Patents by Inventor Shinya Inagaki

Shinya Inagaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10241408
    Abstract: The purpose of the present invention is to provide: a photosensitive epoxy resin composition and/or a resist laminate of said resin composition that makes it possible to use photolithography to form an image having a vertical sidewall shape and fine resolution, low stress, and heat/humidity resistance; and a cured product of said resin composition and said resist laminate. The present invention is a photosensitive resin composition comprising: (A) an epoxy resin; (B) a polyol compound having a specific structure; (C) a photocationic polymerization initiator; and (D) an epoxy group-containing silane compound. The epoxy resin (A) comprises: an epoxy resin (a) obtained by reacting a phenol derivative that is represented by formula (1) with an epihalohydrin; and an epoxy resin (b) that is represented by formula (2).
    Type: Grant
    Filed: October 25, 2013
    Date of Patent: March 26, 2019
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Naoko Imaizumi, Shinya Inagaki, Nao Honda
  • Patent number: 10012901
    Abstract: The purpose of the present invention is to provide the following: a photosensitive epoxy resin composition that, via photolithography, can form a high-resolution, low-stress image that has vertical side walls and resists moisture and heat, and/or a resist laminate using said photosensitive epoxy resin composition; and an article or articles obtained by curing said photosensitive epoxy resin composition and/or resist laminate. The present invention is a photosensitive resin composition containing the following: an epoxy resin (A), a polyol compound (B) having a specific structure, a cationic-polymerization photoinitiator (C), a silane compound (D) containing an epoxy group, and a reactive epoxy monomer (E) having a specific structure. The epoxy resin (A) contains the phenol derivative represented by formula (1), an epoxy resin (a) obtained via a reaction with epihalohydrin, and an epoxy resin (b) that can be represented by formula (2).
    Type: Grant
    Filed: November 21, 2013
    Date of Patent: July 3, 2018
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Naoko Imaizumi, Shinya Inagaki, Nao Honda
  • Patent number: 9857685
    Abstract: The purpose of the present invention is to provide: a resin composition, a cured product of which has extremely low residual stress and exhibits excellent adhesion to a metal substrate such as a Pt, LT or Ta substrate after a wet heat test in the fields of semiconductors and MEMS/micromachine applications; a laminate of this resin composition; and a cured product of this resin composition or the laminate. The present invention is a photosensitive resin composition which contains an epoxy resin (A), a compound having a phenolic hydroxyl group (B) and a cationic photopolymerization initiator (C), and wherein: the epoxy resin (A) has a weighted average epoxy equivalent weight of 300 g/eq. or more; 20% by mass or more of the epoxy resin (A) is an epoxy resin represented by formula (1) and having an epoxy equivalent weight of 500-4,500 g/eq.; and the compound having a phenolic hydroxyl group (B) contains a phenolic compound having a specific structure.
    Type: Grant
    Filed: June 9, 2015
    Date of Patent: January 2, 2018
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Naoko Imaizumi, Yoshiyuki Ono, Takanori Koizumi, Maki Kumagai, Shinya Inagaki
  • Patent number: 9684239
    Abstract: The purpose of the present invention is to provide: a photosensitive epoxy resin composition and/or a resist laminate of said resin composition that makes it possible to use photolithography to form an image having a vertical sidewall shape and fine resolution, low stress, and heat/humidity resistance; and a cured product of said resin composition and said resist laminate. The present invention is a photosensitive resin composition comprising: (A) an epoxy resin; (B) a polyphenol compound having a specific structure; (C) a photocationic polymerization initiator; and (D) an epoxy group-containing silane compound. The epoxy resin (A) comprises: an epoxy resin (a) obtained by reacting a phenol derivative that is represented by formula (1) with an epihalohydrin; and an epoxy resin (b) that is represented by formula (2).
    Type: Grant
    Filed: October 25, 2013
    Date of Patent: June 20, 2017
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Naoko Imaizumi, Shinya Inagaki, Nao Honda
  • Publication number: 20170102614
    Abstract: The purpose of the present invention is to provide: a resin composition, a cured product of which has extremely low residual stress and exhibits excellent adhesion to a metal substrate such as a Pt, LT or Ta substrate after a wet heat test in the fields of semiconductors and MEMS/micromachine applications; a laminate of this resin composition; and a cured product of this resin composition or the laminate. The present invention is a photosensitive resin composition which contains an epoxy resin (A), a compound having a phenolic hydroxyl group (B) and a cationic photopolymerization initiator (C), and wherein: the epoxy resin (A) has a weighted average epoxy equivalent weight of 300 g/eq. or more; 20% by mass or more of the epoxy resin (A) is an epoxy resin represented by formula (1) and having an epoxy equivalent weight of 500-4,500 g/eq.; and the compound having a phenolic hydroxyl group (B) contains a phenolic compound having a specific structure.
