Abstract: A defect inspection apparatus includes an imaging mechanism for imaging a sample; an image acquisition circuit configured to generate an inspection image based on image data of the sample imaged by the imaging mechanism; a development circuit configured to generate a developed image from design data; a reference image generation circuit that includes a resizing process circuit configured to perform pattern classification from the developed image, and execute a resizing process for the developed image based on a resizing amount set for each classification, and that is configured to generate a reference image using the developed image after the resizing process; and a comparison circuit configured to compare the inspection image with the reference image.

Abstract: [Object] To provide a method for producing a vinyl ether polymer containing a hydrocarbon group in a stable and efficient manner, wherein decomposition of the monomer and generation of polyacetal are suppressed. [Means for solving problem] The method for producing a vinyl ether polymer containing a hydrocarbon group according to the present invention comprises the step of polymerizing vinyl ether represented by the following formula (1): wherein R1 represents an aliphatic hydrocarbon group having 1 to 10 carbons or an alicyclic hydrocarbon group having 3 to 10 carbons, in the presence of water as a polymerization solvent and an organic azo-based compound as a radical polymerization initiator, under pH of 6 or more.

Abstract: A pattern inspection apparatus according to one aspect of the present invention includes an image acquisition mechanism configured to acquire an inspection image of a substrate on which a figure pattern is formed, a distortion coefficient calculation circuit configured to calculate, using a plurality of actual image outline positions on an actual image outline of the figure pattern in the inspection image and a plurality of reference outline positions on a reference outline to be compared with the actual image outline, distortion coefficients by performing weighting in a predetermined direction at each actual image outline position of the plurality of actual image outline positions caused by distortion of the inspection image, a distortion vector estimation circuit configured to estimate, for each actual image outline position of the plurality of actual image outline positions, a distortion vector by using the distortion coefficients, and a comparison circuit configured to compare, using the distortion vector

Abstract: A multi-electron beam inspection apparatus includes a multi-detector that includes a plurality of detection sensors each of which detects a secondary electron beam emitted due to that a target object is irradiated with a primary electron beam individually preset in multiple secondary electron beams emitted because the target object is irradiated with multiple primary electron beams, a reference image data generation circuit that generates reference image data of a position irradiated with each primary electron beam, based on design data serving as a basis of the pattern formed on the target object, a synthesis circuit that synthesizes, for each primary electron beam, the reference image data of the position irradiated with a primary electron beam concerned and portions of reference image data of positions irradiated with other primary electron beams different from the primary electron beam concerned, and a comparison circuit that compares synthetic reference image data having been synthesized, and secondary e

Abstract: A pattern inspection apparatus includes an actual outline image generation circuit to generate an actual outline image of a predetermined region defined by a function, where the gray scale value of each pixel in the predetermined region including plural actual image outline positions on an actual image outline of a figure pattern in an inspection image is dependent on a distance from the center of a pixel concerned to the closest actual image outline position in the plural actual image outline positions, and a reference outline image generation circuit to generate a reference outline image of the predetermined region defined by the function, where a gray scale value of each pixel in the predetermined region is dependent on a distance from the center of a pixel concerned to the closest reference outline position in plural reference outline positions on a reference outline to be compared with the actual image outline.

Abstract: According to one aspect of the present invention, a pattern inspection apparatus includes a circuit configured to perform, for each direction, filter processing on the image, using a plurality of two-dimensional spatial filter functions with different orientations; a circuit configured to extract a plurality of pixels each having a predetermined value larger than a first threshold, in pixel values each for the each direction of after the filter processing, as a plurality of outline pixel candidates through which an outline of the figure pattern passes; and a circuit configured to extract a plurality of outline pixels from the plurality of outline pixel candidates by excluding outline pixel candidates each of which has a differential value, greater than or equal to a second threshold, obtained by differentiating a pixel value of before the filter processing in a second direction orthogonal to a first direction corresponding to the predetermined value.

