Abstract: A method for producing a dry solid of cellulose nanofiber, the method comprising (A) preparing a dispersion in which cellulose nanofiber with an average fiber diameter of 2 to 500 nm is dispersed in a mixed solvent of water and a water-soluble organic solvent; and (B) drying the dispersion.

Abstract: A liquid immersion member is used in a liquid immersion exposure apparatus which exposes a substrate by exposure light via a first liquid between an emitting surface of an optical member and the substrate, and is capable of forming a liquid immersion space on an object movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member; a second member that is capable of being opposite to the object and is movable outside an optical path of the exposure light; and a protection part that protects the optical member. The protection part decreases a change in pressure which the optical member receives from the liquid in the liquid immersion space.

Abstract: A cellulose nanofiber with little contaminants and a high transparency is provided. A filtration method of a cellulose nanofiber dispersion including a step of filtering a cellulose nanofiber dispersion under elevated or reduced pressure by at least one of the filtration processes: (A) a filtration process using a filter aid; (B) a filtration process using a filter media selected from the group consisting of a metal porous filter media, an inorganic material porous filter media, and a polymer porous filter media; and (C) a filtration process using both the filter aid and the filter media.

Abstract: A liquid immersion member is used in a liquid immersion exposure apparatus, and forms a liquid immersion space above an object which is movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member, and a second member that is disposed at at least a portion of surrounding of an optical path of the exposure light and is relatively movable with respect to the first member. The second member includes a second upper surface that is opposite to a first lower surface of the first member via a gap, a second lower surface that is capable of being opposite to the object, and a fluid recovery part that is disposed at at least a portion of surrounding of the second lower surface.

Abstract: A liquid immersion exposure apparatus includes a liquid immersion member which forms a liquid immersion space on an object disposed opposite to an emitting surface of an optical member. The liquid immersion member includes (i) a first member that has a first liquid supply port and a first opening through which the exposure light is projected, (ii) a second member that has a first liquid recovery port facing downwardly and that is movable with respect to the first member, and (iii) a gas supply port arranged radially outward of the first liquid recovery port with respect to a path of the exposure light. The first liquid recovery port has a plurality of openings disposed in a four-sided shape to surround the first opening of the first member. The second member is movable relative to the first member in a direction perpendicular to an optical axis of the optical member.

Abstract: A liquid immersion member forms, in an exposure apparatus, liquid immersion space through which exposure light emitted from an optical member passes, the liquid immersion member includes: a first member that is disposed at at least part of a space around the optical member and that includes a first lower surface facing an object which is movable below the optical member; and a movable second member that includes a second lower surface which is disposed at outer side than the first lower surface viewed from optical axis of the optical member and which faces the object and a third lower surface which is disposed at inner side than the second lower surface viewed from the optical axis and whose at least part is disposed above at least part of the first lower surface.

Abstract: A liquid immersion exposure apparatus is disclosed. It includes a projection system having a final element and a liquid immersion member that in turn includes a first member, which surrounds the final element and has a liquid supply port and a liquid suction port, and a second member, which is movable with respect to the first member and has a lower part under which a portion of a liquid immersion space is formed. During exposure of a plurality of shot regions of a substrate, the immersion space covers a portion of a surface of the substrate, and the first shot region is exposed while moving the substrate in a first scanning direction. After the exposure of the first shot region, the second shot region is exposed while moving the substrate in a second scanning direction.

Abstract: Some embodiments include apparatuses and methods of using and forming such apparatuses. An apparatus among the apparatuses includes first and second conductive materials located in respective first and second levels of the apparatus, a pillar including a length extending between the first and second conductive materials, memory cells and control lines located along the pillar, a first select gate and a first select line located along the pillar between the first conductive material and the memory cells, a second select gate and a second select line located along the pillar between the first conductive material and the first select line, a first transistor and a first transistor gate line located along the pillar between the first conductive material and the first select line, and a second transistor and a second transistor gate line located along the pillar between the first conductive material and the first transistor.

Abstract: An exposure apparatus that exposes a substrate by exposure light via liquid between an optical member and the substrate, the exposure apparatus includes: an apparatus frame, an optical system including the optical member, a liquid immersion member that is configured to form an immersion liquid space and that includes a first member disposed at at least a portion of surrounding of the optical member and a second member disposed at at least a portion of surrounding of the optical member, a driving apparatus configured to relatively move the second member with respect to the first member, and a vibration isolator by which the first member is supported to the apparatus frame.

Abstract: In a heat insulating load jig 11 of the present invention, a solder material 14 having a melting point or a solidus temperature in a range between a thermal resistance temperature of a semiconductor chip 13 and a temperature 100° C. below the thermal resistance temperature is interposed between a circuit board 12 and the semiconductor chip 13; a heat insulating body 17 is placed on an upper side of the semiconductor chip 13 in this state; a metal weight 16 is disposed on the heat insulating body 17; and load is applied to the semiconductor chip 13 while the solder material 14 is melted and solidified.

Abstract: A display apparatus includes: a housing including a top plate having an opening and two opposed side plate units; a display member capable of moving through the opening; a shutter configured to open and close the opening; and a moving mechanism provided on at least one of the two side plate units, the moving mechanism including a first slide member and a second slide member each moving along the at least one side plate unit and a transmission member transmitting an amount of movement of the first slide member to the second slide member while increasing the amount of movement, wherein the shutter moves according to movement of the second slide member.

