Patents by Inventor Shinya Yamashita

Shinya Yamashita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12072627
    Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.
    Type: Grant
    Filed: May 15, 2023
    Date of Patent: August 27, 2024
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei Adachi, Shinya Yamashita, Masaki Ohashi, Tomohiro Kobayashi, Kenichi Oikawa, Takayuki Fujiwara
  • Publication number: 20230280651
    Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.
    Type: Application
    Filed: May 15, 2023
    Publication date: September 7, 2023
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei ADACHI, Shinya YAMASHITA, Masaki OHASHI, Tomohiro KOBAYASHI, Kenichi OIKAWA, Takayuki FUJIWARA
  • Patent number: 11693314
    Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.
    Type: Grant
    Filed: March 11, 2021
    Date of Patent: July 4, 2023
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei Adachi, Shinya Yamashita, Masaki Ohashi, Tomohiro Kobayashi, Kenichi Oikawa, Takayuki Fujiwara
  • Patent number: 11340527
    Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group and not containing a repeating unit having an aromatic substituent; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.
    Type: Grant
    Filed: October 28, 2020
    Date of Patent: May 24, 2022
    Assignee: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei Adachi, Shinya Yamashita, Masaki Ohashi, Takayuki Fujiwara
  • Publication number: 20210200083
    Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.
    Type: Application
    Filed: March 11, 2021
    Publication date: July 1, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei ADACHI, Shinya YAMASHITA, Masaki OHASHI, Tomohiro KOBAYASHI, Kenichi OIKAWA, Takayuki FUJIWARA
  • Publication number: 20210141306
    Abstract: A resist composition containing: (A) a resin containing a repeating unit having an acid-labile group and not containing a repeating unit having an aromatic substituent; (B) a photo-acid generator shown by a general formula (B-1); and (C) a solvent, where W1 represents a cyclic divalent hydrocarbon group having 4 to 12 carbon atoms and containing a heteroatom; W2 represents a cyclic monovalent hydrocarbon group having 4 to 14 carbon atoms and not containing a heteroatom; Rf represents a divalent organic group shown by the following general formula; and M+ represents an onium cation. This provides a resist composition and a patterning process that uses the resist composition that show a particularly favorable mask dimension dependency (mask error factor: MEF), LWR, and critical dimension uniformity (CDU) particularly in photolithography where a high-energy beam such as an ArF excimer laser beam is used as a light source.
    Type: Application
    Filed: October 28, 2020
    Publication date: May 13, 2021
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Teppei ADACHI, Shinya YAMASHITA, Masaki OHASHI, Takayuki FUJIWARA
  • Patent number: 10220694
    Abstract: A vehicle battery cooling structure is provided with a vehicle body, a battery unit and a cooling jacket. The vehicle body includes a floor panel and a vehicle body frame member. The battery unit is attached to the vehicle body frame member. The battery unit is arranged below the floor panel. The battery unit includes a battery case and a battery. The cooling jacket is attached to a laterally extending rearward surface of the battery case that houses the battery.
    Type: Grant
    Filed: May 14, 2010
    Date of Patent: March 5, 2019
    Assignee: Nissan Motor Co., Ltd.
    Inventors: Satoru Mizoguchi, Shinya Yamashita, Kentaro Fukuchi
  • Publication number: 20120018238
    Abstract: A vehicle battery cooling structure is provided with a vehicle body, a battery unit and a cooling jacket. The vehicle body includes a floor panel and a vehicle body frame member. The battery unit is attached to the vehicle body frame member. The battery unit is arranged below the floor panel. The battery unit includes a battery case and a battery. The cooling jacket is attached to a laterally extending rearward surface of the battery case that houses the battery.
    Type: Application
    Filed: May 14, 2010
    Publication date: January 26, 2012
    Applicant: NISSAN MOTOR CO., LTD.
