Patents by Inventor Shinya Higuchi

Shinya Higuchi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200288974
    Abstract: A fundus imaging apparatus includes an imaging optical system that irradiates a fundus of a subject eye with light through an objective lens system, and enables to capture a fundus image of the subject eye based on return light from the subject eye, and a diopter correction unit that includes an optical element disposed on an optical path of the imaging optical system and a drive unit driving the optical element, and performs a diopter correction with a diopter value corresponding to a drive amount of the optical element. A drive range of the optical element in the diopter correction unit is set to avoid a specific range being a range in which an artifact caused by reflection light in the objective lens system is maximized.
    Type: Application
    Filed: February 3, 2020
    Publication date: September 17, 2020
    Applicant: NIDEK CO., LTD.
    Inventors: Shinya Iwata, Megumi Tsuchiya, Yukihiro Higuchi
  • Publication number: 20200231688
    Abstract: The present invention provides pharmaceutical compositions comprising second-generation molecules that are superior than TOCILIZUMAB, by altering the amino acid sequences of the variable and constant regions of TOCILIZUMAB, which is a humanized anti-IL-6 receptor IgG1 antibody, to enhance the antigen-neutralizing ability and increase the pharmacokinetics, so that the therapeutic effect is exerted with a less frequency of administration, and the immunogenicity, safety and physicochemical properties (stability and homogeneity) are improved. The present invention also provides methods for producing these pharmaceutical compositions. The present inventors have successfully generated second-generation molecules that are superior to TOCILIZUMAB by appropriately combining amino acid sequence alterations in the CDR domains, variable regions, and constant regions.
    Type: Application
    Filed: April 2, 2020
    Publication date: July 23, 2020
    Applicant: Chugai Seiyaku Kabushiki Kaisha
    Inventors: Tomoyuki Igawa, Shinya Ishii, Atsuhiko Maeda, Mika Sakurai, Tetsuo Kojima, Tatsuhiko Tachibana, Hirotake Shiraiwa, Hiroyuki Tsunoda, Yoshinobu Higuchi
  • Publication number: 20200216591
    Abstract: To provide a modified PTFE excellent in heat resistance. The modified polytetrafluoroethylene comprises a polymer having units based on tetrafluoroethylene and a polymer having units based on a fluorine-free monomer, wherein the endothermic amount ratio R calculated by a prescribed method is at least 0.65.
    Type: Application
    Filed: March 17, 2020
    Publication date: July 9, 2020
    Applicant: AGC Inc.
    Inventors: Shinya HIGUCHI, Shiro Ebata, Takehiro Kose
  • Publication number: 20200216583
    Abstract: To provide a modified polytetrafluoroethylene excellent in breaking strength. The modified polytetrafluoroethylene comprises a polymer having units based on tetrafluoroethylene and a polymer having units based on a monomer represented by formula (1), wherein the content of the units based on a monomer represented by formula (1) is from 10 to 500 mass ppm, to all units in the modified polytetrafluoroethylene, and the standard specific gravity is from 2.155 to 2.175, CH2?CR1-L-R2??Formula (1) wherein R1 represents a hydrogen atom or an alkyl group, L represents a single bond, —CO—O—*, —O—CO—*, or —O—, * represents a bonding position to R2, and R2 represents a hydrogen atom, an alkyl group, or a nitrile group.
    Type: Application
    Filed: March 16, 2020
    Publication date: July 9, 2020
    Applicant: AGC Inc.
    Inventors: Shinya HIGUCHI, Shiro Ebata, Takehiro Kose
  • Publication number: 20200207880
    Abstract: To provide a novel method for producing a modified PTFE. The method for producing a modified polytetrafluoroethylene comprises polymerizing tetrafluoroethylene in an aqueous medium in which a polymer comprising units based on a fluorine-free monomer is present.
    Type: Application
    Filed: March 10, 2020
    Publication date: July 2, 2020
    Applicant: AGC Inc.
