Abstract: Provided is a low reflection glass excellent in the abrasion resistance, the weather resistance, and the productivity. A low reflection glass includes a glass substrate and an antireflection film formed on the surface of the glass substrate. The antireflection film includes an interlayer and an outermost layer. The outermost layer contains Si atoms, C atoms and O atoms, and the content of C atoms is from 0.5 to 3 mol. % based on 100 mol. % of the total amount of Si, C and O atoms. The interlayer is a high refractive index layer or a light absorbing layer. Also provides is a protective plate for a display including a support substrate including the low reflection glass and a conductive film provided on a side where no antireflection film is formed of the support substrate.

Abstract: Provided is a low reflection glass excellent in the abrasion resistance, the weather resistance, the productivity and the outer appearance, and a protective plate for a display. A low reflection glass includes a glass substrate and an antireflection film formed on the surface of the glass substrate. The antireflection film comprises an interlayer and an outermost layer in this order from the glass substrate side; and the outermost layer is a layer containing Si atoms, C atoms and O atoms. The content of C atoms is from 0.5 to 3 mol % based on 100 mol % of the total amount of Si atoms, C atoms and 0 atoms. The interlayer is a layer (a) (high refractive index layer) or a layer (b) (light absorbing layer). A protective plate for a display comprises a support substrate comprising the low reflection glass and a conductive film provided on a side on which no antireflection film is formed of the support substrate.

Abstract: To provide a low reflection glass excellent in the abrasion resistance, the weather resistance, the productivity and the outer appearance, and a protective plate for a display. A low reflection glass 10 comprising a glass substrate 12 and an antireflection film 14 formed on the surface of the glass substrate 12, wherein the antireflection film 14 comprises an interlayer 16 and an outermost layer 18 in this order from the glass substrate 12 side; and the outermost layer 18 is a layer containing Si atoms, C atoms and O atoms, the content of C atoms being from 0.5 to 3 mol % based on 100 mol % of the total amount of Si atoms, C atoms and O atoms, and the interlayer 16 is a layer (a) (high refractive index layer) or a layer (b) (light absorbing layer); and a protective plate for a display, comprising a support substrate comprising the low reflection glass 10 and a conductive film provided on a side on which no antireflection film is formed of the support substrate.

Abstract: It is to provide a process for synthesizing an intended fluorine-containing compound having a geminal difluoro structure with a high yield, by subjecting a carbonyl compound which is readily available to a two-stage reaction.

Abstract: It is to provide a process for synthesizing an intended fluorine-containing compound having a geminal difluoro structure with a high yield, by subjecting a carbonyl compound which is readily available to a two-stage reaction.