Patents by Inventor Shinsuke Kawanishi
Shinsuke Kawanishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230268156Abstract: Tweezers 8, which can grip a sample piece 9, includes a gripping member 8a1 and a gripping member 8a2. The gripping member 8a1 includes a gripping region 8c1 and an abutment region 8b1, and the gripping member 8a2 includes a gripping region 8c2 and an abutment region 8b2. The gripping region 8c1 and the gripping region 8c2 include a gripping surface SF1 and a gripping surface SF2 for gripping the sample piece 9, respectively. The abutment region 8b1 protrudes from the gripping region 8c1 in a direction directed from the gripping surface SF1 to the gripping surface SF2, and the abutment region 8b2 protrudes from the gripping region 8c2 in a direction directed from the gripping surface SF2 to the gripping surface SF1.Type: ApplicationFiled: May 1, 2020Publication date: August 24, 2023Inventors: Naoki SAMURA, Tsunenori NOMAGUCHI, Shinsuke KAWANISHI, Yaku MAEDA
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Patent number: 10157724Abstract: In a scanning electron microscope, an atmospheric pressure space having a specimen arranged therein and a vacuum space arranged on a charged particle optical system side are isolated from each other using an isolation film that transmits charged particle beams. The scanning electron microscope has an electron optical lens barrel, a chassis, and an isolation film. The electron optical lens barrel radiates a primary electron beam onto a specimen. The chassis is directly bonded to the inside of the electron optical lens barrel and has an inside that turns into a lower vacuum state than the inside of the electron optical lens barrel at least during the radiation of the primary electron beam. The isolation film isolates a space in an atmospheric pressure atmosphere having a specimen mounted therein and the inside of the chassis in a lower vacuum state, and transmits the primary charged particle beam.Type: GrantFiled: December 27, 2017Date of Patent: December 18, 2018Assignee: Hitachi High-Technologies CorporationInventors: Shinsuke Kawanishi, Yusuke Ominami
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Patent number: 10141157Abstract: In a device for performing observation with a charged particle microscope at an atmospheric pressure using a diaphragm, while there was a demand that a distance between the diaphragm and a sample be reduced as much as possible, there was a problem that a limit for how close the diaphragm and the sample can be brought to each other was unknown in the past. In the present invention, a height adjustment member is used, and the position of a diaphragm in a charged particle beam device with respect to the height adjustment member is defined as the specific point of an optical device, so that the positional relationship between the height adjustment member and the diaphragm in the optical device is reproduced, and the height of a sample table with a Z-axis driving mechanism is adjusted so as to locate the surface of the sample at the position of the specific point of the optical device.Type: GrantFiled: June 29, 2015Date of Patent: November 27, 2018Assignee: Hitachi High-Technologies CorporationInventors: Makoto Nakabayashi, Yuusuke Oominami, Shinsuke Kawanishi
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Publication number: 20180174796Abstract: In a device for performing observation with a charged particle microscope at an atmospheric pressure using a diaphragm, while there was a demand that a distance between the diaphragm and a sample be reduced as much as possible, there was a problem that a limit for how close the diaphragm and the sample can be brought to each other was unknown in the past. In the present invention, a height adjustment member is used, and the position of a diaphragm in a charged particle beam device with respect to the height adjustment member is defined as the specific point of an optical device, so that the positional relationship between the height adjustment member and the diaphragm in the optical device is reproduced, and the height of a sample table with a Z-axis driving mechanism is adjusted so as to locate the surface of the sample at the position of the specific point of the optical device.Type: ApplicationFiled: June 29, 2015Publication date: June 21, 2018Inventors: Makoto NAKABAYASHI, Yuusuke OOMINAMI, Shinsuke KAWANISHI
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Publication number: 20180122617Abstract: In a scanning electron microscope, an atmospheric pressure space having a specimen arranged therein and a vacuum space arranged on a charged particle optical system side are isolated from each other using an isolation film that transmits charged particle beams. The scanning electron microscope has an electron optical lens barrel, a chassis, and an isolation film. The electron optical lens barrel radiates a primary electron beam onto a specimen. The chassis is directly bonded to the inside of the electron optical lens barrel and has an inside that turns into a lower vacuum state than the inside of the electron optical lens barrel at least during the radiation of the primary electron beam. The isolation film isolates a space in an atmospheric pressure atmosphere having a specimen mounted therein and the inside of the chassis in a lower vacuum state, and transmits the primary charged particle beam.Type: ApplicationFiled: December 27, 2017Publication date: May 3, 2018Inventors: Shinsuke KAWANISHI, Yusuke OMINAMI
