Patents by Inventor Shintaro Nasu

Shintaro Nasu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CURABLE RESIN COMPOSITION FOR SILICON-CONTAINING RESIST, PATTERN FORMING METHOD, METHOD FOR PRODUCING IMPRINT MOLD, AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE
    Publication number: 20240004294
    Abstract: A curable resin composition for silicon-containing resist including a polymerizable compound, and a polymerization initiator, wherein the polymerizable compound includes a siloxane bond in a molecule, and includes at least one polymerizable functional group; and a ratio of oxygen atoms bonded to a single silicon atom, among oxygen atoms bonded to a silicon atom included in the polymerizable compound, is 10 mol % or less; and the curable resin composition for silicon-containing resist does not contain a solvent, and a viscosity is 20 cPs or less.
    Type: Application
    Filed: October 6, 2021
    Publication date: January 4, 2024
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Yasuhiro OKAWA, Shintaro NASU, Masakazu KANEKO, Hirokazu ODA
  • PHOTOCURABLE RESIN COMPOSITION FOR IMPRINTING, METHOD FOR PRODUCING PHOTOCURABLE RESIN COMPOSITION FOR IMPRINTING, AND METHOD FOR PRODUCING PATTERN FORMED BODY
    Publication number: 20220169774
    Abstract: A photocurable resin composition for imprinting including a polymerizable compound, and a photopolymerization initiator, wherein the polymerizable compound includes a siloxane bond in a molecule, and includes at least one polymerizable functional group, and a ratio of oxygen atoms bonded to a single silicon atom, among oxygen atoms bonded to a silicon atom included in the polymerizable compound, is 10 mol % or less.
    Type: Application
    Filed: March 24, 2020
    Publication date: June 2, 2022
    Applicant: DAI NIPPON PRINTING CO., LTD.
    Inventors: Hirokazu ODA, Shintaro NASU, Masakazu KANEKO
  • Resin composition, and transparent membrane for touch panel sensors and touch panel using same
    Patent number: 9430071
    Abstract: The present invention has a main purpose of providing a resin composition capable of forming a resin film excellent in hardness and heat resistance. To achieve the purpose described above, the present invention provides a resin composition, comprising: a developable polysiloxane containing a developable group and substantially no radically polymerizable group; a polymerizable polysiloxane containing a radically polymerizable group and substantially no developable group; and a polyfunctional monomer.
    Type: Grant
    Filed: March 28, 2013
    Date of Patent: August 30, 2016
    Assignee: DNP FINE CHEMICALS CO., LTD.
    Inventors: Shintaro Nasu, Satoshi Shioda, Hiroshi Takeichi
  • RESIN COMPOSITION, AND TRANSPARENT MEMBRANE FOR TOUCH PANEL SENSORS AND TOUCH PANEL USING SAME
    Publication number: 20150116234
    Abstract: The present invention has a main purpose of providing a resin composition capable of forming a resin film excellent in hardness and heat resistance. To achieve the purpose described above, the present invention provides a resin composition, comprising: a developable polysiloxane containing a developable group and substantially no radically polymerizable group; a polymerizable polysiloxane containing a radically polymerizable group and substantially no developable group; and a polyfunctional monomer.
    Type: Application
    Filed: March 28, 2013
    Publication date: April 30, 2015
    Inventors: Shintaro Nasu, Satoshi Shioda, Hiroshi Takeichi