    Inventors: Satoru Mizoguchi, Shinya Yamashita, Kentaro Fukuchi
  • Patent number: 7410997
    Abstract: Compounds represented by formula (1), wherein X is, for example, CH, CH2, CHR (wherein R is a lower alkyl group or a substituted lower alkyl group) or CRR? (wherein R and R? are the same as the above defined R); Y is, for example, CH, CH2 or C?O; Z is, for example, O, S, S?O or SO2; U is C or N; R1 to R4 are each independently, for example, a hydrogen atom, OR, SR (wherein R is the same as defined above), or an aromatic ring, a substituted aromatic ring or a heterocycle; at least one of R5 and R8 is, for example, OH and the remaining of R5 and R8 are each independently, for example, a hydrogen atom or OH, optical isomers thereof, conjugates thereof or pharmaceutically acceptable salts thereof are provided. These compounds are characterized in having a wide range of pharmacological actions such as an excellent relaxing action of tracheal smooth muscles, an inhibition of airway hypersensitivity and an inhibition of infiltration of inflammatory cells into the airway and, in addition, high safety.
    Type: Grant
    Filed: December 5, 2003
    Date of Patent: August 12, 2008
    Assignee: Nippon Sulsan Kaisha, Ltd.
    Inventors: Shuji Jinno, Takaaki Okita, Naomi Ohtsuka, Shinya Yamashita, Junichiro Hata, Jiro Takeo
  • Publication number: 20050203061
    Abstract: A prodrug utilizes an enzyme whose enzymatic activity is different in between the target site of the drug and the site to express side effects, the prodrug having a substituent cleavable with the enzyme and being activated by cleaving the substituent with the enzyme. As the target site of the drug, for example, a respiratory organ can be mentioned and as the site to express side effects, for example, the heart can be mentioned. As the example of the drug, a bronchodilator can be mentioned and as the example of the enzyme, a glycosidase (for example, ?-glucuronidase) can be mentioned. Furthermore, the substituent is, for example, a glycosyl group composed of a monosaccharide or an oligosaccharide. Use of the enzyme enables reducing the side effects of a drug of the type whose target site is different from the site to express side effects.
    Type: Application
    Filed: June 20, 2003
    Publication date: September 15, 2005
    Inventors: Shinya Yamashita, Jiro Takeo, Takaaki Okita
  • Publication number: 20040127713
    Abstract: Compounds represented by formula (1), 1
    Type: Application
    Filed: December 5, 2003
    Publication date: July 1, 2004
    Applicant: Nippon Suisan Kaisha, Ltd.
    Inventors: Shuji Jinno, Takaaki Okita, Naomi Ohtsuka, Shinya Yamashita, Junichiro Hata, Jiro Takeo
  • Patent number: 6700013
    Abstract: Compounds represented by formula (1), wherein X is, for example, CH, CH2, CHR (wherein R is a lower alkyl group or a substituted lower alkyl group) or CRR′ (wherein R and R′ are the same as the above defined R); Y is, for example, CH, CH2 or C═O; Z is, for example, O, S, S═O or SO2; U is C or N; R1 to R4 are each independently, for example, a hydrogen atom, OR, SR (wherein R is the same as defined above), or an aromatic ring, a substituted aromatic ring or a heterocycle; at least one of R5 and R8 is, for example, OH and the remaining of R5 and R8 are each independently, for example, a hydrogen atom or OH, optical isomers thereof, conjugates thereof or pharmaceutically acceptable salts thereof are provided.
    Type: Grant
    Filed: November 12, 2002
    Date of Patent: March 2, 2004
    Assignee: Nippon Suisan Kaisha, Ltd.
