Patents by Inventor Shinkichi Asahi

Shinkichi Asahi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8372577
    Abstract: It is disclosed a photosensitive resin composition comprising (a) a binder polymer based on a copolymer containing benzyl (meth)acrylate as a building block, (b) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule and (c) a photopolymerization initiator based on a hexarylbisimidazole compound, with a light-initiated color former being optionally contained as component (d). The composition has long-term keeping quality, exhibits particularly high resistance to plating and dry etching, as well as assuring improvement in resolution and adhesion; the composition may be used to form a photosensitive dry film.
    Type: Grant
    Filed: June 9, 2010
    Date of Patent: February 12, 2013
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Yukihiko Tanaka, Shinkichi Asahi, Naoya Katsumata
  • Publication number: 20110065046
    Abstract: It is disclosed a photosensitive resin composition comprising (a) a binder polymer based on a copolymer containing benzyl (meth)acrylate as a building block, (b) a photopolymerizable compound having at least one polymerizable ethylenically unsaturated group in the molecule and (c) a photopolymerization initiator based on a hexarylbisimidazole compound, with a light-initiated color former being optionally contained as component (d). The composition has long-term keeping quality, exhibits particularly high resistance to plating and dry etching, as well as assuring improvement in resolution and adhesion; the composition may be used to form a photosensitive dry film.
    Type: Application
    Filed: June 9, 2010
    Publication date: March 17, 2011
    Inventors: Yukihiko Tanaka, Shinkichi Asahi, Naoya Katsumata
  • Patent number: 6322947
    Abstract: A photosensitive composition for sandblasting and a photosensitive film laminate having a photosensitive layer comprising the photosensitive composition are disclosed, the photosensitive composition comprising (A) a photopolymerizable urethane (meth)acrylate oligomer having at least two acryloyl groups and/or methacryloyl groups and a structural unit represented by formula: (B) an alkali-soluble compound, and (C) a photopolymerization initiator.
    Type: Grant
    Filed: August 13, 1999
    Date of Patent: November 27, 2001
    Assignee: Tokyo Ohka Kogyo Co., Ltd.
    Inventors: Ryuma Mizusawa, Shinkichi Asahi, Syunzi Nakazato, Hiroyuki Obiya