Patents by Inventor Shinya OOSAKI

Shinya OOSAKI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11921424
    Abstract: There are provided a photosensitive resin composition which can be applied to either a projection exposure or direct-write exposure machine without fine adjustment of the composition, and can form a resist pattern having an excellent cross-sectional shape in which an undercut in which the bottom portion of the resist pattern is hollowed and omission of the top of the resist pattern are less likely to occur, and a line width of an intermediate portion (central portion) and a deepest portion (bottom portion) in the depth direction of the cross section of the resist pattern is less likely to be larger than a line width of the surface portion (that is, linearity in the depth direction of the resist pattern contour is favorable), and which has excellent insulation reliability and crack resistance reliability, and a dry film using the same, a printed wiring board, and a printed wiring board manufacturing method.
    Type: Grant
    Filed: March 30, 2017
    Date of Patent: March 5, 2024
    Assignee: Hitachi Chemical Company, Ltd. (FIPAS)
    Inventors: Nobuhito Komuro, Yuta Daijima, Masayuki Kojima, Shinji Irizawa, Shinya Oosaki
  • Publication number: 20230350292
    Abstract: There are provided a photosensitive resin composition which can be applied to either a projection exposure or direct-write exposure machine without fine adjustment of the composition, and can form a resist pattern having an excellent cross-sectional shape in which an undercut in which the bottom portion of the resist pattern is hollowed and omission of the top of the resist pattern are less likely to occur, and a line width of an intermediate portion (central portion) and a deepest portion (bottom portion) in the depth direction of the cross section of the resist pattern is less likely to be larger than a line width of the surface portion (that is, linearity in the depth direction of the resist pattern contour is favorable), and which has excellent insulation reliability and crack resistance reliability, and a dry film using the same, a printed wiring board, and a printed wiring board manufacturing method.
    Type: Application
    Filed: July 11, 2023
    Publication date: November 2, 2023
    Inventors: Nobuhito KOMURO, Yuta DAIJIMA, Masayuki KOJIMA, Shinji IRIZAWA, Shinya OOSAKI
  • Publication number: 20210109444
    Abstract: There are provided a photosensitive resin composition which can be applied to either a projection exposure or direct-write exposure machine without fine adjustment of the composition, and can form a resist pattern having an excellent cross-sectional shape in which an undercut in which the bottom portion of the resist pattern is hollowed and omission of the top of the resist pattern are less likely to occur, and a line width of an intermediate portion (central portion) and a deepest portion (bottom portion) in the depth direction of the cross section of the resist pattern is less likely to be larger than a line width of the surface portion (that is, linearity in the depth direction of the resist pattern contour is favorable), and which has excellent insulation reliability and crack resistance reliability, and a dry film using the same, a printed wiring board, and a printed wiring board manufacturing method.
    Type: Application
    Filed: March 30, 2017
    Publication date: April 15, 2021
    Inventors: Nobuhito KOMURO, Yuta DAIJIMA, Masayuki KOJIMA, Shinji IRIZAWA, Shinya OOSAKI
  • Patent number: 10111328
    Abstract: The present invention relates to a photosensitive resin composition containing (A) an acid-modified vinyl group-containing epoxy resin, (B) a photopolymerization initiator, (C) a thiol group-containing compound, and (E) a photopolymerizable compound, wherein the component (A) contains at least one acid-modified vinyl group-containing epoxy resin (A1) which is obtained from a bisphenol-novolak epoxy resin (a1) having a structural unit represented by a general formula (IV) or (V), and an acid-modified vinyl group-containing epoxy resin (A2) which is obtained from an epoxy resin (a2) differing from the epoxy resin (a1).
    Type: Grant
    Filed: March 6, 2014
    Date of Patent: October 23, 2018
    Assignee: HTACHI CHEMICAL COMPANY, LTD.
    Inventors: Nobuhito Komuro, Shinya Oosaki, Toshizumi Yoshino, Kuniaki Satou
  • Publication number: 20160007454
    Abstract: The present invention relates to a photosensitive resin composition containing (A) an acid-modified vinyl group-containing epoxy resin, (B) a photopolymerization initiator, (C) a thiol group-containing compound, and (E) a photopolymerizable compound, wherein the component (A) contains at least one acid-modified vinyl group-containing epoxy resin (A1) which is obtained from a bisphenol-novolak epoxy resin (a1) having a structural unit represented by a general formula (IV) or (V), and an acid-modified vinyl group-containing epoxy resin (A2) which is obtained from an epoxy resin (a2) differing from the epoxy resin (a1).
    Type: Application
    Filed: March 6, 2014
    Publication date: January 7, 2016
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Nobuhito KOMURO, Shinya OOSAKI, Toshizumi YOSHINO, Kuniaki SATOU