Abstract: An object is to ensure the connection quality of a pressure measuring device and achieve highly accurate pressure measurement so that fluid flow can be adjusted with high reliability.

Abstract: An exposure apparatus includes an optical system configured to expose a substrate. The optical system includes an optical member, a holding portion which holds the optical member, a pressing portion which presses the holding portion and the optical member against each other, and a sealed adhesive material which is filled in a space formed by the optical member and the holding portion pressed against each other, and adheres the optical member and the holding portion to each other.

Abstract: An exposure apparatus includes an optical system configured to expose a substrate. The optical system includes an optical member, a holding portion which holds the optical member, a pressing portion which presses the holding portion and the optical member against each other, and a sealed adhesive material which is filled in a space formed by the optical member and the holding portion pressed against each other, and adheres the optical member and the holding portion to each other.

Abstract: There is provided a method for exchanging an atmosphere of a vacuum chamber of a processing apparatus configured to process a substrate under a vacuum environment. The method includes the steps of holding the substrate using a holding unit provided in the vacuum chamber, and exchanging the atmosphere of the vacuum chamber through exhaustion or air supply, wherein the exchanging step maintains a pressure of the vacuum chamber in a range between 10 Pa and 10000 Pa for a period between 10 seconds and 600 seconds while controlling a temperature of a dust collection unit provided in the vacuum chamber lower than a temperature of the substrate.

Abstract: Disclosed herein is method for use in a vertical heat treatment system which has an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and and through which an object to be treated is carried in the vertical heat treatment system to carry out a predetermined treatment. When the object to be treated is carried in via the opening of the partition wall, which separates the housing-box transfer area from the treating-object transfer area (wafer transfer area), to carry out a predetermined treatment, the structure of various mechanisms in the vicinity of the opening is simplified, and the space is saved.

Abstract: A processing apparatus configured to process a substrate under a vacuum environment includes a holding unit configured to hold the substrate, a dust collection part having a surface opposite to the substrate held by the holding unit, a vacuum chamber configured to accommodate the holding unit and to have an internal space that can be decompressed, a temperature controlling unit configured to control a temperature of the surface of the dust collection part opposite to the substrate to a temperature lower than a temperature of the substrate, and a driving unit configured to bring one of the holding unit and the dust collection part close to the other after the temperature controlling unit controls the temperature of the surface of the dust collection part opposite to the substrate.

Abstract: Disclosed herein is method for use in a vertical heat treatment system which has an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and and through which an object to be treated is carried in the vertical heat treatment system to carry out a predetermined treatment. When the object to be treated is carried in via the opening of the partition wall, which separates the housing-box transfer area from the treating-object transfer area (wafer transfer area), to carry out a predetermined treatment, the structure of various mechanisms in the vicinity of the opening is simplified, and the space is saved.

Abstract: Disclosed herein is a vertical heat treatment system capable of simplifying the structure of various mechanisms in the vicinity of an opening which is formed in a partition wall separating a housing-box transfer area from a treating-object transfer area (a wafer transfer area), and of contributing to space saving, when an object to be treated is carried in the vertical heat treatment system through the opening to carry out a predetermined treatment.

Abstract: In a system for dispersively storing data and parity in a plurality of storage devices, information in a first storage device is restored by using information stored in the storage devices other than the first storage device when the first storage device fails. And information in a non-restored area in the first storage device and information in a second storage device are restored by using information stored in the storage devices other than the first and the second storage devices when the second storage device fails while the information in the first storage device is being restored.

Abstract: A system creates a configuration definition table to be used for accessing a physical disk according to a host I/O request, to decrease a memory size of the configuration definition table even if common firmware is used for models with different scales. For this, a model correspondence table to show the definition of each model is provided in a configuration setup processing module, the maximum values of this model are recorded in a memory based on this content, and a memory area for each item is secured. And the actual content of the configuration definition is developed on the secured memory. Therefore even for a diversity of models, the memory size of the configuration definition table can be decreased to a size matching the model, with common firmware regardless the model.

Abstract: A RAID system access a physical disk according to a host I/O request, and perform Rebuild/Copy back processing, for implementing high-speed Rebuild/Copy back processing without interrupting the processing of a normal I/O. When one disk device out of a plurality of disk devices constituting the RAID configuration fails, the processing size for one time of Rebuild/Copy back to reconstruct the RAID is changed according to the presence of a normal I/O managed in RAID control. When a normal I/O is present, Rebuild/Copy back can be executed without interrupting the processing of the normal I/O, and in a static state where a normal I/O is absent, a processing size larger than the size in that state can be specified so as to implement Rebuild/Copy back processing at high-speed.

