Patents by Inventor Shinnichi Nakagawa

Shinnichi Nakagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for forming I-III-VI.sub.2 thin-film layers
    Patent number: 5935324
    Abstract: An apparatus for forming I-III-VI.sub.2 thin-film layers has a reaction chamber made of a carbon material in which a precursor for forming a I-III-VI.sub.2 thin-film layer and a vapor source of an element of group VI of the periodic table are placed. The precursor and vapor source are heated under vacuum to form the I-III-VI.sub.2 thin-film layer. The reaction chamber is divided into a reaction compartment A having the precursor placed therein and a reaction compartment B having the vapor element of group IV placed therein. A communication channel C is provided between the reaction compartments A and B, and a heating unit controlled by a temperature control unit is provided exterior to each of the reaction compartments A and B.
    Type: Grant
    Filed: April 28, 1997
    Date of Patent: August 10, 1999
    Assignee: Yazaki Corporation
    Inventors: Shinnichi Nakagawa, Kenji Sato, Masami Nakamura, Kazuhiro Toyoda, Takeshi Kamiya, Kazue Suzuki, Hiroki Ishihara, Takeshi Ikeya, Masaharu Ishida