Patents by Inventor Shinya Murakami

Shinya Murakami has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10160006
    Abstract: The present invention has an object to provide a coating vice which can reduce variation in the amount of discharge in the discharge nozzle group. A coating device 1 includes: a first supply unit 40 and a second supply unit 50 which can supply a viscous material N to the discharge nozzle group 10; and a control portion 100 which stops, at the timing at which a first time zone is switched to a second time zone, the supply in the first supply unit 40, which makes the second supply unit 50 start the supply of the viscous material N to the discharge nozzle group 10 at a second flow rate and which makes, in a second time zone, the first supply unit 40 start the preparation of the viscous material necessary in any one of a third time zone and the subsequent time zones.
    Type: Grant
    Filed: February 21, 2017
    Date of Patent: December 25, 2018
    Assignee: Honda Motor Co., Ltd.
    Inventors: Gaku Kawabe, Shinya Murakami
  • Publication number: 20180362732
    Abstract: Provided is an additive for rubber that contains a sulfide composition, wherein the sulfide composition in the additive for rubber contains a sulfide compound having the repeating units shown by formula (1), the amount of repeating units (1) in which X=2 is at least 45 molar parts per 100 molar parts of repeating units (1) in the sulfide compound, and the number n of repeating units (1) in the sulfide compound is from 1 to 400, whereby an additive for rubber capable of imparting excellent heat resistance is provided. Also provided is a rubber composition that contains said additive for rubber. wherein X is 1, 2 or 3.
    Type: Application
    Filed: December 7, 2016
    Publication date: December 20, 2018
    Applicant: Sumitomo Seika Chemicals Co., Ltd.
    Inventors: Shinya MURAKAMI, Hideaki NISHIGUCHI, Takehiro HIYAMA
  • Patent number: 10086386
    Abstract: An object of the present invention is to provide a coating nozzle which has a plurality of discharge holes and which can reduce variations in the discharge of a coating material from the discharge holes. A coating nozzle (10) includes: a plurality of supply holes (40a to 40t) which are formed in a supply surface (35) so as to be aligned on a circle (D) with a first position (45) in the center; a plurality of discharge holes (50a to 50t) which are formed in a discharge surface (20) so as to be aligned on a straight line (L); and a plurality of communication hole paths (60a to 60t) which make the supply holes (40a to 40t) linearly communicate with the discharge holes (50a to 50t), respectively and in which the communication distances thereof are substantially equal to each other.
    Type: Grant
    Filed: February 7, 2017
    Date of Patent: October 2, 2018
    Assignee: HONDA MOTOR CO., LTD.
    Inventors: Gaku Kawabe, Shinya Murakami
  • Publication number: 20180200735
    Abstract: A discharge device is equipped with a housing having a flow passage for enabling a coating material to flow and a plurality of discharge ports arrayed on a distal end surface of the housing in a width direction for discharging the coating material toward an object. The plurality of discharge ports are each formed in a non-perfect circular shape having a peripheral length being longer than an imaginary perfect circular shape which has the same area as the non-perfect circular shape. Further, a plurality of discharge flow passages are perpendicular to the discharge ports when viewed in a longitudinal sectional view, are the same shape as the discharge ports, and extend linearly.
    Type: Application
    Filed: January 16, 2018
    Publication date: July 19, 2018
    Inventors: Gaku Kawabe, Shinya Murakami
  • Patent number: 9989173
    Abstract: The present invention provides a flexible pipe having excellent blister resistance in a high-temperature and high-pressure environment even though including a thick resin pipe. The flexible pipe includes a resin pipe having a thickness of greater than 5 mm. The resin pipe is formed from a resin having a CO2 permeability coefficient P(CO2) of 20×10?9 cm3·cm/cm2·s·cmHg or lower at 150° C., a CH4 permeability coefficient P(CH4) of 10×10?9 cm3·cm/cm2·s·cmHg or lower at 150° C., a ratio D(CO2)/S(CO2) between a CO2 diffusion coefficient D(CO2) and a CO2 solubility coefficient S(CO2) of 3×10?5 Pa·m2/s or higher at 150° C., and a ratio D(CH4)/S(CH4) between a CH4 diffusion coefficient D(CH4) and a CH4 solubility coefficient S(CH4) of higher than 15×10?5 Pa·m2/s at 150° C.
