Patents by Inventor Shinobu Akashi

Shinobu Akashi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6248400
    Abstract: A DC plasma jet CVD process having a high film deposition rate is employed. A material having low adhesion with diamond is used for a substrate. A diamond film automatically peels from the substrate at the time of cooling. Gas is recycled because gas utilization efficiency is low. In this case, deposition of carbon can be prevented by setting a gas flow velocity to at least 5 m/s in the proximity of an anodic point.
    Type: Grant
    Filed: August 18, 1997
    Date of Patent: June 19, 2001
    Assignee: Fujitsu Limited
    Inventors: Kazuaki Kurihara, Kenichi Sasaki, Tsukasa Itani, Shinobu Akashi