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Patent number: 9875877Abstract: In a scanning electron microscope, an atmospheric pressure space having a specimen arranged therein and a vacuum space arranged on a charged particle optical system side are isolated from each other using an isolation film that transmits charged particle beams. The scanning electron microscope has an electron optical lens barrel, a chassis, and an isolation film. The electron optical lens barrel radiates a primary electron beam onto a specimen. The chassis is directly bonded to the inside of the electron optical lens barrel and has an inside that turns into a lower vacuum state than the inside of the electron optical lens barrel at least during the radiation of the primary electron beam. The isolation film isolates a space in an atmospheric pressure atmosphere having a specimen mounted therein and the inside of the chassis in a lower vacuum state, and transmits the primary charged particle beam.Type: GrantFiled: February 10, 2015Date of Patent: January 23, 2018Assignee: Hitachi High-Technologies CorporationInventors: Shinsuke Kawanishi, Yuusuke Oominami
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Patent number: 9824854Abstract: Provided is a charged particle beam device capable of observing the interior and the surface of a sample in a simple manner. This charged particle beam device operates in a transmitted charged particle image mode and a secondary charged particle image mode. In the transmitted charged particle image mode, a transmitted charged particle image is produced on the basis of a detection signal (512) associated with light emitted from a light-emitting member (500) that emits light upon being irradiated with transmitted charged particles transmitted through the interior of a sample (6). In the secondary charged particle image mode, a secondary charged particle image is produced on the basis of a detection signal (518) caused by reflected charged particles or secondary charged particles (517) from the sample (6).Type: GrantFiled: December 24, 2014Date of Patent: November 21, 2017Assignee: Hitachi High-Technologies CorporationInventors: Yusuke Ominami, Junichi Katane, Shinsuke Kawanishi, Sukehiro Ito
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Patent number: 9741530Abstract: A charged-particle-beam device is provided with a data processing unit that removes, from a detector signal, the effect that scattering of a primary charged-particle beam before the primary charged-particle beam reaches a specimen has on the spot shape of the primary charged-particle beam. For example, when using an electron microscope to observe a specimen in a non-vacuum atmosphere, the effect that scattering of a primary charged-particle beam due to a barrier film or a gas present in a non-vacuum space has on the spot shape of the primary charged-particle beam is removed from a signal acquired by a detector. This makes it easy to obtain high-quality images.Type: GrantFiled: December 3, 2014Date of Patent: August 22, 2017Assignee: Hitachi High-Technologies CorporationInventors: Yusuke Ominami, Kenji Nakahira, Maki Tanaka, Shinsuke Kawanishi
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Patent number: 9741526Abstract: Disclosed is a charged particle beam apparatus wherein a partitioning film capable of transmitting a charged particle beam is provided between a charged particle optical system and a sample, said charged particle beam apparatus eliminating a contact between the sample and the partitioning film even in the cases where the sample has recesses and protrusions. On the basis of detection signals or an image generated on the basis of the detection signals, a distance between a sample and a partitioning film is monitored, said detection signals being outputted from a detector that detects secondary charged particles discharged from the sample due to irradiation of a primary charged particle beam.Type: GrantFiled: March 10, 2014Date of Patent: August 22, 2017Assignee: Hitachi High-Technologies CorporationInventors: Yusuke Ominami, Masako Nishimura, Shinsuke Kawanishi, Hiroyuki Suzuki
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Patent number: 9633817Abstract: Conventional devices have been difficult to use due to insufficient consideration being given to factors such as the cost necessary for diaphragm replacement and the convenience of the work. In the present invention, a diaphragm mounting member installed in a charged particle beam device for radiating a primary charged particle beam through a diaphragm separating a vacuum space and an atmospheric pressure space onto a sample placed in the atmospheric pressure space is provided with a diaphragm installation portion to which a TEM membrane is mounted and a casing fixing portion mounted on a casing of the charged particle beam device. The diaphragm installation portion has a positioning structure for positioning a platform on which the diaphragm is held.Type: GrantFiled: March 10, 2014Date of Patent: April 25, 2017Assignee: Hitachi High-Technologies CorporationInventors: Shinsuke Kawanishi, Yusuke Ominami, Hiroyuki Suzuki, Masahiko Ajima
