Patents by Inventor Shinn-Haw Huang

Shinn-Haw Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8216017
    Abstract: In a method of fabricating a planar light source, a first substrate is formed at first. First electrodes approximately parallel to each other are formed on the first substrate. Sets of first dielectric patterns are formed on the first substrate. Each set of the first dielectric patterns includes at least two first striped dielectric patterns, and each of the first striped dielectric patterns covers one of the first electrodes correspondingly. The edges of the top of each first striped dielectric pattern are raised in a peak shape. A phosphor layer is formed between the first striped dielectric patterns of each set of the first dielectric patterns. A second substrate is formed. The first and second substrates are bound; meanwhile, a discharge gas is injected into the discharge space.
    Type: Grant
    Filed: August 24, 2009
    Date of Patent: July 10, 2012
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventors: Yu-Heng Hsieh, Chu-Chi Ting, Shinn-Haw Huang, Chang-Jung Yang, Chia-Hua Ai
  • Publication number: 20090311813
    Abstract: In a method of fabricating a planar light source, a first substrate is formed at first. First electrodes approximately parallel to each other are formed on the first substrate. Sets of first dielectric patterns are formed on the first substrate. Each set of the first dielectric patterns includes at least two first striped dielectric patterns, and each of the first striped dielectric patterns covers one of the first electrodes correspondingly. The edges of the top of each first striped dielectric pattern are raised in a peak shape. A phosphor layer is formed between the first striped dielectric patterns of each set of the first dielectric patterns. A second substrate is formed. The first and second substrates are bound; meanwhile, a discharge gas is injected into the discharge space.
    Type: Application
    Filed: August 24, 2009
    Publication date: December 17, 2009
    Applicant: CHUNGHWA PICTURE TUBES, LTD.
    Inventors: Yu-Heng Hsieh, Chu-Chi Ting, Shinn-Haw Huang, Chang-Jung Yang, Chia-Hua Ai
  • Patent number: 7612502
    Abstract: A planar light source including a first substrate, a second substrate, a sealant, first electrodes, sets of first dielectric patterns, a phosphor layer, and a discharge gas is provided. The second substrate is disposed above the first substrate. The sealant is disposed between the first and second substrates to form a cavity among the first substrate, the second substrate, and the sealant. The first electrodes are disposed on the first substrate, and each set of the first dielectric patterns has at least two first striped dielectric patterns. Each of the first striped dielectric patterns covers one of the first electrodes correspondingly. The edges of the top of each first striped dielectric pattern are raised in a peak shape. The phosphor layer is disposed on the first substrate and between the first striped dielectric patterns of each set of the first dielectric patterns. The discharge gas is injected into the cavity.
    Type: Grant
    Filed: June 1, 2006
    Date of Patent: November 3, 2009
    Assignee: Chunghwa Picture Tubes, Ltd.
    Inventors: Yu-Heng Hsieh, Chu-Chi Ting, Shinn-Haw Huang, Chang-Jung Yang, Chia-Hua Ai
  • Publication number: 20080006830
    Abstract: A planar light source including a first substrate, a second substrate, a sealant, first electrodes, sets of first dielectric patterns, a phosphor layer, and a discharge gas is provided. The second substrate is disposed above the first substrate. The sealant is disposed between the first and second substrates to form a cavity among the first substrate, the second substrate, and the sealant. The first electrodes are disposed on the first substrate, and each set of the first dielectric patterns has at least two first striped dielectric patterns. Each of the first striped dielectric patterns covers one of the first electrodes correspondingly. The edges of the top of each first striped dielectric pattern are raised in a peak shape. The phosphor layer is disposed on the first substrate and between the first striped dielectric patterns of each set of the first dielectric patterns. The discharge gas is injected into the cavity.
    Type: Application
    Filed: June 1, 2006
    Publication date: January 10, 2008
    Inventors: Yu-Heng Hsieh, Chu-Chi Ting, Shinn-Haw Huang, Chang-Jung Yang, Chia-Hua Ai