Abstract: A method and apparatus for enhancing performance of parity check in computer readable media is provided. For example, in a RAID (N+1) configuration, a virtual data strip is added for a calculation of parity. Data of the virtual data strip is set so that a predetermined portion of a data area in the virtual data strip has a predetermined value. Consequently, performance of parity check performed in a data processing system having a RAID configuration can be enhanced.

Abstract: A RAID system access a physical disk and perform Rebuild/Copy back processing according to a host I/O request, so as to implement high-speed Rebuild/Copy back processing without interfering with the processing of a normal I/O. When one disk device fails, out of a plurality of disk devices constituting a RAID configuration, the controller performs Rebuild/Copy back processing to reconstruct the RAID. In Rebuild/Copy back, the controller reads the data from one disk and writes the data to another disk, so the presence of a normal I/O is judged, and when a normal I/O is absent, read and write of these different disk drives are executed simultaneously. By this, the Rebuild/Copy back time can be decreased.

Abstract: A magnetic disk apparatus capable of effectively achieving speedup of the response to a read request, a control method and control program therefore are provided. In a control of a magnetic disk apparatus having a RAID configuration in which the same data is written on two disks, a given algorithm is selected from a plurality of different algorithms with respect to the data stored in the disks, read commands are issued to the data stored in the two disks, respectively, according to the selected algorithm and the data that has been read first by the read commands that has been issued to the two disks in a read command issuance step is adopted as read data.

Abstract: In the present invention, for each set of blocks [#(0) to #(N?1)] storing update data, a history block [#(N)] storing an update state value, for example, a generation, time or check code, showing an update state is provided, constituting a set of management data as a check object. When writing update data on a disk, a new update state value is calculated for the same set of management data and stored in memory as update state confirmation value. The new update state value is also set as write data in the history block in the same set of management data, and the entire of the set of management data including update data and update state value are written onto a disk. The history block is read and disk write omissions are detected by comparing the update state value and the update state confirmation value stored in memory.

Abstract: A storage system has a plurality of disk storage devices and a controller for controlling the plurality of disk storage devices, and diagnosis of a write miss to a disk of the disk storage device. The controller for controlling the plurality of disk storage devices attaches an ID to write data, and after write access to the disk drive, the controller reads the write data from the disk drive, and compares the ID of the read data and the attached ID. The controller updates the ID for each write command. Therefore the old write data and the new write data can be identified, accurate diagnosis is possible, and the failure of an individual disk drive can be detected immediately.

Abstract: There is provided a method for exchanging an atmosphere of a vacuum chamber of a processing apparatus configured to process a substrate under a vacuum environment. The method includes the steps of holding the substrate using a holding unit provided in the vacuum chamber, and exchanging the atmosphere of the vacuum chamber through exhaustion or air supply, wherein the exchanging step maintains a pressure of the vacuum chamber in a range between 10 Pa and 10000 Pa for a period between 10 seconds and 600 seconds while controlling a temperature of a dust collection unit provided in the vacuum chamber lower than a temperature of the substrate.

Abstract: A processing apparatus configured to process a substrate under a vacuum environment includes a holding unit configured to hold the substrate, a dust collection part having a surface opposite to the substrate held by the holding unit, a vacuum chamber configured to accommodate the holding unit and to have an internal space that can be decompressed, a temperature controlling unit configured to control a temperature of the surface of the dust collection part opposite to the substrate to a temperature lower than a temperature of the substrate, and a driving unit configured to bring one of the holding unit and the dust collection part close to the other after the temperature controlling unit controls the temperature of the surface of the dust collection part opposite to the substrate.

Abstract: Storage destination controller devices wherein N number of data strips and M number of parity strips comprised in each stripe are determined so that the parity strips are not continuously stored to the same memory device between two consecutive stripes when a plurality of stripes, each comprising the N number of data strips and the M number of parity strips of different types, are distributed and stored to the N+M number of memory devices.

Abstract: A reticle cassette includes a bearing portion and a cover, a reticle being disposed on the bearing portion and accommodated in a space between the bearing portion and the cover. The bearing portion includes electrodes for attracting using an electrostatic force and supporting a first surface of the reticle, the first surface having a pattern being formed thereon.