Abstract: A substrate treating device immerses substrates in a mixed-acid aqueous solution, and performs an etching treatment on the substrates. The substrate treating device includes: a treating tank that stores the mixed-acid aqueous solution; a treating-liquid exchange unit that performs a total liquid exchange of the mixed-acid aqueous solution based on a life time of the mixed-acid aqueous solution in the treating tank; a detecting unit that detects a pure-water concentration of the mixed-acid aqueous solution; a concentration control unit that controls, based on the pure-water concentration detected by the detecting unit, the pure-water concentration such that the pure-water concentration becomes a predetermined target concentration by supplying pure water to the mixed-acid aqueous solution in the treating tank; and a target-value change unit that changes a lower-side standard value (a target concentration).

Abstract: The substrate treating device performs a predetermined treatment on a substrate by immersing the substrate into a treating liquid that contains a predetermined chemical liquid and pure water. Further, the substrate treating device includes a treating tank in which a treating liquid with which a predetermined treatment is performed on the substrate is stored, a supply unit that supplies a chemical liquid or pure water to the treating tank, a discharge unit that discharges the treating liquid stored in the treating tank, and a control unit that controls supply of the treating liquid or the pure water by the supply unit. The control unit causes the supply unit to supply the chemical liquid or the pure water during performing the predetermined treatment.

Abstract: A substrate treatment method according to the present invention is a substrate treatment method of treating at least one substrate in a treatment tank with treatment liquid. The substrate treatment method includes the following processes of: acquiring in advance treatment information of the substrate to be treated in the treatment tank; specifying a predicted concentration change pattern corresponding to the acquired treatment information of the substrate by referencing correspondence information describing a plurality of situations possible for the treatment information and a plurality of concentration change patterns of the treatment liquid prepared in advance to respectively correspond to the plurality of situations of the treatment information; and carrying out concentration control of the treatment liquid based on the predicted concentration change pattern while the substrate is treated in the treatment tank.

Abstract: The substrate treating device performs a predetermined treatment on a substrate by immersing the substrate into a treating liquid that contains a predetermined chemical liquid and pure water. Further, the substrate treating device includes a treating tank in which a treating liquid with which a predetermined treatment is performed on the substrate is stored, a supply unit that supplies a chemical liquid or pure water to the treating tank, a discharge unit that discharges the treating liquid stored in the treating tank, and a control unit that controls supply of the treating liquid or the pure water by the supply unit. The control unit causes the supply unit to supply the chemical liquid or the pure water during performing the predetermined treatment.

Abstract: A substrate treating device immerses substrates in a mixed-acid aqueous solution, and performs an etching treatment on the substrates. The substrate treating device includes: a treating tank that stores the mixed-acid aqueous solution; a treating-liquid exchange unit that performs a total liquid exchange of the mixed-acid aqueous solution based on a life time of the mixed-acid aqueous solution in the treating tank; a detecting unit that detects a pure-water concentration of the mixed-acid aqueous solution; a concentration control unit that controls, based on the pure-water concentration detected by the detecting unit, the pure-water concentration such that the pure-water concentration becomes a predetermined target concentration by supplying pure water to the mixed-acid aqueous solution in the treating tank; and a target-value change unit that changes a lower-side standard value (a target concentration).

Abstract: An optical irradiation equipment provided with a cage body having an UV radiation transmission window, and an excimer lamp which is arranged in an interior of said cage body, wherein gas flow openings being connected to one of a cooling gas supply mechanism and a cooling gas suction mechanism are provided at a periphery of said UV radiation transmission window.

Abstract: An optical irradiation equipment provided with a cage body having an UV radiation transmission window, and an excimer lamp which is arranged in an interior of said cage body, wherein gas flow openings being connected to one of a cooling gas supply mechanism and a cooling gas suction mechanism are provided at a periphery of said UV radiation transmission window.