    Type: Application
    Filed: June 9, 2015
    Publication date: April 13, 2017
    Inventors: Naoko Imaizumi, Yoshiyuki Ono, Takanori Koizumi, Maki Kumagai, Shinya Inagaki
  • Patent number: 9448479
    Abstract: The purpose of the present invention is to provide the following: a photosensitive epoxy resin composition that, via photolithography, can form a high-resolution, low-stress image that has vertical side walls and resists moisture and heat, and/or a resist laminate using said photosensitive epoxy resin composition; and an article or articles obtained by curing said photosensitive epoxy resin composition and/or resist laminate. The present invention is a photosensitive resin composition containing the following: an epoxy resin (A), a polyhydric phenol compound (B) having a specific structure, a cationic-polymerization photoinitiator (C), a silane compound (D) containing an epoxy group, and a reactive epoxy monomer (E) having a specific structure. The epoxy resin (A) contains the phenol derivative represented by formula (1), an epoxy resin (a) obtained via a reaction with epihalohydrin, and an epoxy resin (b) that can be represented by formula (2). The reactive epoxy monomer (E) is a bisphenol epoxy resin.
    Type: Grant
    Filed: November 21, 2013
    Date of Patent: September 20, 2016
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Naoko Imaizumi, Shinya Inagaki, Nao Honda
  • Patent number: 9411229
    Abstract: A negative photosensitive resin composition which contains (A) an epoxy resin that has two or more epoxy groups in each molecule, (B) an alkali-soluble resin and (C) a cationic photopolymerization initiator. The epoxy resin (A) is an epoxy resin that is obtained by a reaction between a phenol derivative represented by formula (1) and an epihalohydrin.
    Type: Grant
    Filed: June 19, 2012
    Date of Patent: August 9, 2016
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Shinya Inagaki, Nao Honda, Naoko Imaizumi, Misato Oonishi
  • Patent number: 9223212
    Abstract: An alkali-developing-type photosensitive resin composition comprising: a polycarboxylic acid resin (A) obtained by reacting a polybasic anhydride (c) with a reactant (ab) between a difunctional bisphenol epoxy resin (a) having an epoxy group at both terminals and an epoxy equivalent of 600-1300 g/eq., and a monocarboxylic acid compound (b) having an alcoholic hydroxyl group; an epoxy resin (B) having two or more epoxy groups in a molecule; and a photoacid generator (C), wherein the addition ratio the monocarboxylic acid compound (b) with respect to 1 equivalent of the epoxy group of the epoxy resin (a) is 80 equivalent % or more, and the addition ratio the polybasic anhydride with respect to one equivalent of the primary hydroxyl group of the reactant (ab) is 80 equivalent % or more.
    Type: Grant
    Filed: July 26, 2012
    Date of Patent: December 29, 2015
    Assignee: Nippon Kayaku Kabushiki Kaisha
    Inventors: Misato Oonishi, Shinya Inagaki, Naoko Imaizumi, Nao Honda
  • Publication number: 20150309409
    Abstract: The purpose of the present invention is to provide the following: a photosensitive epoxy resin composition that, via photolithography, can form a high-resolution, low-stress image that has vertical side walls and resists moisture and heat, and/or a resist laminate using said photosensitive epoxy resin composition; and an article or articles obtained by curing said photosensitive epoxy resin composition and/or resist laminate. The present invention is a photosensitive resin composition containing the following: an epoxy resin (A), a polyhydric phenol compound (B) having a specific structure, a cationic-polymerization photoinitiator (C), a silane compound (D) containing an epoxy group, and a reactive epoxy monomer (E) having a specific structure. The epoxy resin (A) contains the phenol derivative represented by formula (1), an epoxy resin (a) obtained via a reaction with epihalohydrin, and an epoxy resin (b) that can be represented by formula (2). The reactive epoxy monomer (E) is a bisphenol epoxy resin.
    Type: Application
    Filed: November 21, 2013
    Publication date: October 29, 2015
    Inventors: Naoko Imaizumi, Shinya Inagaki, Nao Honda
  • Publication number: 20150301450
    Abstract: The purpose of the present invention is to provide: a photosensitive epoxy resin composition and/or a resist laminate of said resin composition that makes it possible to use photolithography to form an image having a vertical sidewall shape and fine resolution, low stress, and heat/humidity resistance; and a cured product of said resin composition and said resist laminate. The present invention is a photosensitive resin composition comprising: (A) an epoxy resin; (B) a polyphenol compound having a specific structure; (C) a photocationic polymerization initiator; and (D) an epoxy group-containing silane compound. The epoxy resin (A) comprises: an epoxy resin (a) obtained by reacting a phenol derivative that is represented by formula (1) with an epihalohydrin; and an epoxy resin (b) that is represented by formula (2).
