Patents by Inventor Shintaro Sugawara

Shintaro Sugawara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210355995
    Abstract: A sealing device is disposed between an inner member and an outer member that rotate relative to each other to seal a gap between the inner member and the outer member of the sealing device, and includes a first sealing member including a cylindrical part to be mounted to the outer member, and an annular part that extends radially inward from the cylindrical part toward the inner member; and a second sealing member including a sleeve to be mounted to the inner member, and a flange that extends radially outward from the sleeve, the flange facing the annular part of the first sealing member. The first sealing member includes at least three axial lips made from an elastic material that extends from the annular part toward the flange of the second sealing member. An axial lip disposed radially outer side has an interference that is greater than that of an axial lip disposed radially inner side.
    Type: Application
    Filed: November 5, 2019
    Publication date: November 18, 2021
    Applicant: NOK CORPORATION
    Inventors: Shintaro SUGAWARA, Masahiro SEKI, Yuichi TARUKAWA
  • Publication number: 20210115973
    Abstract: A sealing device disposed between inner and outer members that rotate relative to each other, and that acts to seal a gap between the inner and outer members, and includes a first sealing member to be mounted to the outer member and a second sealing member to be mounted to the inner member. An annular circular protrusion that protrudes toward an annular part of the first sealing member is supported by the second sealing member, and multiple water-discharge protrusions protrude from an inclined surface of circular protrusion. The water-discharge protrusions are arranged in a circumferential direction. Each protrusion includes an inclined side surface that intersects at an acute angle with a rotational direction in which at least one of the inner member and the outer member rotates.
    Type: Application
    Filed: August 9, 2019
    Publication date: April 22, 2021
    Applicant: NOK CORPORATION
    Inventors: Yuya SAKANO, Shintaro SUGAWARA
  • Patent number: 10265989
    Abstract: Provided are a functional cylinder body, including a plurality of layers having magnetic patterns and non-magnetic patterns formed adjacently, and a manufacturing method therefor. The functional cylinder body comprises at least: a cylinder main body; a first functional pattern part, which includes first patterns and first functional patterns, the first patterns having first recess patterns and first non-recess patterns formed by forming recesses on a first material layer made of any one of a magnetic material and a non-magnetic material, the first functional patterns being made of any one of the magnetic material and the non-magnetic material embedded in the first recess patterns; and a second functional pattern part, which is formed in a position of the cylinder main body shallower than a position of the first recess patterns and has magnetic patterns of the magnetic material and non-magnetic patterns of the non-magnetic material formed adjacently.
    Type: Grant
    Filed: March 29, 2016
    Date of Patent: April 23, 2019
    Assignee: THINK LABORATORY CO. LTD
    Inventors: Tatsuo Shigeta, Kaku Shigeta, Shintaro Sugawara
  • Publication number: 20180093467
    Abstract: Provided are a gravure cylinder, which has satisfactory wear resistance as the gravure cylinder and includes a surface reinforcing coating layer having wear resistance equal to or more than that of chromium plating using hexavalent chromium, a method of manufacturing the gravure cylinder, and a method of manufacturing a printed matter using the gravure cylinder. The gravure cylinder includes: a plate base material; a recess layer, which is formed on a surface of the plate base material and includes a large number of recesses formed on the surface; and a surface reinforcing coating layer configured to cover the recess layer with chromium nitride or carbon nitride, in which the surface reinforcing coating layer is formed by reactive sputtering.
    Type: Application
    Filed: March 29, 2016
    Publication date: April 5, 2018
    Applicant: THINK LABORATORY CO., LTD.
    Inventors: Shintaro SUGAWARA, Yoshinobu SATO
  • Publication number: 20180086127
    Abstract: Provided are a functional cylinder body, including a plurality of layers having magnetic patterns and non-magnetic patterns formed adjacently, and a manufacturing method therefor. The functional cylinder body comprises at least: a cylinder main body; a first functional pattern part, which includes first patterns and first functional patterns, the first patterns having first recess patterns and first non-recess patterns formed by forming recesses on a first material layer made of any one of a magnetic material and a non-magnetic material, the first functional patterns being made of any one of the magnetic material and the non-magnetic material embedded in the first recess patterns; and a second functional pattern part, which is formed in a position of the cylinder main body shallower than a position of the first recess patterns and has magnetic patterns of the magnetic material and non-magnetic patterns of the non-magnetic material formed adjacently.
    Type: Application
    Filed: March 29, 2016
    Publication date: March 29, 2018
    Inventors: Tatsuo SHIGETA, Kaku SHIGETA, Shintaro SUGAWARA
  • Publication number: 20180040401
    Abstract: Provided are a functional cylinder body comprising magnetic patterns and non-magnetic patterns formed on a circumferential surface and a manufacturing method therefor.
    Type: Application
    Filed: March 9, 2016
    Publication date: February 8, 2018
    Inventors: Tatsuo SHIGETA, Kaku SHIGETA, Shintaro SUGAWARA
  • Patent number: 9188873
    Abstract: Provided are a substrate with an etching mask which enables high definition patterning and a method of manufacturing the same. A photosensitive material is applied on a surface of a substrate, exposure and development of the photosensitive material are carried out to form a resist pattern, a DLC coating film is formed on the surface of the substrate and a surface of the resist pattern, and the DLC coating film formed on the resist pattern is separated together with the resist pattern to form a DLC pattern on the surface of the substrate.
    Type: Grant
    Filed: February 8, 2012
    Date of Patent: November 17, 2015
    Assignee: THINK LABORATORY CO., LTD.
    Inventors: Kaku Shigeta, Shintaro Sugawara, Tatsuo Shigeta
  • Publication number: 20130337231
    Abstract: Provided are a substrate with an etching mask which enables high definition patterning and a method of manufacturing the same. A photosensitive material is applied on a surface of a substrate, exposure and development of the photosensitive material are carried out to form a resist pattern, a DLC coating film is formed on the surface of the substrate and a surface of the resist pattern, and the DLC coating film formed on the resist pattern is separated together with the resist pattern to form a DLC pattern on the surface of the substrate.
    Type: Application
    Filed: February 8, 2012
    Publication date: December 19, 2013
    Applicant: THINK LABORATORY CO., LTD.
    Inventors: Kaku Shigeta, Shintaro Sugawara, Tatsuo Shigeta