Abstract: A discharge lamp lighting apparatus for supplying high frequency high voltage to an excimer discharge lamp comprises a boasting transformer having a core, a secondary side coil and a pair of primary side coils; a DC power source; and switching elements, wherein a duty ratio of an electrically conductive period to an operational cycle of each of the switching elements is 30% or less, a turn ratio of the secondary side coil to each of the primary side coils is 25 or less, a difference between a first length of a first axial direction area where each of the primary side coils are wound, and a second length of a second axial direction area where the secondary side coil is wound, is 18% or less of the first length or the second length, and a leakage inductance associated with magnetic coupling between the primary side coils and the secondary coil is 0.2% to 0.7% of a primary side coil inductance.

Abstract: A discharge lamp lighting apparatus for supplying high frequency high voltage to an excimer discharge lamp comprises a boasting transformer having a core, a secondary side coil and a pair of primary side coils; a DC power source; and switching elements, wherein a duty ratio of an electrically conductive period to an operational cycle of each of the switching elements is 30% or less, a turn ratio of the secondary side coil to each of the primary side coils is 25 or less, a difference between a first length of a first axial direction area where each of the primary side coils are wound, and a second length of a second axial direction area where the secondary side coil is wound, is 18% or less of the first length or the second length, and a leakage inductance associated with magnetic coupling between the primary side coils and the secondary coil is 0.2% to 0.7% of a primary side coil inductance.

Abstract: A dielectric barrier discharge lamp device which allows ultraviolet rays to be uniformly radiated onto a workpiece having a large surface area and which can be easily adapted to the size of workpiece. In the dielectric barrier, at least one dielectric barrier discharge lamp is arranged in a hermetically sealed casing which has a hollow longitudinally extending main part that is closed at both ends by end parts, at least a portion of the main part of the casing defining a window allowing light radiated from the at least one dielectric barrier discharge lamp to pass therethrough onto the workpiece. At least one end part of the casing is provided with a passage allowing inert gas to be introduced into the casing, and at least one end part of the casing is adapted to allow loading or unloading of the at least one dielectric barrier discharge lamp. A plurality of casings are arranged side by side with their windows facing the workpiece to be irradiated.

Abstract: A dielectric-barrier discharge lamp device that can reliably prevent leakage of the coolant fluid used to cool the dielectric-barrier discharge lamp, and that can reliably cool the dielectric-barrier discharge lamp, is achieved by the dielectric-barrier discharge lamp device having a dielectric-barrier discharge lamp (1) with a hollow-cylinder-shaped discharge space (P) formed by an outer tube (3) that is roughly cylindrical in external shape and a co-axial inner tube (2), in which the inner tube (2) has a cylindrical tube extension (2A) that extends outward from the discharge space (4), and in which the outer periphery of the end (2A1) of the tube extension (2A) is held tightly by a coupler fitting (8) connected to a guide tube (11) through which a coolant fluid flows.

Abstract: A method for automatically adjusting an optical axis of a laser resonator. Specifically, the angle of a mirror in a laser resonator is changed in a very small stepwise increments, and the laser output before the very little change is compared to the laser output after the incremental change. If the laser output after the very small incremental change is larger than the laser output before the very small incremental change, the angle is automatically changed by a very small amount in the same direction as the previous increment. If the laser output after the very small incremental change is smaller than the previous laser output measurement, the angle is automatically changed by a very small amount in the opposite direction. Thus the optical axis of the laser resonator is adjusted automatically.

Abstract: A metal vapor laser device wherein the pressure of carrier gas within a metal vapor laser tube can be normally maintained constant and a stabilized laser beam can be generated. The metal vapor laser device comprises a metal vapor laser tube, and a carrier gas supplier for supplementing carrier gas into the metal vapor laser tube. The carrier gas supplier includes an outer tube substantially impermeable to the carrier gas, and an inner tube having a permeability to the carrier gas which varies according to temperature and partitioning the inside of the outer tube into a reservoir section and a tank section. The inner tube is disposed in the tank section of the outer tube in such a manner as to form a duplex tube. The carrier gas supplier further includes a heater provided on outer peripheries of regions of the outer tube including the reservoir section and the tank section.

