Abstract: The semiconductor manufacturing apparatus of the embodiment includes a first roller performing a first release of a release tape, the release tape having a strip-like configuration and having a first end and a second end, the release tape pasted on a protective tape pasted on a second substrate surface of a substrate, the substrate having a first substrate surface and the second substrate surface facing the first substrate surface, the second substrate surface being provided above the first substrate surface, and the first roller performing a first movement in a direction parallel to the second substrate surface from on the first end toward above a center or its vicinity of the second substrate surface; and a second roller performing a second release of the release tape, the second roller performing a second movement in a direction parallel to the second substrate surface from on the second end toward above the center or its vicinity of the second substrate surface.

Abstract: A method for manufacturing a semiconductor device is provided which includes performing an electroplating step to fill concavities formed on a substrate. The electroplating step further includes: performing a first electroplating step; performing a first reverse bias step; performing a second electroplating step; performing a second reverse bias step; and a third electroplating step. The polarity of the first and the second reverse bias steps is different from that of the first electroplating step. A difference between the third current density and the fourth current density is larger than a difference between the first current density and the second current density.