Abstract: Method for searching a hole pattern in image includes extracting, from an image where a hole pattern is formed, plural outline position candidates serving as candidates for plural positions where an outline of the hole pattern passes, generating, for each pixel in a region including the plural outline position candidates, a distance map which defines, for each of plural directions, a distance from each of the plural outline position candidates to each of pixels arrayed in a target direction of the plural directions, extracting a candidate for a center pixel of the hole pattern by using the distance map generated for each direction, and searching, in the plural outline position candidates, a group of outline position candidates which satisfies a predetermined condition in the case of using the candidate for the center pixel as a starting point, as plural outline positions where the outline of the hole pattern passes.

Abstract: A core-shell type polymeric particle may exhibit good dispersibility in an aqueous medium and excellent flame retardance. A core-shell type polymeric particle may include a core including a hydrophobic polymer (c) and a shell including a copolymer having a repeating unit (a) derived from vinyl phosphonic acid or a vinyl phosphonic acid ester and a repeating unit (b) of formula (?): wherein Ra is H or a methyl group, Rb is a single bond or a carbonyl group, and ring Q1 is a substituted or unsubstituted 4 to 10 membered nitrogen-containing heterocycle.

Abstract: According to one aspect of the present invention, a pattern inspection apparatus includes: a profile extraction circuit configured to extract each of a plurality of predetermined dimensional profiles for a plurality of pixels with a value of a differential intensity greater than or equal to a threshold value in the image; a wavelet transform circuit configured to perform, on each of the plurality of predetermined dimensional profiles, a wavelet transform while changing a scale variable of a mother wavelet function to a predetermined value; and a contour position extraction circuit configured to extract, for the each of the plurality of predetermined dimensional profiles, a maximum peak position as a contour position of the figure pattern from peak positions of a plurality of transformed profiles of after the wavelet transform in which the scale variable is set.

Abstract: A method for producing a vinyl ether polymer containing an oxyethylene chain is provided, including a the step of polymerizing vinyl ether represented by formula (1) in the presence of water as a polymerization solvent, a basic compound as an additive, and an organic azo-based compound as a radical polymerization initiator, and in pH of 5 or more, and the amount of the basic compound used is 0.01 to 0.5 mol % based on an amount of the vinyl ether. Formula (1) is wherein R1 represents an alkyl group having 1 to 3 carbons, and n represents an integer from 1 to 10.

Abstract: According to one aspect of the present invention, a pattern inspection apparatus includes a circuit configured to perform, for each direction, filter processing on the image, using a plurality of two-dimensional spatial filter functions with different orientations; a circuit configured to extract a plurality of pixels each having a predetermined value larger than a first threshold, in pixel values each for the each direction of after the filter processing, as a plurality of outline pixel candidates through which an outline of the figure pattern passes; and a circuit configured to extract a plurality of outline pixels from the plurality of outline pixel candidates by excluding outline pixel candidates each of which has a differential value, greater than or equal to a second threshold, obtained by differentiating a pixel value of before the filter processing in a second direction orthogonal to a first direction corresponding to the predetermined value.

Abstract: According to one aspect of the present invention, a pattern inspection apparatus includes: a profile extraction circuit configured to extract each of a plurality of predetermined dimensional profiles for a plurality of pixels with a value of a differential intensity greater than or equal to a threshold value in the image; a wavelet transform circuit configured to perform, on each of the plurality of predetermined dimensional profiles, a wavelet transform while changing a scale variable of a mother wavelet function to a predetermined value; and a contour position extraction circuit configured to extract, for the each of the plurality of predetermined dimensional profiles, a maximum peak position as a contour position of the figure pattern from peak positions of a plurality of transformed profiles of after the wavelet transform in which the scale variable is set.

Abstract: A multiple electron beam irradiation apparatus includes a first region setting circuit which sets a first frame region of a plurality of first frame regions which can be irradiated with remaining beams after excluding beams in one row and one column at end; a second region setting circuit which sets a second frame region of a plurality of second frame regions each having four corners equivalent to an irradiation position of the defective beam by using normal beams; and an electron beam irradiation mechanism which performs the first multiple electron beam irradiation processing for the each of the plurality of first frame regions of the target object by using the normal beams, and perform second multiple electron beam irradiation processing for each of the plurality of second frame regions by using at least beams at the four corners.

