion.
    Type: Grant
    Filed: March 9, 2000
    Date of Patent: January 1, 2002
    Assignee: Tosoh Corporation
    Inventors: Seiji Matsumoto, Tsuneo Hironaka, Shinji Ozoe, Tamotsu Sato
  • Patent number: 5512647
    Abstract: A copolymer rubber which consists essentially of (A) from 70 to 99 wt % of a cyano group-containing acrylate of the formula (I): ##STR1## wherein R.sup.1 is a C.sub.2-6 alkylene group or --CH.sub.2 CH.sub.2 OCH.sub.2 CH.sub.2 --,(B) from 1 to 30 wt % of an .alpha.,.beta.-unsaturated nitrile,(C) from 0 to 10 wt % of at least one monomer selected from the following monomers:a) an active halogen group-containing monomerb) an epoxy group-containing monomerc) a carboxyl group-containing monomerd) a diene compounde) a (meth)acrylate having an ethylenically unsaturated bond in its side chain, and(D) from 0 to 15 wt % of other ethylenically unsaturated monomer which is copolymerizable with each of the above components (A), (B) and (C), andwhich has a Mooney viscosity (ML.sub.1+4 (100.degree. C.)) of at least 5.
    Type: Grant
    Filed: May 31, 1994
    Date of Patent: April 30, 1996
    Assignee: Tosoh Corporation
    Inventors: Shinji Ozoe, Seiji Matsumoto, Kazumi Furuta
  • Patent number: 5219967
    Abstract: An acrylic copolymer rubber which is a random copolymer of(A) a cyano group-containing acrylate or methacrylate of the following formula (I): ##STR1## wherein R.sup.1 is hydrogen or methyl, and R.sup.2 is --C.sub.n H.sub.2n -- or --CH.sub.2 CH.sub.2 --0--CH.sub.2 CH.sub.2 --, wherein n is an integer of from 2 to 4,(B) at least one of ethyl acrylate and n-butyl acrylate, and(C) at least one of glycidyl methacrylate and allyl glycidyl ether, or vinyl chloroacetate,wherein the amounts of units derived from the above (A), (B) and (C) in said copolymer are from 5 to 70% by weight, from 20 to 94.5% by weight and from 0.5 to 10% by weight, respectively, and which has a Mooney viscosity ML.sub.1+4 (100.degree. C.) of at least 5.
    Type: Grant
    Filed: July 16, 1991
    Date of Patent: June 15, 1993
    Assignee: Tosoh Corporation
    Inventors: Yasumichi Miyagawa, Mitsuhiro Kamezawa, Toshiya Higashino, Takashi Yamamoto, Shinji Ozoe
  • Patent number: 5089601
    Abstract: A chloroprene polymer having dithiocarbamate groups at both terminals, represented by the following formula (I): ##STR1## wherein M.sub.1 is a chloroprene monomer residue; X is a group represented by the following formula (II): ##STR2## wherein R.sub.1 is a C.sub.1 -C.sub.8 alkyl group, R.sub.2 is a C.sub.1 -C.sub.8 alkyl group or a hydrogen atom, R.sub.1 and R.sub.2 may be the same or different, or R.sub.1 and R.sub.2 together form a C.sub.3 -C.sub.8 methylene group so that they form a cyclic group together with the adjacent nitrogen atom, or a group represented by the following formula (III): ##STR3## wherein R.sub.1 is a C.sub.1 -C.sub.8 alkyl group, and R.sub.2 is a C.sub.1 -C.sub.8 alkyl group or a hydrogen atom; and n is a natural number of from 10 to 5,000 when X is the group of the formula (II) or a natural number of form 5 to 100 when X is the group of the formula (III).
    Type: Grant
    Filed: September 7, 1990
    Date of Patent: February 18, 1992
    Assignee: Tosoh Corporation
    Inventors: Shinji Ozoe, Hiroshi Yamakawa