    Inventors: Shinya HIGUCHI, Shiro EBATA, Takehiro KOSE
  • Patent number: 10662245
    Abstract: The present invention provides pharmaceutical compositions comprising second-generation molecules that are superior than TOCILIZUMAB, by altering the amino acid sequences of the variable and constant regions of TOCILIZUMAB, which is a humanized anti-IL-6 receptor IgG1 antibody, to enhance the antigen-neutralizing ability and increase the pharmacokinetics, so that the therapeutic effect is exerted with a less frequency of administration, and the immunogenicity, safety and physicochemical properties (stability and homogeneity) are improved. The present invention also provides methods for producing these pharmaceutical compositions. The present inventors have successfully generated second-generation molecules that are superior to TOCILIZUMAB by appropriately combining amino acid sequence alterations in the CDR domains, variable regions, and constant regions.
    Type: Grant
    Filed: October 22, 2014
    Date of Patent: May 26, 2020
    Assignee: Chugai Seiyaku Kabushiki Kaisha
    Inventors: Tomoyuki Igawa, Shinya Ishii, Atsuhiko Maeda, Mika Sakurai, Tetsuo Kojima, Tatsuhiko Tachibana, Hirotake Shiraiwa, Hiroyuki Tsunoda, Yoshinobu Higuchi
  • Patent number: 10663277
    Abstract: An indium phosphide substrate, a method of inspecting thereof and a method of producing thereof are provided, by which an epitaxial film grown on the substrate is rendered excellently uniform, thereby allowing improvement in PL characteristics and electrical characteristics of an epitaxial wafer formed using this epitaxial film. The indium phosphide substrate has a first main surface and a second main surface, a surface roughness Ra1 at a center position on the first main surface, and surface roughnesses Ra2, Ra3, Ra4, and Ra5 at four positions arranged equidistantly along an outer edge of the first main surface and located at a distance of 5 mm inwardly from the outer edge. An average value m1 of the surface roughnesses Ra1, Ra2, Ra3, Ra4, and Ra5 is 0.5 nm or less, and a standard deviation ?1 of the surface roughnesses Ra1, Ra2, Ra3, Ra4, and Ra5 is 0.2 nm or less.
    Type: Grant
    Filed: August 14, 2019
    Date of Patent: May 26, 2020
    Assignee: SUMITOMO ELECTRIC INDUSTRIES, LTD.
    Inventors: Shinya Fujiwara, Yasuaki Higuchi
  • Publication number: 20200095353
    Abstract: To provide a modified PTFE which can be formed under a low extrusion pressure and with which changes of the extrusion pressure are suppressed, even in paste extrusion at a high RR ratio, and its production method. A modified polytetrafluoroethylene having units based on tetrafluoroethylene, units based on a monomer represented by the following formula (1) and units based on a monomer represented by the following formula (2), wherein the content of the units based on the monomer represented by the formula (1) is from 0.020 to 0.040 mass % to all units of the modified polytetrafluoroethylene, and the content of the units based on the monomer represented by the formula (2) is from 0.003 to 0.080 mass % to all units of the modified polytetrafluoroethylene: CH2?CH—CnF2n+1??(1) wherein n is from 2 to 6; CF2?CFO(LO)mRf??(2) wherein L is a perfluoroalkylene group, Rf is a perfluoroalkyl group, and m is an integer of from 0 to 4.
    Type: Application
    Filed: November 15, 2019
    Publication date: March 26, 2020
    Applicant: AGC Inc
    Inventors: Shinya Higuchi, Masahiro Takazawa, Takehiro Kose
  • Publication number: 20200041247
    Abstract: An indium phosphide substrate, a method of inspecting thereof and a method of producing thereof are provided, by which an epitaxial film grown on the substrate is rendered excellently uniform, thereby allowing improvement in PL characteristics and electrical characteristics of an epitaxial wafer formed using this epitaxial film. The indium phosphide substrate has a first main surface and a second main surface, a surface roughness Ra1 at a center position on the first main surface, and surface roughnesses Ra2, Ra3, Ra4, and Ra5 at four positions arranged equidistantly along an outer edge of the first main surface and located at a distance of 5 mm inwardly from the outer edge. An average value m1 of the surface roughnesses Ra1, Ra2, Ra3, Ra4, and Ra5 is 0.5 nm or less, and a standard deviation ?1 of the surface roughnesses Ra1, Ra2, Ra3, Ra4, and Ra5 is 0.2 nm or less.
