Abstract: A display device includes: a plurality of control lines; a plurality of power supply lines; a plurality of data signal lines; an oxide semiconductor layer; a first metal layer; a gate insulation film; a first inorganic insulation film; a second metal layer; a second inorganic insulation film; and a third metal layer. The oxide semiconductor layer, in a plan view, contains therein insular semiconductor lines between a plurality of drivers and a display area. The semiconductor lines cross the plurality of control lines and the plurality of power supply lines, are in contact with the plurality of control lines via an opening in a gate insulation film, are in contact with the plurality of power supply lines via an opening in the first inorganic insulation film, and have a plurality of waisted portions.

Abstract: A display device includes a plurality of picture elements, wherein a first electrode is formed in each of the plurality of picture elements, a cover layer is formed such that an opening of the first electrode is formed, a spacer in a layer identical to the cover layer is provided between two of the first electrodes, the spacer is formed with a height greater than a height of the cover layer, and an outer edge portion of the spacer is spaced from an outer edge portion of the cover layer.

Abstract: An active matrix substrate including a resin substrate including a plurality of external connection terminals arranged near a display region, the active matrix substrate includes: a plurality of first lead wires each extending from one of the external connection terminals to the display region; and a plurality of second lead wires each extending from one of the external connection terminals to a separation line, the second lead wires being arranged with an arrangement pitch along the separation line, and the arrangement pitch of the second lead wires being greater than an arrangement pitch of the first lead wires.

Abstract: In a TFT layer provided on a base substrate, a first metal film, a first inorganic insulating film, a second metal film, a second inorganic insulating film, a third metal film, a first flattening film, a fourth metal film, and a second flattening film are sequentially layered. In a frame region, a slit is formed in the second flattening film to surround a display region, a first conductive layer formed by the fourth metal film is provided on the first flattening film exposed from the slit, and a TFT of a drive circuit is provided on the base substrate side of the first conductive layer to overlap with the first conductive layer.

Abstract: A display device includes a resin substrate, a TFT layer, a light-emitting element, a frame region, a terminal portion, a bending portion, a plurality of frame wiring lines, and at least a one-layer inorganic film. The light-emitting element includes a metal electrode provided on a flattening film included in the TFT layer. In the bending portion, an opening is formed in at least the one-layer inorganic film. A frame flattening film is provided to fill the opening. The plurality of frame wiring lines are provided on the frame flattening film across the opening. The frame wiring line is formed of a metal material identical to the metal material of the metal electrode. The frame flattening film is formed of a resin material identical to the resin material of the flattening film.

Abstract: Frame wiring lines are provided in a frame region, a flattening film in which a frame-shaped slit is formed in the frame region is provided in the display region and the frame region, a plurality of first electrodes constituting light-emitting elements are provided on the flattening film, and conductive layer made of the same material and formed in the same layer as those of each of the plurality of first electrodes are provided covering at least end faces of the frame wiring lines exposed from the slit.

Abstract: The disclosure has an object to achieve a high level of height precision for spacers on a back plane. A display device includes: edge covers having a plurality of openings in which first electrodes are exposed; and a planarization film having first flat portions, second flat portions, and contact holes. The plurality of openings respectively overlap the first flat portions in a plan view. The second flat portions are located between the plurality of openings in a plan view. Each edge cover overlapping one of the first flat portions in a plan view has, on a second electrode side, a surface that has a first height from a bottom surface of the planarization film on a substrate side. Each second flat portion has, on the second electrode side, a surface that has a second height from the bottom surface. The first height is smaller than the second height.

Abstract: In a display device, a second wiring line extends in a display region and includes an imaginary straight line that extends from the second wiring line in an extension direction of the second wiring line and intersects with an opening of an edge cover. The second wiring line extends along the peripheral edge of the opening without intersecting with the opening of the edge cover.

Abstract: In a display region, etching stopper layers are provided between a plurality of inorganic insulating films, openings are formed in the inorganic insulating films located closer to a light-emitting element than the etching stopper layers so as to expose the upper surfaces of the etching stopper layers, and flattening films are provided in the openings such that the openings are filed with the flattening films.

Abstract: A first conductive layer in the same layer as that of a first electrode is coupled to a third conductive layer and a second electrode in the same layer as that of a third metal layer through a slit formed in a flattening film of a non-display area. Second conductive layers in the same layer as that of a second metal layer are provided to overlap with the slit.