    Type: Application
    Filed: October 25, 2013
    Publication date: October 22, 2015
    Applicant: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Naoko Imaizumi, Shinya Inagaki, Nao Honda
  • Publication number: 20150293444
    Abstract: The purpose of the present invention is to provide the following: a photosensitive epoxy resin composition that, via photolithography, can form a high-resolution, low-stress image that has vertical side walls and resists moisture and heat, and/or a resist laminate using said photosensitive epoxy resin composition; and an article or articles obtained by curing said photosensitive epoxy resin composition and/or resist laminate. The present invention is a photosensitive resin composition containing the following: an epoxy resin (A), a polyol compound (B) having a specific structure, a cationic-polymerization photoinitiator (C), a silane compound (D) containing an epoxy group, and a reactive epoxy monomer (E) having a specific structure. The epoxy resin (A) contains the phenol derivative represented by formula (1), an epoxy resin (a) obtained via a reaction with epihalohydrin, and an epoxy resin (b) that can be represented by formula (2).
    Type: Application
    Filed: November 21, 2013
    Publication date: October 15, 2015
    Inventors: Naoko Imaizumi, Shinya Inagaki, Nao Honda
  • Publication number: 20150293448
    Abstract: The purpose of the present invention is to provide: a photosensitive epoxy resin composition and/or a resist laminate of said resin composition that makes it possible to use photolithography to form an image having a vertical sidewall shape and fine resolution, low stress, and heat/humidity resistance; and a cured product of said resin composition and said resist laminate. The present invention is a photosensitive resin composition comprising: (A) an epoxy resin; (B) a polyol compound having a specific structure; (C) a photocationic polymerization initiator; and (D) an epoxy group-containing silane compound. The epoxy resin (A) comprises: an epoxy resin (a) obtained by reacting a phenol derivative that is represented by formula (1) with an epihalohydrin; and an epoxy resin (b) that is represented by formula (2).
    Type: Application
    Filed: October 25, 2013
    Publication date: October 15, 2015
    Inventors: Naoko Imaizumi, Shinya Inagaki, Nao Honda
  • Publication number: 20140186765
    Abstract: An alkali-developing-type photosensitive resin composition comprising: a polycarboxylic acid resin (A) obtained by reacting a polybasic anhydride (c) with a reactant (ab) between a difunctional bisphenol epoxy resin (a) having an epoxy group at both terminals and an epoxy equivalent of 600-1300 g/eq., and a monocarboxylic acid compound (b) having an alcoholic hydroxyl group; an epoxy resin (B) having two or more epoxy groups in a molecule; and a photoacid generator (C), wherein the addition ratio the monocarboxylic acid compound (b) with respect to 1 equivalent of the epoxy group of the epoxy resin (a) is 80 equivalent % or more, and the addition ratio the polybasic anhydride with respect to one equivalent of the primary hydroxyl group of the reactant (ab) is 80 equivalent % or more.
    Type: Application
    Filed: July 26, 2012
    Publication date: July 3, 2014
    Applicant: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Misato Oonishi, Shinya Inagaki, Naoko Imaizumi, Nao Honda
  • Publication number: 20140099581
    Abstract: A negative photosensitive resin composition which contains (A) an epoxy resin that has two or more epoxy groups in each molecule, (B) an alkali-soluble resin and (C) a cationic photopolymerization initiator. The epoxy resin (A) is an epoxy resin that is obtained by a reaction between a phenol derivative represented by formula (1) and an epihalohydrin.
    Type: Application
    Filed: June 19, 2012
    Publication date: April 10, 2014
    Applicant: NIPPON KAYAKU KABUSHIKI KAISHA
    Inventors: Shinya Inagaki, Nao Honda, Naoko Imaizumi, Misato Oonishi
  • Patent number: 8547629
    Abstract: An optical amplification device which includes first and second optical amplifiers, and a controller. The first optical amplifier receives a light and amplifies the received light. The second optical amplifier receives the light amplified by the first optical amplifier, and amplifies the received light. When a level of the light received by the first optical amplifier changes by ?, the controller controls a level of the light received by the second optical amplifier to change by approximately ??. In various embodiments, the controller causes the sum of the gains of the first and second optical amplifiers to be constant. In other embodiments, the optical amplification device includes first and second optical amplifier and a gain adjustor. The gain adjustor detects a deviation in gain of the first optical amplifier from a target gain, and adjusts the gain of the second optical amplifier to compensate for the detected deviation.