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Patent number: 9564288Abstract: A sample storage container of the present invention includes: a storage container (100) that stores a sample (6) under an atmosphere different from an atmosphere of an outside; a diaphragm (10) through which a charged particle beam passes through or transmits; a sample stage (103) that is arranged inside the storage container (100) and that is capable of moving a relative position of the sample (6) to the diaphragm (10) in a horizontal direction and in a vertical direction under an atmospheric state where the atmospheric states inside the storage container and outside the storage container are different each other; and an operating section (104) that moves the sample stage (103) from an outside of the storage container (100), wherein the sample storage container is set in a state where the sample (6) is stored in a vacuum chamber of a charged particle beam apparatus.Type: GrantFiled: October 29, 2013Date of Patent: February 7, 2017Assignee: Hitachi High-Technologies CorporationInventors: Yusuke Ominami, Shinsuke Kawanishi, Hiroyuki Suzuki
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Publication number: 20160343538Abstract: In a scanning electron microscope, an atmospheric pressure space having a specimen arranged therein and a vacuum space arranged on a charged particle optical system side are isolated from each other using an isolation film that transmits charged particle beams. The scanning electron microscope has an electron optical lens barrel, a chassis, and an isolation film. The electron optical lens barrel radiates a primary electron beam onto a specimen. The chassis is directly bonded to the inside of the electron optical lens barrel and has an inside that turns into a lower vacuum state than the inside of the electron optical lens barrel at least during the radiation of the primary electron beam. The isolation film isolates a space in an atmospheric pressure atmosphere having a specimen mounted therein and the inside of the chassis in a lower vacuum state, and transmits the primary charged particle beam.Type: ApplicationFiled: February 10, 2015Publication date: November 24, 2016Inventors: Shinsuke KAWANISHI, Yuusuke OOMINAMI
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Publication number: 20160336145Abstract: A charged-particle-beam device is provided with a data processing unit that removes, from a detector signal, the effect that scattering of a primary charged-particle beam before the primary charged-particle beam reaches a specimen has on the spot shape of the primary charged-particle beam. For example, when using an electron microscope to observe a specimen in a non-vacuum atmosphere, the effect that scattering of a primary charged-particle beam due to a barrier film or a gas present in a non-vacuum space has on the spot shape of the primary charged-particle beam is removed from a signal acquired by a detector. This makes it easy to obtain high-quality images.Type: ApplicationFiled: December 3, 2014Publication date: November 17, 2016Applicant: Hitachi High-Technologies CorporationInventors: Yusuke OMINAMI, Kenji NAKAHIRA, Maki TANAKA, Shinsuke KAWANISHI
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Publication number: 20160329188Abstract: Provided is a charged particle beam device capable of observing the interior and the surface of a sample in a simple manner. This charged particle beam device operates in a transmitted charged particle image mode and a secondary charged particle image mode. In the transmitted charged particle image mode, a transmitted charged particle image is produced on the basis of a detection signal (512) associated with light emitted from a light-emitting member (500) that emits light upon being irradiated with transmitted charged particles transmitted through the interior of a sample (6). In the secondary charged particle image mode, a secondary charged particle image is produced on the basis of a detection signal (518) caused by reflected charged particles or secondary charged particles (517) from the sample (6).Type: ApplicationFiled: December 24, 2014Publication date: November 10, 2016Inventors: Yusuke OMINAMI, Junichi KATANE, Shinsuke KAWANISHI, Sukehiro ITO
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Patent number: 9472375Abstract: A charged particle beam device provided with: a charged particle optical lens column generating a primary charged particle beam; a housing which has its inside evacuated by a vacuum pump; a first diaphragm that forms a part of the housing and able to keep an airtight state of the interior space of the housing; and a second diaphragm disposed between the first diaphragm and the sample, wherein a primary charged particle beam generated by the charged particle optical lens column is transmitted by or passes through the first diaphragm and the second diaphragm, and then is irradiated, on the sample that is in contact with the second diaphragm.Type: GrantFiled: November 21, 2013Date of Patent: October 18, 2016Assignee: Hitachi High-Technologies CorporationInventors: Yusuke Ominami, Mami Konomi, Shinsuke Kawanishi, Hiroyuki Suzuki
