Abstract: A wear-resistant copper-zinc alloy includes in mass %, 28 to 55% Zn, 0.5 to 2% P, and a balance of Cu and unavoidable impurities, and the wear-resistant copper-zinc alloy has an electrical conductivity of 10 to 33% IACS and a hardness of 3.6[Zn]-55 HBW or more, where [Zn] denotes the Zn content in mass %. Alternatively, a wear-resistant copper-zinc alloy includes in mass %, 40 to 55% Zn, 1 to 6% Mn, and a balance of Cu and unavoidable impurities, and the wear-resistant copper-zinc alloy has an electrical conductivity of 10 to 33% IACS and a hardness of 3.6[Zn]-55 HBW or more, where [Zn] denotes the Zn content in mass %.

Abstract: A wear-resistant copper-zinc alloy includes in mass %, 28 to 55% Zn, 0.5 to 2% P, and a balance of Cu and unavoidable impurities, and the wear-resistant copper-zinc alloy has an electrical conductivity of 10 to 33% IACS and a hardness of 3.6[Zn]-55 HBW or more, where [Zn] denotes the Zn content in mass %. Alternatively, a wear-resistant copper-zinc alloy includes in mass %, 40 to 55% Zn, 1 to 6% Mn, and a balance of Cu and unavoidable impurities, and the wear-resistant copper-zinc alloy has an electrical conductivity of 10 to 33% IACS and a hardness of 3.6[Zn]-55 HBW or more, where [Zn] denotes the Zn content in mass %.

Abstract: A pattern irradiation apparatus includes a light source unit, an objective that irradiates a sample plane with light emitted from the light source unit, a spatial light modulator of a phase modulation type that is arranged at a position conjugate with a pupil position of the objective and that modulates a phase of the light emitted from the light source unit, a light blocking member that is arranged in an optical path between the spatial light modulator and the objective and that is configured to block 0-order light generated by the spatial light modulator, and a control device that makes a correspondence between a focusing position of the 0-order light generated by the spatial light modulator and a position of the light blocking member.

Abstract: An image generation system includes a light detector configured to detect light from a sample; a super-resolution image component transmitter including an objective, configured to transmit the light from the sample including a super-resolution image component that exceeds a cut-off frequency of the objective to the light detector; and an image processor configured to enhance the super-resolution image component of an image of the sample in accordance with an output signal from the light detector. The super-resolution image component transmitter includes a light polarization converter that is placed in an optical path of illumination light for illuminating the sample and that is configured to convert a polarization state of the illumination light to make a polarization direction distribution in the light flux of the illumination light symmetric with respect to an optical axis of the illumination light.

Abstract: An optical apparatus includes: laser; objective that irradiates a sample with laser light; phase-modulation spatial light modulator that is located at a pupil conjugate position of the objective and modulates a phase of the laser light; scan unit that scans the sample with the laser light; detector that detects observation light from the sample; image generating unit that generates a sample image according to a signal from the detector and control information of the scan unit; and controlling unit that sets for the modulator a modulation amount of the phase of laser light in accordance with a pattern to be formed on the sample using the laser light. According to the pattern to be formed on the sample and a pattern of irradiation with the laser light obtained from the image generated by the image generating unit, the controlling unit corrects the modulation amount that is set for the modulator.

Abstract: A pattern irradiation apparatus includes a light source unit, an objective that irradiates a sample plane with light emitted from the light source unit, a spatial light modulator of a phase modulation type that is arranged at a position conjugate with a pupil position of the objective and that modulates a phase of the light emitted from the light source unit, a light blocking member that is arranged in an optical path between the spatial light modulator and the objective and that is configured to block 0-order light generated by the spatial light modulator, and a control device that makes a correspondence between a focusing position of the 0-order light generated by the spatial light modulator and a position of the light blocking member.

Abstract: A pattern irradiation apparatus includes a light source unit, an objective, a spatial light modulator, a light blocking member, and a control device. The objective irradiates a sample plane with light emitted from the light source unit. The spatial light modulator is of a phase modulation type and is arranged at a position conjugate with a pupil position of the objective and modulates a phase of the light emitted from the light source unit. The light blocking member is arranged in an optical path between the spatial light modulator and the objective and is configured to block 0-order light generated by the spatial light modulator. The control device makes a correspondence between a focusing position of the 0-order light generated by the spatial light modulator and a position of the light blocking member.

Abstract: A structure of a specimen is labeled with a material whose state can be switched between a first state and a second state, wherein the material has fluorescence in the first state and does not have fluorescence in the second state when excited by light of a predetermined wavelength. The material in the first state is illuminated with the light and is excited. The excited material is imaged and images having a disparity are obtained. Positions of the material in an in-plane direction perpendicular to an optical axis are identified. A position of the material in a direction of the optical axis is identified by use of the positions of the material in the in-plane direction. Processing including from exciting the material to identifying a position of the material in the optical-axis direction is repeatedly performed so as to obtain a three-dimensional structure of the specimen.