    Type: Grant
    Filed: October 6, 2015
    Date of Patent: June 5, 2018
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinya Murakami, Takeshi Inaba, Takahiro Kitahara, Yuuki Kuwajima
  • Patent number: 9920863
    Abstract: The present invention provides a flexible pipe having excellent blister resistance in a high-temperature and high-pressure environment even though including a thick resin pipe. The flexible pipe includes a resin pipe having a thickness of greater than 5 mm. The resin pipe is formed from a resin having a CO2 permeability coefficient P(CO2) of 20×10?9 cm3·cm/cm2·s·cmHg or lower at 150° C., a CH4 permeability coefficient P(CH4) of 10×10?9 cm3·cm/cm2·s·cmHg or lower at 150° C., a ratio D(CO2)/S(CO2) between a CO2 diffusion coefficient D(CO2) and a CO2 solubility coefficient S(CO2) of 3×10?5 Pa·m2/s or higher at 150° C., and a ratio D(CH4)/S(CH4) between a CH4 diffusion coefficient D(CH4) and a CH4 solubility coefficient S(CH4) of higher than 15×10?5 Pa·m2/s at 150° C.
    Type: Grant
    Filed: October 6, 2015
    Date of Patent: March 20, 2018
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinya Murakami, Takeshi Inaba, Takahiro Kitahara, Yuuki Kuwajima
  • Publication number: 20170307113
    Abstract: The present invention provides a flexible pipe having excellent blister resistance in a high-temperature and high-pressure environment even though including a thick resin pipe. The flexible pipe includes a resin pipe having a thickness of greater than 5 mm. The resin pipe is formed from a resin having a CO2 permeability coefficient P(CO2) of 20×10?9 cm3·cm/cm2·s·cmHg or lower at 150° C., a CH4 permeability coefficient P(CH4) of 10×10?9 cm3·cm/cm2·s·cmHg or lower at 150° C., a ratio D(CO2)/S(CO2) between a CO2 diffusion coefficient D(CO2) and a CO2 solubility coefficient S(CO2) of 3×10?5 Pa·m2/s or higher at 150° C., and a ratio D(CH4)/S(CH4) between a CH4 diffusion coefficient D(CH4) and a CH4 solubility coefficient S(CH4) of higher than 15×10?5 Pa·m2/s at 150° C.
    Type: Application
    Filed: October 6, 2015
    Publication date: October 26, 2017
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinya MURAKAMI, Takeshi INABA, Takahiro KITAHARA, Yuuki KUWAJIMA
  • Publication number: 20170239685
    Abstract: The present invention has an object to provide a coating vice which can reduce variation in the amount of discharge in the discharge nozzle group. A coating device 1 includes: a first supply unit 40 and a second supply unit 50 which can supply a viscous material N to the discharge nozzle group 10; and a control portion 100 which stops, at the timing at which a first time zone is switched to a second time zone, the supply in the first supply unit 40, which makes the second supply unit 50 start the supply of the viscous material N to the discharge nozzle group 10 at a second flow rate and which makes, in a second time zone, the first supply unit 40 start the preparation of the viscous material necessary in any one of a third time zone and the subsequent time zones.
    Type: Application
    Filed: February 21, 2017
    Publication date: August 24, 2017
    Inventors: Gaku Kawabe, Shinya Murakami
  • Publication number: 20170225179
    Abstract: An object of the present invention is to provide a coating nozzle which has a plurality of discharge holes and which can reduce variations in the discharge of a coating material from the discharge holes. A coating nozzle (10) includes: a plurality of supply holes (40a to 40t) which are formed in a supply surface (35) so as to be aligned on a circle (D) with a first position (45) in the center; a plurality of discharge holes (50a to 50t) which are formed in a discharge surface (20) so as to be aligned on a straight line (L); and a plurality of communication hole paths (60a to 60t) which make the supply holes (40a to 40t) linearly communicate with the discharge holes (50a to 50t), respectively and in which the communication distances thereof are substantially equal to each other.
    Type: Application
    Filed: February 7, 2017
    Publication date: August 10, 2017
    Inventors: Gaku Kawabe, Shinya Murakami
  • Publication number: 20170098859
    Abstract: The present invention aims to provide a solvent for an electrolytic solution of electrochemical devices which is chemically stable at high temperatures over a long period of time and is stably liquid at low temperatures. The present invention relates to a solvent for an electrolytic solution of electrochemical devices, including: a cyclic sulfone compound represented by the formula (1): wherein R is a hydrogen atom or a linear or branched C1-C6 alkyl group; a chain alkyl sulfone compound represented by the formula (2): wherein R1 and R2 each independently represent a linear or branched C1-C5 alkyl group, and may be the same as or different from each other; and at least one of an organic amine compound and 4-tert-butylcatechol.