Abstract: A liquid immersion member is used in a liquid immersion exposure apparatus, and forms a liquid immersion space above an object which is movable below the optical member. The liquid immersion member includes a first member that is disposed at at least a portion of surrounding of the optical member, and a second member that is disposed at at least a portion of surrounding of an optical path of the exposure light and is relatively movable with respect to the first member. The second member includes a second upper surface that is opposite to a first lower surface of the first member via a gap, a second lower surface that is capable of being opposite to the object, and a fluid recovery part that is disposed at at least a portion of surrounding of the second lower surface.

Abstract: A serrated portion is formed on an outer peripheral portion of a lock base body of a lock base of a webbing take-up device. Furthermore, a flange portion is formed on the outer peripheral portion of the lock base body. The flange portion is disposed on a vehicle front side with respect to the serrated portion. Triangular grooves of the serrated portion are closed by the flange portion. When the lock base becomes displaced in a vehicle rearward direction and the flange portion comes into abutting contact with a leg plate of a frame, further displacement of the lock base in the vehicle rearward direction is blocked. Due to this, engagement between the serrated portion and ratchet teeth of a ratchet hole in the leg plate can be maintained.

Abstract: A webbing take-up device includes a spool capable of taking-up webbing worn by an occupant, a V-gear capable of rotating accompanying rotation of the spool, a lock pawl that is operated to restrict rotation of the spool in a pull-out direction, and a W-pawl provided at the V-gear, that is displaced and causes the lock pawl to operate when the V-gear is rotated in the pull-out direction at a specific speed or greater. The webbing take-up device also includes a restricting body that is moved to a permitting position permitting displacement of the W-pawl when the V-gear is rotated in the pull-out direction, and that is moved to a restricting position enabling the W-pawl to abut when the V-gear is rotated in a take-up direction, restricting displacement of the W-pawl due to the W-pawl abutting, a contact angle with the W-pawl being set with 90 degrees or greater.

Abstract: An object of the present invention is to stabilize and strengthen the strength of a bonding part between a metal electrode on a semiconductor chip and metal wiring connected thereto using a simple structure. Provided is a semiconductor device including a metal layer 130 on a surface of a metal electrode 120 formed on a semiconductor chip 110, the metal layer 130 consisting of a metal or an alloy different from a constituent metal of the metal electrode 120, metal wiring 140 is connected to the metal layer 130 via a bonding part 150, wherein the constituent metal of the metal layer 130 is a metal or an alloy different from the constituent metal of the metal electrode 120, and the bonding part 150 has an alloy region harder than the metal wiring 140.

Abstract: A liquid immersion exposure apparatus is disclosed. It includes a projection system having a final element and a liquid immersion member that in turn includes a first member, which surrounds the final element and has a liquid supply port and a liquid suction port, and a second member, which is movable with respect to the first member and has a lower part under which a portion of a liquid immersion space is formed. During exposure of a plurality of shot regions of a substrate, the immersion space covers a portion of a surface of the substrate, and the first shot region is exposed while moving the substrate in a first scanning direction. After the exposure of the first shot region, the second shot region is exposed while moving the substrate in a second scanning direction.

Abstract: Some embodiments include apparatuses and methods of using and forming such apparatuses. An apparatus among the apparatuses includes first and second conductive materials located in respective first and second levels of the apparatus, a pillar including a length extending between the first and second conductive materials, memory cells and control lines located along the pillar, a first select gate and a first select line located along the pillar between the first conductive material and the memory cells, a second select gate and a second select line located along the pillar between the first conductive material and the first select line, a first transistor and a first transistor gate line located along the pillar between the first conductive material and the first select line, and a second transistor and a second transistor gate line located along the pillar between the first conductive material and the first transistor.

Abstract: An exposure apparatus that exposes a substrate by exposure light via liquid between an optical member and the substrate, the exposure apparatus includes: an apparatus frame, an optical system including the optical member, a liquid immersion member that is configured to form an immersion liquid space and that includes a first member disposed at at least a portion of surrounding of the optical member and a second member disposed at at least a portion of surrounding of the optical member, a driving apparatus configured to relatively move the second member with respect to the first member, and a vibration isolator by which the first member is supported to the apparatus frame.

Abstract: The present invention provides a dispersion liquid of anion-modified cellulose nanofibers and a composition of anion-modified cellulose nanofibers that are not colored when heated. Specifically, the dispersion liquid contains anion-modified cellulose nanofibers; an anti-coloring agent selected from the group consisting of borate salts and sulfite salts, or combinations thereof in an amount of 1 to 30 mass % based on an absolute dry mass of the anion-modified cellulose nanofibers; and a solvent.

Abstract: A liquid immersion member including first and second members forming the immersion space; first member having a first lower surface disposed at a portion of the optical member surrounding, second member having a second upper surface opposite to the first lower surface via a gap and a second lower surface opposing the substrate and second member disposed at a portion of exposure light optical path surrounding; driving apparatus to move the second member with respect to the first; controlling the driving apparatus so the second member's operation in the substrate first operation movement is between exposure termination and start of a first and second shot regions differently from a second member's operation in the substrate second movement period which is between exposure termination and start of a third and fourth shot regions; first and second shot regions are in the same row contrary to third and fourth shot regions.