Patents by Inventor Shinroh Itoh

Shinroh Itoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11420905
    Abstract: The present invention focuses on a silicon nitride substrate having high mechanical strength, high thermal conductivity and the like, and takes advantage of such properties to provide: a ceramic substrate capable of providing improvement in a bonding property between a silicon nitride substrate and a ceramic layer which uses a dielectric ceramic material capable of being simultaneously sintered with a low-resistance conductive material such as a low-melting metal (Ag or Cu); and a method for producing the ceramic substrate. The ceramic substrate of the present invention is obtained by stacking and bonding a silicon nitride substrate and a ceramic layer composed of a dielectric ceramic material, wherein: the dielectric ceramic material contains Mg, Al, and Si as main ingredients, and Bi or B as an accessory ingredient; and the ceramic layer includes a region with a high Si element concentration at a bonding interface with the silicon nitride substrate.
    Type: Grant
    Filed: March 10, 2017
    Date of Patent: August 23, 2022
    Assignee: HITACHI METALS, LTD.
    Inventors: Hiroyuki Itoh, Shinroh Itoh
  • Publication number: 20190047915
    Abstract: The present invention focuses on a silicon nitride substrate having high mechanical strength, high thermal conductivity and the like, and takes advantage of such properties to provide: a ceramic substrate capable of providing improvement in a bonding property between a silicon nitride substrate and a ceramic layer which uses a dielectric ceramic material capable of being simultaneously sintered with a low-resistance conductive material such as a low-melting metal (Ag or Cu); and a method for producing the ceramic substrate. The ceramic substrate of the present invention is obtained by stacking and bonding a silicon nitride substrate and a ceramic layer composed of a dielectric ceramic material, wherein: the dielectric ceramic material contains Mg, Al, and Si as main ingredients, and Bi or B as an accessory ingredient; and the ceramic layer includes a region with a high Si element concentration at a bonding interface with the silicon nitride substrate.
    Type: Application
    Filed: March 10, 2017
    Publication date: February 14, 2019
    Applicant: HITACHI METALS, LTD.
    Inventors: Hiroyuki ITOH, Shinroh ITOH
  • Patent number: 8455833
    Abstract: A method for producing a single crystal scintillator material according to the present invention includes the steps of: providing a solvent including: at least one element selected from the group consisting of Li, Na, K, Rb and Cs; W and/or Mo; B; and oxygen; melting a Ce compound and a Lu compound that have been mixed with the solvent by heating the mixture to a temperature of 800° C. to 1,350° C.; and growing a single crystal by cooling the compounds melted. The single crystal is represented by the compositional formula (CexLu1-x)BO3, in which the mole fraction x of Ce satisfies 0.0001?x?0.05.
    Type: Grant
    Filed: September 28, 2009
    Date of Patent: June 4, 2013
    Assignee: Hitachi Metals, Ltd.
    Inventors: Hiroyuki Okuda, Naoyuki Okamoto, Shinroh Itoh
  • Patent number: 8138959
    Abstract: A radio wave absorption material is characterized to be obtained by firing a ferrite material that is formed by adding an accessory component, 0.1 to 2 wt % of CoO, to an oxide magnetic material containing main components, 30 to 49.5 mol % of Fe2O3, 0.5 to 20 mol % of Mn2O3, 5 to 35 mol % of ZnO, 0.2 to 15 mol % of (Li0.5Fe0.5)O and MnO as the rest. In the above-mentioned composition, part of ZnO may be replaced with 20 mol % or less of CuO. This radio wave absorption material has high strength and humidity stability and has excellent radio wave absorption performance although low in cost.
    Type: Grant
    Filed: October 18, 2007
    Date of Patent: March 20, 2012
    Assignee: Hitachi Metals, Ltd.
    Inventors: Shinroh Itoh, Yasuharu Miyoshi
  • Publication number: 20110176657
    Abstract: A method for producing a single crystal scintillator material according to the present invention includes the steps of: providing a solvent including: at least one element selected from the group consisting of Li, Na, K, Rb and Cs; W and/or Mo; B; and oxygen; melting a Ce compound and a Lu compound that have been mixed with the solvent by heating the mixture to a temperature of 800° C. to 1,350° C.; and growing a single crystal by cooling the compounds melted. The single crystal is represented by the compositional formula (CexLu1-x)BO3, in which the mole fraction x of Ce satisfies 0.0001?x?0.05.
    Type: Application
    Filed: September 28, 2009
    Publication date: July 21, 2011
    Applicant: HITACHI METALS, LTD.
    Inventors: Hiroyuki Okuda, Naoyuki Okamoto, Shinroh Itoh
  • Publication number: 20100045505
    Abstract: A radio wave absorption material is characterized to be obtained by firing a ferrite material that is formed by adding an accessory component, 0.1 to 2 wt % of CoO, to an oxide magnetic material containing main components, 30 to 49.5 mol % of Fe2O3, 0.5 to 20 mol % of Mn2O3, 5 to 35 mol % of ZnO, 0.2 to 15 mol % of (Li0.5Fe0.5)O and MnO as the rest. In the above-mentioned composition, part of ZnO may be replaced with 20 mol % or less of CuO. This radio wave absorption material has high strength and humidity stability and has excellent radio wave absorption performance although low in cost.
    Type: Application
    Filed: October 18, 2007
    Publication date: February 25, 2010
    Applicant: HATACHI METALS, LTD.
    Inventors: Shinroh Itoh, Yasuharu Miyoshi