    Inventors: Shuji Jinno, Takaaki Okita, Naomi Ohtsuka, Shinya Yamashita, Junichiro Hata, Jiro Takeo
  • Publication number: 20030220360
    Abstract: Compounds represented by formula (1), 1
    Type: Application
    Filed: November 12, 2002
    Publication date: November 27, 2003
    Applicant: Nippon Suisan Kaisha, Ltd., a Japan corporation
    Inventors: Shuji Jinno, Takaaki Okita, Naomi Ohtsuka, Shinya Yamashita, Junichiro Hata, Jiro Takeo
  • Patent number: 6602898
    Abstract: Compounds represented by formula (1), wherein X is, for example, CH, CH2, CHR (wherein R is a lower alkyl group or a substituted lower alkyl group) or CRR′ (wherein R and R′ are the same as the above defined R); Y is, for example, CH, CH2 or C═O; Z is, for example, O, S, S=O or SO2; U is C or N; R1 to R4 are each independently, for example, a hydrogen atom, OR, SR (wherein R is the same as defined above), or an aromatic ring, a substituted aromatic ring or a heterocycle; at least one of R5 and R8 is, for example, OH and the remaining of R5 and R8 are each independently, for example, a hydrogen atom or OH, optical isomers thereof, conjugates thereof or pharmaceutically acceptable salts thereof are provided.
    Type: Grant
    Filed: February 26, 2002
    Date of Patent: August 5, 2003
    Assignee: Nippon Suisan Kaisha, Ltd.
    Inventors: Shuji Jinno, Takaaki Okita, Naomi Ohtsuka, Shinya Yamashita, Junichiro Hata, Jiro Takeo
  • Publication number: 20030065021
    Abstract: The present invention offers a tracheal smooth muscle relaxant containing the compound represented by the following formula (1) or pharmacologically acceptable salt thereof as an effective ingredient.
    Type: Application
    Filed: October 1, 2002
    Publication date: April 3, 2003
    Inventors: Shinya Yamashita, Jiro Takeo, Shuji Jinno, Yasuyo Kogure, Hiroyuki Onuki, Takaaki Okita, Junichiro Hata, Yasuhiro Fukuda, Naomi Ohtsuka
  • Patent number: 6495592
    Abstract: The present invention offers a tracheal smooth muscle relaxant containing the compound represented by the following formula (1) or pharmacologically acceptable salt thereof as an effective ingredient.
    Type: Grant
    Filed: June 30, 2000
    Date of Patent: December 17, 2002
    Assignee: Nippon Suisan Kaisha, Ltd.
    Inventors: Shinya Yamashita, Jiro Takeo, Shuji Jinno, Yasuyo Kogure, Hiroyuki Onuki, Takaaki Okita, Junichiro Hata, Yasuhiro Fukuda, Naomi Ohtsuka
  • Patent number: 6180659
    Abstract: The present invention offers a tracheal smooth muscle relaxant containing the compound represented by the following formula (1) or pharmacologically acceptable salt thereof as an effective ingredient.
    Type: Grant
    Filed: August 31, 1998
    Date of Patent: January 30, 2001
    Assignee: Nippon Suisan Kaisha, Ltd.
    Inventors: Shinya Yamashita, Jiro Takeo, Shuji Jinno, Yasuyo Kogure, Hiroyuki Onuki, Takaaki Okita, Junichiro Hata, Yasuhiro Fukuda, Naomi Ohtsuka
  • Patent number: 5955505
    Abstract: A method comprising administering a sulfonamide derivative to a patient requiring activation of glutamate receptors, the sulfonamide derivative represented by the formula ##STR1## wherein A is a napthyl group, a pyridyl group, a phenyl group, a phenyl group substituted by 1 to 5 members selected from the group consisting of a halogen atom, an alkyl group having 1 to 40 carbon atoms, an alkoxy group having 1 to 4 carbon atoms, a nitro group, and an acetamido group, or an alkyl group having 1 to 20 carbon atoms; B is an alkylene group having 1 to 3 carbon atoms, a group of --OCH.sub.2 -- or a group of --CH.dbd.CH--; X and Y are the same or different, and are each a hydrogen atom or a fluorine atom; R is a carboxy group, an alkoxycarbonyl group having 2 to 5 carbon atoms, a hydroxymethyl group or a group of ##STR2## wherein R.sub.1 is a hydrogen atom or an alkyl group having 1 to 3 carbon atoms; and R.sub.
    Type: Grant
    Filed: August 20, 1997
    Date of Patent: September 21, 1999
    Assignee: Nippon Suisan Kaisha, Ltd.
    Inventors: Jiro Takeo, Shinya Yamashita, Keiji Wada, Yoshiyuki Chiba