Abstract: A metal vapor laser device which prevents a possible discharge between an electrode and a pressure detector thereof and can generate a laser beam in a stabilized condition. The metal vapor laser device comprises a metal vapor laser tube, a carrier gas supplier, and a pressure detector. The carrier gas supplier communicates with a discharge spacing within the laser tube by way of a communicating hole formed at an end portion thereof. The pressure detector includes a tube defining a pressure detecting chamber therein and communicating with the inside of the carrier gas supplier, and an energizable detecting element provided in the inside of the pressure detecting chamber. A discharge preventing thin tube is provided in the inside of the carrier gas supplier and has an end connected to the end portion of the carrier gas supplier in such a manner as to surround the communicating hole of the carrier gas supplier.

Abstract: A metal vapor laser device which can generate laser oscillations stably even if the atmospheric temperature of a metal vapor laser tube thereof varies suddenly. The metal vapor laser device comprises a metal vapor laser tube having a metal tank in which a working metal is contained, a heater for heating the metal in the metal tank, a power source circuit for the heater, a voltage detector for detecting an inter-electrode voltage of the laser tube, and a temperature detector for detecting an atmospheric temperature of the laser tube. The power source circuit includes a controlling circuit for controlling a power supply to the heater in response to detection signals from the voltage detector and the temperature detector to maintain the pressure of the metal vapor within the laser tube constant. When the atmospheric temperature of the laser tube varies suddenly, the operation of the heater is thus feed-forward controlled in response to the detection signal from the temperature detector.

Abstract: Ultraviolet radiation process applicable in the manufacture of semiconductor devices to enhance the thermal stability of a photoresist film on a semiconductor wafer.A method, in ultraviolet radiation process, and an apparatus enabling the high-speed and effective treatment of a photoresist pattern employing ultraviolet irradiation by preventing the deformation of the photoresist which is caused by the light radiated from a discharge lamp such as high pressure mercury vapor lamp. This method and apparatus employ ultraviolet irradiation, in which ultraviolet rays are applied to the photoresist pattern, using a means to intercept or reduce selectively all or part of the wavelengths in the spectral response region of the photoresist out of radiant energy obtained from the discharge lamp.

Abstract: In a photochemical vapor deposition apparatus comprising a reaction space, which forms a passage for a photoreactive gas and in which a substrate is to be placed, and a discharge space, in which electric plasma discharge is generated for radiating ultraviolet rays which cause photochemical reaction of the photoreactive gas, both the spaces being surrounded by the same vessel, discharging electrodes arranged opposite one another with said discharge space therebetween, and a grid comprising a wire-netting of metal interposed between the discharge space and the reaction space, to which grid is applied a voltage of positive potential.This photochemical vapor deposition apparatus can achieve photochemical vapor deposition with high efficiency, because the diffusion of plasma into the reaction space is interrupted by the grid so that the substrate is permitted to be placed at a position closer to an ultraviolet ray source and ultraviolet rays of larger intensity are applied to the substrate.

Abstract: In a photochemical vapor deposition apparatus, a reaction space in which a substrate is to be placed and a discharge space adjacent to the reaction space, in which electric plasma discharge is generated for radiating ultraviolet rays which cause photochemical decomposition reaction of a photoreactive gas, are surrounded by the same vessel, and discharging electrodes are provided in the discharge space so as to be opposite to each other in a first level and a second level, which are different in level in the direction in which the spaces align. The discharging electrode arranged in the first level, which is closer to the reaction space, has such a configuration or arrangement that an ultraviolet ray-passing opening is formed.According to the apparatus, a vapor-deposited film can be formed with high efficiency, because a large quantity of ultraviolet rays can be applied to the substrate without any damage of the vapor-deposited film.

Abstract: In a photochemical vapor deposition apparatus, a reaction space forming a passage for a photoreactive gas, in which reaction space a substrate is to be placed, and a discharge space, in which electric plasma discharge is generated for radiating ultraviolet rays which cause photochemical reaction of the photoreactive gas, are surrounded by the same vessel. A mercury reservoir that communicates with the discharge space by way of a communication pipe is provided outside the vessel, the communication pipe is heated at a temperature higher than that of the mercury reservoir by a heater, and the mercury reservoir is controlled in temperature by a Peltier effect element which may be cooled with a water-cooled block provided on one side thereof.This photochemical vapor deposition apparatus can achieve photochemical vapor deposition with high efficiency, because the control of the vapor pressure of mercury for discharge is carried out easily and ultraviolet rays can be radiated with high efficiency.