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Patent number: 9466457Abstract: Ordinary charged particle beam apparatuses have each been an apparatus manufactured for dedicated use in making observations in a gas atmosphere at atmospheric pressure or at a pressure substantially equal thereto. There have existed no devices capable of simply making observations using an ordinary high-vacuum charged particle microscope in a gas atmosphere at atmospheric pressure or at a pressure approximately equal thereto. Furthermore, ordinary techniques have been incapable of observing the same spot of the sample in such an atmosphere using a charged particle beam and light simultaneously.Type: GrantFiled: July 1, 2013Date of Patent: October 11, 2016Assignee: Hitachi High-Technologies CorporationInventors: Yusuke Ominami, Mami Konomi, Shinsuke Kawanishi, Sukehiro Ito
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Publication number: 20160203944Abstract: Disclosed is a charged particle beam apparatus wherein a partitioning film capable of transmitting a charged particle beam is provided between a charged particle optical system and a sample, said charged particle beam apparatus eliminating a contact between the sample and the partitioning film even in the cases where the sample has recesses and protrusions. On the basis of detection signals or an image generated on the basis of the detection signals, a distance between a sample and a partitioning film is monitored, said detection signals being outputted from a detector that detects secondary charged particles discharged from the sample due to irradiation of a primary charged particle beam.Type: ApplicationFiled: March 10, 2014Publication date: July 14, 2016Inventors: Yusuke OMINAMI, Masako NISHIMURA, Shinsuke KAWANISHI, Hiroyuki SUZUKI
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Publication number: 20160203941Abstract: Conventional devices have been difficult to use due to insufficient consideration being given to factors such as the cost necessary for diaphragm replacement and the convenience of the work. In the present invention, a diaphragm mounting member installed in a charged particle beam device for radiating a primary charged particle beam through a diaphragm separating a vacuum space and an atmospheric pressure space onto a sample placed in the atmospheric pressure space is provided with a diaphragm installation portion to which a TEM membrane is mounted and a casing fixing portion mounted on a casing of the charged particle beam device. The diaphragm installation portion has a positioning structure for positioning a platform on which the diaphragm is held.Type: ApplicationFiled: March 10, 2014Publication date: July 14, 2016Inventors: Shinsuke KAWANISHI, Yusuke OMINAMI, Hiroyuki SUZUKI, Masahiko AJIMA
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Patent number: 9373480Abstract: In a SEM device which enables observations under an atmospheric pressure, in the event that a diaphragm is damaged during an observation of a sample, air flows into a charged particle optical barrel from the vicinity of the sample, due to the differential pressure between the inside of the charged particle optical barrel under vacuum and the vicinity of the sample under the atmospheric pressure. At this time, the sample may be sucked into the charged particle optical barrel. In this case, a charged particle optical system and a detector are contaminated thereby, which causes performance degradation or failures of the charged particle microscope. For coping therewith, it is necessary to prevent the charged particle optical barrel from being contaminated, without inducing a time lag, with a simple structure.Type: GrantFiled: March 5, 2014Date of Patent: June 21, 2016Assignee: Hitachi High-Technologies CorporationInventors: Shinsuke Kawanishi, Yusuke Ominami, Masahiko Ajima, Hiroyuki Suzuki
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Patent number: 9362083Abstract: There is provided a charged particle beam apparatus having the function of permitting observation of a sample in a gas atmosphere or in a liquid state, the apparatus being intended to let a dry sample be observed as it is getting saturated with an introduced liquid and to prevent a charged particle beam from getting scattered by an unwanted liquid introduced between a diaphragm and the sample. This invention provides a structure including an inlet-outlet part (300) that brings in and out a desired liquid or gas in the direction of the underside or the side of the sample (6), the structure being arranged so that the sample (6) is irradiated with a primary charged particle beam while the sample (6) and the diaphragm (10) are kept out of contact with each other.Type: GrantFiled: July 8, 2013Date of Patent: June 7, 2016Assignee: Hitachi High-Technologies CorporationInventors: Yusuke Ominami, Shinsuke Kawanishi, Hiroyuki Suzuki, Kohtaro Hosoya, Masanari Furiki