    Type: Application
    Filed: August 14, 2019
    Publication date: February 6, 2020
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Shinya FUJIWARA, Yasuaki HIGUCHI
  • Publication number: 20190391517
    Abstract: A fixing device is for fixing a developing agent image to a recording sheet by electrostatically spraying a charged fixing solution toward the developing agent image on the sheet. The fixing device includes a container portion, a plurality of nozzles, and a potential difference generating portion. The container portion is configured to store therein the fixing solution. The plurality of nozzles is in communication with the container portion and configured to spray the fixing solution toward the developing agent image. The potential difference generating portion is configured to generate a potential difference between the fixing solution stored in the plurality of nozzles and the recording sheet conveyed at a position separated from the plurality of nozzles.
    Type: Application
    Filed: August 30, 2019
    Publication date: December 26, 2019
    Inventors: Yutaka Kakigahara, Kengo Takeda, Jun Mihara, Satoshi Murata, Shinya Yamamoto, Tomoaki Hattori, Kumiko Sakaguchi, Takayuki Higuchi, Tatsuya Ezaka, Emi Shimizu, Kentaro Murayama
  • Patent number: 10509351
    Abstract: A fixing device is for fixing a developing agent image to a recording sheet by electrostatically spraying a charged fixing solution toward the developing agent image on the sheet. The fixing device includes a container portion, a plurality of nozzles, and a potential difference generating portion. The container portion is configured to store therein the fixing solution. The plurality of nozzles is in communication with the container portion and configured to spray the fixing solution toward the developing agent image. The potential difference generating portion is configured to generate a potential difference between the fixing solution stored in the plurality of nozzles and the recording sheet conveyed at a position separated from the plurality of nozzles.
    Type: Grant
    Filed: March 29, 2018
    Date of Patent: December 17, 2019
    Assignee: Brother Kogyo Kabushiki Kaisha
    Inventors: Yutaka Kakigahara, Kengo Takeda, Jun Mihara, Satoshi Murata, Shinya Yamamoto, Tomoaki Hattori, Kumiko Sakaguchi, Takayuki Higuchi, Tatsuya Ezaka, Emi Shimizu, Kentaro Murayama
  • Patent number: 10473445
    Abstract: An indium phosphide substrate, a method of inspecting thereof and a method of producing thereof are provided, by which an epitaxial film grown on the substrate is rendered excellently uniform, thereby allowing improvement in PL characteristics and electrical characteristics of an epitaxial wafer formed using this epitaxial film. The indium phosphide substrate has a first main surface and a second main surface, a surface roughness Ra1 at a center position on the first main surface, and surface roughnesses Ra2, Ra3, Ra4, and Ra5 at four positions arranged equidistantly along an outer edge of the first main surface and located at a distance of 5 mm inwardly from the outer edge. An average value m1 of the surface roughnesses Ra1, Ra2, Ra3, Ra4, and Ra5 is 0.5 nm or less, and a standard deviation ?1 of the surface roughnesses Ra1, Ra2, Ra3, Ra4, and Ra5 is 0.2 nm or less.