    Type: Application
    Filed: April 16, 2014
    Publication date: April 6, 2017
    Applicant: SUMITOMO SEIKA CHEMICALS CO., LTD.
    Inventors: Shinya MURAKAMI, Shunji OYAMA, Takehiro HIYAMA
  • Patent number: 9188554
    Abstract: Provided is a pattern inspection device for accurately simulating an electron beam image of a circuit pattern on a wafer from design data, and implementing high-precision defect detection based on the comparison between the simulated electron beam image and a real image. A pattern inspection device comprises: an image capturing unit for capturing an electron beam image of a pattern formed on a substrate; a simulated electron beam image generation unit for generating a simulated electron beam image using a parameter indicating the characteristics of the electron beam image on the basis of design data; and an inspection unit for comparing the electron beam image of the pattern, which is the image captured by the image capturing unit, and the simulated electron beam image generated by the simulated electron beam image generation unit, and inspecting the pattern on the substrate.
    Type: Grant
    Filed: May 22, 2013
    Date of Patent: November 17, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Chie Shishido, Shinya Murakami, Takashi Hiroi, Taku Ninomiya, Michio Nakano
  • Patent number: 9109194
    Abstract: When multiple kinds of bacterial colonies are present in a petri dish and, for example, a drug tolerance is to be measured, harvesting of mixed colonies of different types of bacteria makes it impossible to accurately determine the drug tolerance. Also, it is required to improve the throughput of a device for harvesting a bacterial colony. From images illuminated from multiple directions, isolating bacterial colonies are automatically extracted. Next, the image feature amounts are calculated from the multiple images that are illuminated from multiple directions and colonies are grouped depending on the feature amounts. Then, bacterial colonies to be harvested are determined based on the results of the grouping.
    Type: Grant
    Filed: November 5, 2010
    Date of Patent: August 18, 2015
    Assignee: HITACHI HIGH-TECHNOLOGIES CORPORATION
    Inventors: Toshifumi Honda, Hiroko Fujita, Muneo Maeshima, Akira Maekawa, Yoshiko Ishida, Yuta Urano, Shinya Murakami
  • Publication number: 20150212019
    Abstract: Provided is a pattern inspection device for accurately simulating an electron beam image of a circuit pattern on a wafer from design data, and implementing high-precision defect detection based on the comparison between the simulated electron beam image and a real image. A pattern inspection device comprises: an image capturing unit for capturing an electron beam image of a pattern formed on a substrate; a simulated electron beam image generation unit for generating a simulated electron beam image using a parameter indicating the characteristics of the electron beam image on the basis of design data; and an inspection unit for comparing the electron beam image of the pattern, which is the image captured by the image capturing unit, and the simulated electron beam image generated by the simulated electron beam image generation unit, and inspecting the pattern on the substrate.
    Type: Application
    Filed: May 22, 2013
    Publication date: July 30, 2015
    Applicant: Hitachi High-Technologies Corporation
    Inventors: Chie Shishido, Shinya Murakami, Takashi Hiroi, Taku Ninomiya, Michio Nakano
  • Publication number: 20150107194
    Abstract: There is provided a method for producing a PCTFE film having excellent moisture resistance, good tensile elongation, and excellent formability. Provided is a method for producing a polychlcrotrifluoroethylene film, the method including step (1) of melting and molding polychlorotrifluoroethylene into a film, step (2) of maintaining the formed film at a temperature of 100° C. to 170° C., and step (3) of cooling the film to room temperature after the maintaining, wherein the temperature of the film is not allowed to be 170° C. or lower during an interval between step (1) and step (2).
    Type: Application
    Filed: October 17, 2014
    Publication date: April 23, 2015
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya HIGUCHI, Toshiaki MASUI, Hidenori OZAKI, Shinya MURAKAMI, Takeshi INABA
  • Patent number: 8953868
    Abstract: A defect inspection method comprising: picking up an image of a subject under inspection to thereby acquire an inspection image; extracting multiple templates corresponding to multiple regions, respectively from design data of the subject under inspection; finding a first misregistration amount between the inspection image and the design data using a first template as any one template selected from among the plural templates; finding a second misregistration amount between the inspection image and the design data using a second template other than the first template, the second template being selected from among the plural templates, and the first misregistration-amount; and converting the design data, misregistration thereof being corrected using the first misregistration-amount, and the second misregistration-amount, into a design data image, and comparing the design data image with the inspection image to thereby detect a defect of the subject under inspection.