Abstract: [Object] To provide a method for producing a vinyl ether polymer containing a hydrocarbon group in a stable and efficient manner, wherein decomposition of the monomer and generation of polyacetal are suppressed. [Means for solving problem] The method for producing a vinyl ether polymer containing a hydrocarbon group according to the present invention comprises the step of polymerizing vinyl ether represented by the following formula (1): wherein R1 represents an aliphatic hydrocarbon group having 1 to 10 carbons or an alicyclic hydrocarbon group having 3 to 10 carbons, in the presence of water as a polymerization solvent and an organic azo-based compound as a radical polymerization initiator, under pH of 6 or more.

Abstract: Provided are core/shell type polymeric particles including a shell and a core, in which the particles can be produced by a method using neither a surfactant nor a high-molecular-weight azo initiator, exhibit satisfactory dispersibility in aqueous medium, and are useful as, for instance, a dispersant, a metal-protecting stabilizer, or a metal adsorbent. A core/shell type polymeric particle including a shell including a hydrophilic vinyl ether polymer (a) and a core including a hydrophobic polymer (b).

Abstract: A method of producing lipids, containing the steps of: culturing a transformant wherein the expressions of a gene encoding any one of the following proteins (A) to (F) and a gene encoding an acyl-ACP thioesterase are enhanced, and producing fatty acids or lipids containing these fatty acids as components: (A) a protein consisting of the amino acid sequence set forth in SEQ ID NO: 2; (B) a protein consisting of an amino acid sequence having 89% or more identity with the amino acid sequence of the protein (A), and having acyl-CoA synthetase activity; (C) a protein consisting of the amino acid sequence set forth in SEQ ID NO: 4; (D) a protein consisting of an amino acid sequence having 49% or more identity with the amino acid sequence of the protein (C), and having acyl-CoA synthetase activity; (E) a protein consisting of the amino acid sequence set forth in SEQ ID NO: 6; and (F) a protein consisting of an amino acid sequence having 85% or more identity with the amino acid sequence of the protein (E), a

Abstract: A method of improving lipid productivity, containing the steps of: enhancing the expression of a gene encoding the following protein (A) or (B), and improving the productivity of medium-chain fatty acids or lipids containing these fatty acids as components produced in a cell of a transformant, or the total amount of all fatty acids produced in a cell of a transformant: (A) a protein consisting of the amino acid sequence set forth in SEQ ID NO: 1; and (B) a protein consisting of an amino acid sequence having 64% or more identity with the amino acid sequence of the protein (A), and having glycerol-3-phosphate dehydrogenase activity.

Abstract: A multiple electron beam irradiation apparatus includes a first region setting circuit which sets a first frame region of a plurality of first frame regions which can be irradiated with remaining beams after excluding beams in one row and one column at end; a second region setting circuit which sets a second frame region of a plurality of second frame regions each having four corners equivalent to an irradiation position of the defective beam by using normal beams; and an electron beam irradiation mechanism which performs the first multiple electron beam irradiation processing for the each of the plurality of first frame regions of the target object by using the normal beams, and perform second multiple electron beam irradiation processing for each of the plurality of second frame regions by using at least beams at the four corners.

Abstract: [Object] To provide a method for producing a vinyl ether polymer having a hydroxyl group on the side chain, wherein the vinyl ether polymer having a low viscosity and excellent workability and processability is produced in a simple and efficient method. [Means for solving problem] The present invention relates to a method for producing a vinyl ether polymer having a hydroxyl group on the side chain, characterized in that vinyl ether comprising a hydroxyl group is subjected to radical polymerization by using an oil-soluble azo polymerization initiator, in the presence of a mixed solvent comprising water and an organic solvent selected from alcohol or cyclic ether radical polymerization.

Abstract: [Object] To provide a method for producing a vinyl ether polymer containing an oxyethylene chain in a stable and efficient manner, wherein decomposition of the monomer and generation of polyacetal are suppressed. [Means for solving problem] The method for producing a vinyl ether polymer containing an oxyethylene chain according to the present invention comprises the step of polymerizing vinyl ether represented by the following formula (1): wherein R1 represents an alkyl group having 1 to 3 carbons, and n represents an integer from 1 to 10, in the presence of water as a polymerization solvent, a basic compound as an additive, and an organic azo-based compound as a radical polymerization initiator, and in pH of 5 or more.