Abstract: An image generation system includes a light detector configured to detect light from a sample; a super-resolution image component transmitter including an objective, configured to transmit the light from the sample including a super-resolution image component that exceeds a cut-off frequency of the objective to the light detector; and an image processor configured to enhance the super-resolution image component of an image of the sample in accordance with an output signal from the light detector. The super-resolution image component transmitter includes a light polarization converter that is placed in an optical path of illumination light for illuminating the sample and that is configured to convert a polarization state of the illumination light to make a polarization direction distribution in the light flux of the illumination light symmetric with respect to an optical axis of the illumination light.

Abstract: A pattern irradiation apparatus includes a light source unit, an objective that irradiates a sample plane with light emitted from the light source unit, a spatial light modulator of a phase modulation type that is arranged at a position conjugate with a pupil position of the objective and that modulates a phase of the light emitted from the light source unit, a light blocking member that is arranged in an optical path between the spatial light modulator and the objective and that is configured to block 0-order light generated by the spatial light modulator, and a control device that makes a correspondence between a focusing position of the 0-order light generated by the spatial light modulator and a position of the light blocking member.

Abstract: An optical apparatus includes: laser; objective that irradiates a sample with laser light; phase-modulation spatial light modulator that is located at a pupil conjugate position of the objective and modulates a phase of the laser light; scan unit that scans the sample with the laser light; detector that detects observation light from the sample; image generating unit that generates a sample image according to a signal from the detector and control information of the scan unit; and controlling unit that sets for the modulator a modulation amount of the phase of laser light in accordance with a pattern to be formed on the sample using the laser light. According to the pattern to be formed on the sample and a pattern of irradiation with the laser light obtained from the image generated by the image generating unit, the controlling unit corrects the modulation amount that is set for the modulator.

Abstract: A patterning method for micro-contact printing involves the steps of: applying a resin on a master having projected patterns, hardening the resin and thereafter removing the hardened resin from the master to make a stamp of the resin; applying a molecular ink including hydrophobic molecules dispersed in a solvent on the stamp; forming micro-contact printed patterns of the hydrophobic molecular layer on a substrate by means of the stamp on which the molecular ink is applied; dipping the substrate with micro-contact printed patterns in a hydrophilic molecule solution dispersed in a solvent to give chemical modification to the areas of the surface of the substrate around the micro-contact printed patterns, the solution including hydrophilic molecules having a chain length shorter than the chain length of hydrophobic molecules included in the molecular ink is used as the hydrophilic molecule solution.

Abstract: A patterning method for micro-contact printing involves the steps of: applying a resin on a master having projected patterns, hardening the resin and thereafter removing the hardened resin from the master to make a stamp of the resin; applying a molecular ink including hydrophobic molecules dispersed in a solvent on the stamp; forming micro-contact printed patterns of the hydrophobic molecular layer on a substrate by means of the stamp on which the molecular ink is applied; dipping the substrate with micro-contact printed patterns in a hydrophilic molecule solution dispersed in a solvent to give chemical modification to the areas of the surface of the substrate around the micro-contact printed patterns, the solution including hydrophilic molecules having a chain length shorter than the chain length of hydrophobic molecules included in the molecular ink is used as the hydrophilic molecule solution.

Abstract: In patterning method with micro-contact printing comprising the steps of: applying resin on a master having projected patterns, hardening the resin and thereafter removing the hardened resin from the master to make a stamp of the resin; applying molecular ink including hydrophobic molecules dispersed in solvent on the stamp and forming micro-contact printed patterns of hydrophobic molecular layer on a substrate by means of the stamp on which the molecular ink is applied and; dipping the substrate with micro-contact printed patterns in hydrophilic molecule solution dispersed in solvent to give chemical modification to the areas of the surface of substrate around the micro-contact printed patterns, solution including hydrophilic molecules having chain length shorter than the chain length of hydrophobic molecules included in the molecular ink is used as the hydrophilic molecule solution.

Abstract: In patterning method with micro-contact printing comprising the steps of: applying resin on a master having projected patterns, hardening the resin and thereafter removing the hardened resin from the master to make a stamp of the resin; applying molecular ink including hydrophobic molecules dispersed in solvent on the stamp and forming micro-contact printed patterns of hydrophobic molecular layer on a substrate by means of the stamp on which the molecular ink is applied and; dipping the substrate with micro-contact printed patterns in hydrophilic molecule solution dispersed in solvent to give chemical modification to the areas of the surface of substrate around the micro-contact printed patterns, solution including hydrophilic molecules having chain length shorter than the chain length of hydrophobic molecules included in the molecular ink is used as the hydrophilic molecule solution.