    Type: Grant
    Filed: May 30, 2013
    Date of Patent: February 10, 2015
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Shinya Murakami, Chie Shishido, Takashi Hiroi, Taku Ninomiya, Tsuyoshi Minakawa, Atsushi Miyamoto
  • Publication number: 20140295189
    Abstract: To provide a coverlay for a high-frequency circuit substrate, that uses polyimide film and fluororesin, has excellent mechanical properties and heat resistance, and can increase workability during the manufacture of high-frequency circuit substrates. Resolution Means: The coverlay for a high-frequency circuit substrate including a polyimide film and a fluororesin bonded together, and an adhesive strength between the polyimide film layer and the fluororesin layer being greater than 3.0 N/cm.
    Type: Application
    Filed: March 31, 2014
    Publication date: October 2, 2014
    Applicant: E I DU PONT DE NEMOURS AND COMPANY
    Inventors: SHOTARO HIDAKA, TAKESHI TANAKA, HIDEAKI MACHIDA, TAKESHI INABA, SHINYA MURAKAMI
  • Publication number: 20140227533
    Abstract: The present invention aims to provide a laminate in which a metal and a fluoropolymer are directly and firmly attached to each other. The present invention relates to a laminate including a layer (A) including a metal, and a layer (B) formed on the layer (A), wherein the layer (B) includes a copolymer containing a polymer unit based on tetrafluoroethylene and a polymer unit based on a perfluoro(alkyl vinyl ether), the copolymer contains a carboxyl group at a terminus of a main chain and has a melt flow rate of not lower than 20 g/10 min and a melting point of not higher than 295° C., and the metal is at least one selected from the group consisting of copper, stainless steel, aluminum, iron, and an alloy thereof.
    Type: Application
    Filed: September 21, 2012
    Publication date: August 14, 2014
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Shinya Murakami, Hiroyuki Yoshimoto, Takeshi Inaba, Masamichi Sukegawa, Yasuyuki Yamaguchi
  • Patent number: 8782955
    Abstract: A sealing structure, of which an upper end part makes elastic contact with a roof weather strip which is installed along a side edge of a roof and extending in a front and rear direction, includes an installation base member installed on a quarter sash provided on a front side of a quarter window glass of a retractable roof vehicle, (that lifts and lowers together with the quarter window glass). The sealing structure also includes a hollow seal part which makes elastic contact with a side window glass, and a seal lip, An upper end part has a seal wall formed thereon, which covers a front side corner part of the upper end part from an inner-cabin side, which is protrudingly formed toward an outer-cabin side and makes elastic contact with the side window glass from an inner-cabin side.
    Type: Grant
    Filed: November 17, 2011
    Date of Patent: July 22, 2014
    Assignee: Nishikawa Rubber Co., Ltd.
    Inventors: Kousuke Mori, Hirofumi Ogawa, Shinya Murakami
  • Patent number: 8761936
    Abstract: A teaching line correcting apparatus defines a first plane, which is determined by a first reference position of a preset first reference region, a second reference position of a preset second reference region, and a third reference position of a preset third reference region, defines a second plane, which is determined by a detected position of the first reference region, a detected position of the second reference region, and a detected position of the third reference region, calculates a corrective value for equalizing the first reference region to an origin, equalizing the first reference position of the first reference region as the origin to the detected position of the first reference region as the origin, and equalizing the first plane to the second plane, and correcting reference coordinates where operating points are taught based on the calculated corrective value.
    Type: Grant
    Filed: November 8, 2010
    Date of Patent: June 24, 2014
    Assignee: Honda Motor Co., Ltd.
    Inventors: Hironobu Hayama, Shinya Murakami, Yutaka Hariya, Naoki Eto, Masashi Takebe
  • Patent number: 8710142
    Abstract: The present invention provides a low-staining room temperature curable coating composition having an excellent low-staining property and recoatability, and comprising (A) a hydroxyl-containing resin, (B) an isocyanate based curing agent, (C) an organosilicate based hydrophilizing agent, (D) a recoatability modifier and (E) an organic solvent, in which the recoatability modifier (D) comprises at least (D1) an amide-containing polymer and (D2) a silane coupling agent.
    Type: Grant
    Filed: March 18, 2010
    Date of Patent: April 29, 2014
    Assignee: Daikin Industries, Ltd.
    Inventors: Akira Chida, Shinya Murakami, Susumu Wada