    Type: Grant
    Filed: December 7, 2015
    Date of Patent: November 12, 2019
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Shinya Fujiwara, Yasuaki Higuchi
  • Patent number: 10436566
    Abstract: An indium phosphide substrate, a method of inspecting thereof and a method of producing thereof are provided, by which an epitaxial film grown on the substrate is rendered excellently uniform, thereby allowing improvement in PL characteristics and electrical characteristics of an epitaxial wafer formed using this epitaxial film. The indium phosphide substrate has a first main surface and a second main surface, a surface roughness Ra1 at a center position on the first main surface, and surface roughnesses Ra2, Ra3, Ra4, and Ra5 at four positions arranged equidistantly along an outer edge of the first main surface and located at a distance of 5 mm inwardly from the outer edge. An average value m1 of the surface roughnesses Ra1, Ra2, Ra3, Ra4, and Ra5 is 0.5 nm or less, and a standard deviation ?1 of the surface roughnesses Ra1, Ra2, Ra3, Ra4, and Ra5 is 0.2 nm or less.
    Type: Grant
    Filed: December 7, 2015
    Date of Patent: October 8, 2019
    Assignee: Sumitomo Electric Industries, Ltd.
    Inventors: Shinya Fujiwara, Yasuaki Higuchi
  • Publication number: 20190257002
    Abstract: A GaAs substrate has a first surface. The sum of the number of particles having a longer diameter of more than or equal to 0.16 ?m which are present in the first surface, per cm2 of the first surface, and the number of damages having a longer diameter of more than or equal to 0.16 ?m which are present in a second surface, per cm2 of the second surface, is less than or equal to 2.1, the second surface being formed by etching the first surface by 0.5 ?m in a depth direction.
    Type: Application
    Filed: May 26, 2017
    Publication date: August 22, 2019
    Applicant: Sumitomo Electric Industries, Ltd.
    Inventors: Shinya FUJIWARA, Yasuaki HIGUCHI
  • Publication number: 20180298160
    Abstract: To provide a polytetrafluoroethylene aqueous dispersion which is excellent in mechanical stability, while being not susceptible to foaming. The polytetrafluoroethylene aqueous dispersion comprises: 15 to 70 mass % of polytetrafluoroethylene particles having an average primary particle size of 0.1 to 0.5 ?m; 0.1 to 20,000 ppm, to the mass of the polytetrafluoroethylene particles, of a fluorinated emulsifier selected from C4-7 fluorinated carboxylic acids which may have an ether oxygen atom, and salts thereof; 1 to 20 parts by mass, per 100 parts by mass of the PTFE particles, of a nonionic surfactant represented by R1—O-A-H (wherein R1 is a C8-18 alkyl group, and A is a polyoxyalkylene chain); 0.01 to 3.0 parts by mass, per 100 parts by mass of the polytetrafluoroethylene particles, of a compound represented by the formula (2) (wherein R is a C2-4 alkyl group, n is 1 or 2, and each of m1 and m2 is an average repeating number of oxyethylene groups, with (m1+m2) being 1 to 6); and water.
    Type: Application
    Filed: May 9, 2018
    Publication date: October 18, 2018
    Applicants: ASAHI GLASS COMPANY, LIMITED, AGC CHEMICALS EUROPE, LIMITED
    Inventors: Shigeki KOBAYASHI, Hiroki NAGAI, Shinya HIGUCHI, Akiko TANAKA, Masahiro TAKAZAWA, Ariana Claudia MORGOVAN-ENE, Anthony Eugene WADE, Diane CAINE
  • Publication number: 20180298131
    Abstract: To provide a method for producing a tetrafluoroethylene copolymer-containing aqueous dispersion excellent in stability against a mechanical stress.
    Type: Application
    Filed: May 11, 2018
    Publication date: October 18, 2018
    Applicants: ASAHI GLASS COMPANY, LIMITED, AGC CHEMICALS EUROPE, LIMITED
    Inventors: Shigeki Kobayashi, Hiroki Nagai, Shinya Higuchi, Akiko Tanaka, Masahiro Takazawa, Ariana Claudia Morgovan-Ene, Anthony Eugene Wade, Diane Caine
  • Publication number: 20180142043
    Abstract: To provide a production method for an aqueous emulsion of modified polytetrafluoroethylene which is environmentally friendly and which is suitable for producing a stretched porous body having excellent breaking strength. A production method for an aqueous emulsion of modified polytetrafluoroethylene, which is a method to obtain an aqueous emulsion of modified polytetrafluoroethylene particles having an average primary particle diameter of from 0.10 to 0.30 ?m, by subjecting tetrafluoroethylene and a perfluoroalkyl ethylene to emulsion polymerization in an aqueous medium, using a polymerization initiator, in the presence of a fluorinated anionic surfactant having a LogPOW of from 2.4 to 3.
