Abstract: A charged particle device includes a cylindrical column (102), a charged particle beam optical system disposed in the column; a sample stage (103) disposed on the column, and a support device (211, 212) supporting the column. The support device includes a simply supported structure that simply supports the column at a plurality of support points set along an axial line direction of the column. The support points for the column are disposed at positions corresponding to the positions of nodes of vibration of the column. In this way, the rigidity of the column can be increased without increasing the weight of the column itself, whereby vibrations acting on the column can be decreased.

Abstract: Provided is a charged particle beam device that outputs both an ion beam and an electron beam at a sample, has a common detector for both the ion beam and the electron beam in the charged particle beam device that processes and observes the sample, and is able to provide a detection unit to an appropriate position corresponding to the process details and observation technique of the sample.

Abstract: A charged particle device includes a cylindrical column (102), a charged particle beam optical system disposed in the column; a sample stage (103) disposed on the column, and a support device (211, 212) supporting the column. The support device includes a simply supported structure that simply supports the column at a plurality of support points set along an axial line direction of the column. The support points for the column are disposed at positions corresponding to the positions of nodes of vibration of the column. In this way, the rigidity of the column can be increased without increasing the weight of the column itself, whereby vibrations acting on the column can be decreased.

Abstract: Provided are a device and method capable of machining a machining target such as a sample, a probe, or a sample table without requiring a high degree of device operation skill. First, a shape generation process of determining a shape of a machining target on the basis of an ion beam scanning signal and an absorption current of the machining target is performed. Next, a machining pattern positioning process of positioning a machining pattern over an image of the machining target is performed. Further, an ion beam stopping process of stopping ion beam irradiation is performed from a result of comparison between the image of the machining target and the machining pattern while the machining target is machined through the ion beam irradiation.

Abstract: Provided is a charged particle beam device that outputs both an ion beam and an electron beam at a sample, has a common detector for both the ion beam and the electron beam in the charged particle beam device that processes and observes the sample, and is able to provide a detection unit to an appropriate position corresponding to the process details and observation technique of the sample.

Abstract: A charged particle device that can prevent an effect of a vibration and suppress relative displacement between a charged particle generator and a specimen stage without reducing a movement range of the specimen stage is achieved. The charged particle device (1) has a long cylindrical column (2) at its upper portion and a hollow specimen chamber (3) arranged under the column (2). The specimen chamber (3) is divided into a specimen chamber upper portion (3a) and a specimen chamber bottom portion (3b). A vertical vibration of the specimen chamber upper portion (3a) is larger than a horizontal vibration of the specimen chamber upper portion (3a). A horizontal vibration of the specimen chamber bottom portion (3b) is large. The column (2) has a charged particle gun and a detector. The column (1) and a specimen stage supporter (4) are held by the specimen chamber upper portion (3a), while the specimen stage supporter (4) holds the specimen stage (5).

Abstract: There is provided an apparatus and a method capable of preparing a standardized probe without need for working skill of probe processing.