Patents by Inventor Shinko Matsumoto

Shinko Matsumoto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Coating and developing method
    Patent number: 6444409
    Abstract: A coating and developing apparatus for coating a substrate with a plurality of color resists and for developing it after exposure, comprises: a scrubbing unit for scrubbing the substrate; a coating unit having a plurality of resist discharge nozzles for respectively discharging a plurality of color resists on the scrubbed substrate; and a developing unit for developing the substrate coated with the color resists after exposure. Accordingly, reduction in size of apparatus and space savings can be achieved, and manufacturing cost can also be reduced.
    Type: Grant
    Filed: June 7, 2001
    Date of Patent: September 3, 2002
    Assignee: Tokyo Electron Limited
    Inventors: Shinichiro Araki, Shinko Matsumoto, Noriyuki Anai
  • Coating and developing method and apparatus therefor
    Publication number: 20010041311
    Abstract: A coating and developing apparatus for coating a substrate with a plurality of color resists and for developing it after exposure, comprises: a scrubbing unit for scrubbing the substrate; a coating unit having a plurality of resist discharge nozzles for respectively discharging a plurality of color resists on the scrubbed substrate; and a developing unit for developing the substrate coated with the color resists after exposure. Accordingly, reduction in size of apparatus and space savings can be achieved, and manufacturing cost can also be reduced.
    Type: Application
    Filed: June 7, 2001
    Publication date: November 15, 2001
    Inventors: Shinichiro Araki, Shinko Matsumoto, Noriyuki Anai
  • Coating and developing apparatus
    Patent number: 6270576
    Abstract: A coating and developing apparatus for coating a substrate with a plurality of color resists and for developing it after exposure, comprises: a scrubbing unit for scrubbing the substrate; a coating unit having a plurality of resist discharge nozzles for respectively discharging a plurality of color resists on the scrubbed substrate; and a developing unit for developing the substrate coated with the color resists after exposure. Accordingly, reduction in size of apparatus and space savings can be achieved, and manufacturing cost can also be reduced.
    Type: Grant
    Filed: August 3, 1999
    Date of Patent: August 7, 2001
    Assignee: Tokyo Electron Limited
    Inventors: Shinichiro Araki, Shinko Matsumoto, Noriyuki Anai