Abstract: The present invention provides an extrusion coating apparatus which can control the coating shape in end portions regardless of the coating thickness and can suppress high edges. The extrusion coating apparatus includes a coating width regulating plate inserted into both end portions of a slit, a slit die discharging the coating solution from a discharge opening of the slit, and a chamber depressurizing in a web running direction on an upstream side. The coating width regulating plate has a protruded portion bent toward the web downstream side and facing the web. The coating solution is applied to the web in a state in which the coating solution is oozed on a web facing surface of the protruded portion of the coating width regulating plate by depressurization of the chamber.

Abstract: It is an object of the invention to provide a display and a method for repairing defects of the same in which defects such as inter-layer short-circuits and short-circuits in a single that have occurred at steps for manufacturing the display can be easily repaired to provide a good product with a probability higher than that in the related art. Laser irradiation is carried out as a first cycle of laser irradiation by forming a slit S1 in a region where a drain bus line 220 completely covers a gate bus line 218 to form a cut portion longer than the width of the gate bus line 218 adjacent to an inter-layer short-circuit 290 such that it splits an intersecting portion of the drain bus line 220 into two parts as shown in FIG. 5b. Next, as shown in FIG. 5c, slits S2 and S3 are respectively used for second and third cycles of laser irradiation to cut the drain bus line 220 at both ends of the cut portion (indicated by S1), thereby isolating the inter-layer short-circuit 290 of the drain bus line 220.

Abstract: It is an object of the invention to provide a display and a method for repairing defects of the same in which defects such as inter-layer short-circuits and short-circuits in a single that have occurred at steps for manufacturing the display can be easily repaired to provide a good product with a probability higher than that in the related art. Laser irradiation is carried out as a first cycle of laser irradiation by forming a slit S1 in a region where a drain bus line 220 completely covers a gate bus line 218 to form a cut portion longer than the width of the gate bus line 218 adjacent to an inter-layer short-circuit 290 such that it splits an intersecting portion of the drain bus line 220 into two parts as shown in FIG. 5b. Next, as shown in FIG. 5c, slits S2 and S3 are respectively used for second and third cycles of laser irradiation to cut the drain bus line 220 at both ends of the cut portion (indicated by S1), thereby isolating the inter-layer short-circuit 290 of the drain bus line 220.

Abstract: It is an object of the invention to provide a display and a method for repairing defects of the same in which defects such as inter-layer short-circuits and short-circuits in a single that have occurred at steps for manufacturing the display can be easily repaired to provide a good product with a probability higher than that in the related art. Laser irradiation is carried out as a first cycle of laser irradiation by forming a slit S1 in a region where a drain bus line 220 completely covers a gate bus line 218 to form a cut portion longer than the width of the gate bus line 218 adjacent to an inter-layer short-circuit 290 such that it splits an intersecting portion of the drain bus line 220 into two parts as shown in FIG. 5b. Next, as shown in FIG. 5c, slits S2 and S3 are respectively used for second and third cycles of laser irradiation to cut the drain bus line 220 at both ends of the cut portion (indicated by S1), thereby isolating the inter-layer short-circuit 290 of the drain bus line 220.

Abstract: A TMR unit connects a plurality of processors by a bus and simultaneously executes the same processing operation. Among the plurality of processors, one of them is a master and the remaining processors are slaves. Information formed by only the master processor is outputted to the bus. Each processor has a multiplex control circuit. The multiplex control circuit compares output information formed by itself with bus information outputted to the bus, thereby detecting a failure and allowing an internal circuit to execute necessary processes.

Abstract: A round robin arbitration circuit arbitrating N requests has a register storing one of N values, a priority encoder selecting one of N priority patterns according to the value in the register and assigning priorities to the requests based on the selected priority pattern, thereby conducting arbitration between the requests, a circuit updating the value in the register among the N values in a predetermined order synchronously with the arbitration, and a circuit updating the value in the register among the N values in the predetermined order at regular intervals that are asynchronous with the arbitration. At the regular intervals that are asynchronous with the arbitration, a jump is made in the predetermined updating order of the values to be set in the register. Accordingly, even if live-lock occurs, it will be solved when such a jump is made to make the number of priority patterns disagree with the number of requests issued in a loop.

Abstract: Disclosed are thermoplastic polyurethanes obtainable by reacting (a) a polyester-polyol that satisfies all the following requirements (1) to (4):(1) its ester group content (number of ester bonds/number of all carbon atoms) is from 0.08 to 0.17;(2) it has hydroxyl groups of from 2.01 to 2.08 per one molecule;(3) it has a number average molecular weight of from 1000 to 7000; and(4) it has a crystallization enthalpy (.DELTA.H) of 70 J/g or less,(b) an organic diisocyanate and (c) a chain extender at a ratio that satisfies the following numerical formula (i):1.00.ltoreq.b/(a+c).ltoreq.1.

Abstract: A TMR unit connects a plurality of processors by a bus and simultaneously executes the same processing operation. Among the plurality of processors, one of them is a master and the remaining processors are slaves. Information formed by only the master processor is outputted to the bus. Each processor has a multiplex control circuit. The multiplex control circuit compares output information formed by itself with bus information outputted to the bus, thereby detecting a failure and allowing an internal circuit to execute necessary processes.

Abstract: Disclosed are thermoplastic polyurethanes obtainable by reacting (a) a polyester-polyol that satisfies all the following requirements (1) to (4):(1) its ester group content (number of ester bonds/number of all carbon atoms) is from 0.08 to 0.17;(2) it has hydroxyl groups of from 2.01 to 2.08 per one molecule;(3) it has a number average molecular height of from 1000 to 7000; and(4) it has a crystallization enthalpy (.DELTA.H) of 70 J/g or less,(b) an organic diisocyanate and (c) a chain extender at a ratio that satisfies the following numerical formula (i):1.00.ltoreq.b/(a+c).ltoreq.1.

Abstract: A positive-working photosensitive composition comprises:(1) an alkali-soluble resin;(2) a quinonediazide compound;(3) an organic phosphoric compound; and(4) at least one of a phenylenediamine compound and a derivative thereof, 2-amino-1-phenylethanol, N-phenyldiethanolamine, N-phenylethanolamine, N-ethyldiethanolamine, and N-ethylethanolamine. The resist composition exhibits so higher an adhesion to a substrate than ever as to provide an enhanced accuracy in processing during etching, enabling subsequent faithful transfer of a finer pattern to the substrate.

Abstract: A negative type electron beam sensitive resist film of CMS (chloro-methyl poly-styrene) is developed in a dry environment without using a vacuum system. The resist film is selectively exposed to an electron beam to form a latent image of a desired pattern therein and, then, subjected to irradiation by deep UV having a spectral component of 2537 .ANG. or shorter in an oxidizing gas such as atmospheric air. The average thickness decrease speeds during the dry development are 12 .ANG./min and 300 .ANG./min respectively for the portions exposed and unexposed to the electron beam, revealing a contrast ratio of 100 to 4 in terms of the remaining resist film thickness. A film of PGMA (poly-glycidyl metha-acrylate), and other negative type electron beam sensitive resists, may also be developed by the same method.