Abstract: In the display device according to the disclosure, a first bank includes a first bank lower portion in the same layer as a flattening film and a first bank upper portion in the same layer as an edge cover. A second bank includes a second bank lower portion in the same layer as the flattening film and a second bank upper portion in the same layer as the edge cover. The first bank upper portion covers an upper surface and a side surface of the first bank lower portion, the side surface being on a side close to a display region. An inclination angle of a side surface of the first bank upper portion on a side close to the display region is larger than an inclination angle of the side surface of the first bank lower portion on the side close to the display region.

Abstract: In a display device, an inorganic insulating layer, a metal layer, a flattering film, a first electrode, an edge cover, a function layer, and a second electrode are formed, in that order, on a base substrate. The edge cover covers an edge of the first electrode and includes a first opening exposing the first electrode. The function layer is formed covering the first opening and an edge of the edge cover. The flattening film includes a first planar portion and a second planar portion having a film thickness smaller than that of the first planar portion, is configured to electrically connect the first electrode and the metal layer via a contact hole formed in the first planar portion, and overlaps the first opening of the edge cover at at least a portion of the second planar portion.

Abstract: In a step of forming a plurality of control lines composed of a first metal layer a first metal layer branch line is formed. In a step of forming a plurality of power source lines composed of a second metal layer a second metal layer connecting portion is formed that connects each power source line with the first metal layer branch line via an opening of a first insulating film. In a step of forming a plurality of data signal lines composed of a third metal layer that is formed on a second insulating film the first metal layer branch line formed in the opening of the first insulating and the second metal layer connecting portion formed in an opening of the second insulating film are etched.

Abstract: The display device includes a non-display area. The non-display area includes: a slit formed in an edge cover; a first conductive layer formed in the same layer as an anode, and being in contact with a cathode; and a second conductive layer formed in the same layer as a capacitance electrode and provided to overlap the slit.

Abstract: A wiring line is provided on a TFT layer, in which the wiring line is formed in the same layer and formed of the same material as those of a reflection electrode. The reflection electrode includes a plurality of metallic conductive layers made up of a low resistance metallic material, an oxide-based lower transparent conductive layer provided on a lower surface side of a lowermost metallic conductive layer constituting a lowermost layer, an oxide-based upper transparent conductive layer having light reflectivity and provided on an upper surface side of an uppermost metallic conductive layer constituting an uppermost layer, and an oxide-based intermediate transparent conductive layer provided between the plurality of metallic conductive layers.

Abstract: A display device includes: a semiconductor film; an inorganic insulating film overlying the semiconductor film; and light-emitting elements overlying the inorganic insulating film, each of the light-emitting elements including a first electrode and a second electrode, wherein the inorganic insulating film has a contact hole there through, and a portion of the first electrode overlaps the contact hole so that the portion of the first electrode is in contact with the semiconductor film in the contact hole.

Abstract: A frame-like bank 35 has two inclined side surfaces, at least one of which forms a taper angle ?2 of not more than 20°. A first sealing film 28, which is an inorganic film, is formed in a display area DA and a non-display area NDA in a manner so as to cover the frame-like bank 35.

Abstract: A display device includes a resin substrate, a TFT layer, a light-emitting element, a frame region, a terminal portion, a bending portion, a plurality of frame wiring lines, and at least a one-layer inorganic film. The light-emitting element includes a metal electrode provided on a flattening film included in the TFT layer. In the bending portion, an opening is formed in at least the one-layer inorganic film. A frame flattening film is provided to fill the opening. The plurality of frame wiring lines are provided on the frame flattening film across the opening. The frame wiring line is formed of a metal material identical to the metal material of the metal electrode. The frame flattening film is formed of a resin material identical to the resin material of the flattening film.

Abstract: A portion of a resin film is precisely cut out when the resin film is peeled off. A rear surface of a glass substrate on which a protrusion is formed is irradiated with a laser beam to peel a resin film from the glass substrate. Then, the protrusion and the resin film formed on the protrusion are left on the glass substrate.

Abstract: A display device includes a TFT layer provided with a terminal configured to receive a signal inputted from an external source, and a terminal wiring line in a lower layer underlying the terminal, and a light emitting element layer in an upper layer overlying the TFT layer. The terminal includes a main portion and a peripheral portion surrounding the main portion. The peripheral portion is covered by a cover film, the terminal wiring line and a lower face of the peripheral portion are in contact, and the main portion and the terminal wiring line overlap via at least one terminal base film.