    Type: Application
    Filed: January 19, 2018
    Publication date: May 24, 2018
    Applicant: Asahi Glass Company, Limited
    Inventors: Shinya Higuchi, Hiroki Nagai, Shigeki Kobayashi
  • Patent number: 9718930
    Abstract: To provide a process for producing a PTFE molding powder having a high bulk density from granular polymer particles without using an emulsifying agent having problems of bioaccumulation and toxicity. A process for producing a polytetrafluoroethylene molding powder, which comprises a step of suspension-polymerizing a monomer containing at least 99.8 mass % of tetrafluoroethylene in an aqueous medium to produce granular polymer particles and a step of milling the granular polymer particles, wherein the aqueous medium contains a compound represented by RF(OCF(X1)CF2)k-1OCF(X2)COO?M+, at a concentration of from 0.5 to 2,000 ppm. RF is a perfluorinated C1-10 monovalent organic group, X1 and X2 are fluorine atoms, etc., and M+ is an ammonium ion or the like.
    Type: Grant
    Filed: July 13, 2015
    Date of Patent: August 1, 2017
    Assignee: Asahi Glass Company, Limited
    Inventors: Shinya Higuchi, Masahiro Takazawa, Hiroki Nagai
  • Patent number: 9376520
    Abstract: To produce a PTFE aqueous emulsion, whereby the environmental load is little, the stability of the aqueous emulsion is high, and a molded product having high heat resistance can be obtained. A process for producing a PTFE aqueous emulsion, which comprises emulsion-polymerizing tetrafluoroethylene (TFE) by means of at least one fluorinated emulsifier selected from the group consisting of a C4-8 fluorinated carboxylic acid having from 1 to 4 etheric oxygen atoms in its main chain, and its salts, to obtain an aqueous emulsion containing polytetrafluoroethylene (PTFE) microparticles having an average primary particle size of from 0.1 to 0.3 ?m, wherein at the beginning of the emulsion polymerization of TFE, a (polyfluoroalkyl)ethylene (a) represented by “CH2?CH—Rf1”, and/or a comonomer (b) having a monomer reactivity ratio rTFE of from 0.1 to 8 in copolymerization with tetrafluoroethylene, is incorporated to the emulsion polymerization system, so as to be from 0.001 to 0.
    Type: Grant
    Filed: April 16, 2012
    Date of Patent: June 28, 2016
    Assignee: Asahi Glass Company, Limited
    Inventors: Shinya Higuchi, Yasuhiko Matsuoka, Shigeki Kobayashi
  • Publication number: 20150315342
    Abstract: To provide a process for producing a PTFE molding powder having a high bulk density from granular polymer particles without using an emulsifying agent having problems of bioaccumulation and toxicity. A process for producing a polytetrafluoroethylene molding powder, which comprises a step of suspension-polymerizing a monomer containing at least 99.8 mass % of tetrafluoroethylene in an aqueous medium to produce granular polymer particles and a step of milling the granular polymer particles, wherein the aqueous medium contains a compound represented by RF(OCF(X1)CF2)k-1OCF(X2)COO?M+, at a concentration of from 0.5 to 2,000 ppm. RF is a perfluorinated C1-10 monovalent organic group, X1 and X2 are fluorine atoms, etc., and M+ is an ammonium ion or the like.
    Type: Application
    Filed: July 13, 2015
    Publication date: November 5, 2015
    Applicant: ASAHI GLASS COMPANY, LIMITED
    Inventors: Shinya HIGUCHI, Masahiro Takazawa, Hiroki Nagai