Patents by Inventor Shinya Yonaha

Shinya Yonaha has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for coating a resist film and resist coater
    Publication number: 20010005639
    Abstract: A resist film having a thickness of 5500Å or less is coated on the wafer having a large diameter of 8 inches or more by the spin coat process. A resist is dripped while allowing the wafer to be rotated at a rotation speed of 500 rpm to 1200 rpm and the dripping of the resist is suspended at the time of spreading the resist on the whole surface of the wafer. The rotation speed is raised to the predetermined rotation speed which regulates the thickness of the resist film and is determined from the correlation of the predetermined rotation speed and the thickness of the resist film. The wafer is rotated for 1 second to 5 seconds at the predetermined rotation speed. Then, the wafer is rotated for 15 seconds or more at the rotation speed which is lower than the predetermined rotation speed.
    Type: Application
    Filed: February 6, 2001
    Publication date: June 28, 2001
    Inventor: Shinya Yonaha
  • Method for coating a resist film
    Patent number: 6251487
    Abstract: A resist film having a thickness of 5500 Å or less is coated on the wafer having a large diameter of 8 inches or more by the spin coat process. A resist is dripped while allowing the wafer to be rotated at a rotation speed of 500 rpm to 1200 rpm and the dripping of the resist is suspended at the time of spreading the resist on the whole surface of the wafer. The rotation speed is raised to the predetermined rotation speed which regulates the thickness of the resist film and is determined from the correlation of the predetermined rotation speed and the thickness of the resist film. The wafer is rotated for 1 second to 5 seconds at the predetermined rotation speed. Then, the wafer is rotated for 15 seconds or more at the rotation speed which is lower than the predetermined rotation speed.
    Type: Grant
    Filed: August 31, 1999
    Date of Patent: June 26, 2001
    Assignee: NEC Corporation
    Inventor: Shinya Yonaha
  • Coater
    Patent number: 5820677
    Abstract: A spinning type coater for forming a thin film on a substrate by dropping a liquid onto the substrate is disclosed. An annular light-sensitive element is mounted on a peripheral portion of a rotatable table which is to be loaded with a substrate. A block carrying a nozzle or nozzles therewith is movable over the table in X and Y directions. A light emitting element for emitting light having a long wavelength is mounted on the block.
    Type: Grant
    Filed: September 17, 1997
    Date of Patent: October 13, 1998
    Assignee: NEC Corporation
    Inventor: Shinya Yonaha