    Type: Grant
    Filed: March 8, 2011
    Date of Patent: October 1, 2013
    Assignee: Fujitsu Limited
    Inventors: Shinya Inagaki, Norifumi Shukunami, Susumu Kinoshita, Hiroyuki Itou, Taiki Kobayashi
  • Patent number: 8194309
    Abstract: The present invention has an object to provide an optical amplifier capable of realizing a good response characteristic in a wide frequency band, even when a population inversion state is formed by a pumping light supplied to an optical amplification medium and an ASE light generated in the optical amplification medium. To this end, in the optical amplifier according to the present invention, a delayed phase matching fiber in which a first fiber whose response speed is relatively low is arranged on the input side and a second fiber whose response speed is relatively high is arranged on the output side, is used as the optical amplification medium doped with a rare-earth element.
    Type: Grant
    Filed: October 26, 2006
    Date of Patent: June 5, 2012
    Assignee: Fujitsu Limited
    Inventors: Takashi Shimizu, Shinya Inagaki, Tomoaki Takeyama, Keiko Sasaki
  • Publication number: 20110164309
    Abstract: An optical amplification device which includes first and second optical amplifiers, and a controller. The first optical amplifier receives a light and amplifies the received light. The second optical amplifier receives the light amplified by the first optical amplifier, and amplifies the received light. When a level of the light received by the first optical amplifier changes by ?, the controller controls a level of the light received by the second optical amplifier to change by approximately ??. In various embodiments, the controller causes the sum of the gains of the first and second optical amplifiers to be constant. In other embodiments, the optical amplification device includes first and second optical amplifier and a gain adjustor. The gain adjustor detects a deviation in gain of the first optical amplifier from a target gain, and adjusts the gain of the second optical amplifier to compensate for the detected deviation.
    Type: Application
    Filed: March 8, 2011
    Publication date: July 7, 2011
    Applicant: Fujitsu Limited
    Inventors: Shinya Inagaki, Norifumi Shukunami, Susumu Kinoshita, Hiroyuki Itou, Taiki Kobayashi
  • Patent number: 7969648
    Abstract: An optical amplification device which includes first and second optical amplifiers, and a controller. The first optical amplifier receives a light and amplifies the received light. The second optical amplifier receives the light amplified by the first optical amplifier, and amplifies the received light. When a level of the light received by the first optical amplifier changes by ?, the controller controls a level of the light received by the second optical amplifier to change by approximately ??. In various embodiments, the controller causes the sum of the gains of the first and second optical amplifiers to be constant. In other embodiments, the optical amplification device includes first and second optical amplifier and a gain adjustor. The gain adjustor detects a deviation in gain of the first optical amplifier from a target gain, and adjusts the gain of the second optical amplifier to compensate for the detected deviation.
    Type: Grant
    Filed: April 19, 2006
    Date of Patent: June 28, 2011
    Assignee: Fujitsu Limited
    Inventors: Shinya Inagaki, Norifumi Shukunami, Susumu Kinoshita, Hiroyuki Itou, Taiki Kobayashi
  • Patent number: 7924499
    Abstract: An optical amplification device which includes first and second optical amplifiers, and a controller. The first optical amplifier receives a light and amplifies the received light. The second optical amplifier receives the light amplified by the first optical amplifier, and amplifies the received light. When a level of the light received by the first optical amplifier changes by ?, the controller controls a level of the light received by the second optical amplifier to change by approximately ??. In various embodiments, the controller causes the sum of the gains of the first and second optical amplifiers to be constant. In other embodiments, the optical amplification device includes first and second optical amplifier and a gain adjustor. The gain adjustor detects a deviation in gain of the first optical amplifier from a target gain, and adjusts the gain of the second optical amplifier to compensate for the detected deviation.
    Type: Grant
    Filed: June 24, 2010
    Date of Patent: April 12, 2011
    Assignee: Fujitsu Limited
    Inventors: Shinya Inagaki, Norifumi Shukunami, Susumu Kinoshita, Hiroyuki Itou, Taiki Kobayashi
  • Publication number: 20100272445
    Abstract: An optical amplification device which includes first and second optical amplifiers, and a controller. The first optical amplifier receives a light and amplifies the received light. The second optical amplifier receives the light amplified by the first optical amplifier, and amplifies the received light. When a level of the light received by the first optical amplifier changes by ?, the controller controls a level of the light received by the second optical amplifier to change by approximately ??. In various embodiments, the controller causes the sum of the gains of the first and second optical amplifiers to be constant. In other embodiments, the optical amplification device includes first and second optical amplifier and a gain adjustor. The gain adjustor detects a deviation in gain of the first optical amplifier from a target gain, and adjusts the gain of the second optical amplifier to compensate for the detected deviation.
    Type: Application
    Filed: June 24, 2010
    Publication date: October 28, 2010
    Applicant: FUJITSU LIMITED
    Inventors: Shinya INAGAKI, Norifumi Shukunami, Susumu Kinoshita, Hiroyuki Itou, Taiki Kobayashi