Patents by Inventor Shinzo Onishi
Shinzo Onishi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20140290119Abstract: Fishing needs baits and especially live baits are very attractive, however, availability of live baits is unpredictable. So artificial fishing lures are a sure way to successful fishing. One of the most popular lures is a fishing spoon for predatory fish. In addition to classic squid spoons, many variations are widely used. The new invented spoon has only two parts, a flat semi-rigid spoon body and a hook. Although the two parts are assembled without any tools, effectiveness of the spoon is no less than the best spoon available. The punched thin metal or plastics spoon body remains flat without a hook. The spoon body with a hook forms gentle curved shape which mimics bait fish swimming at high speed when trolling. The cost of the invented spoon is a fraction of the prior art fishing spoons.Type: ApplicationFiled: April 1, 2013Publication date: October 2, 2014Inventor: Shinzo Onishi
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Patent number: 8597473Abstract: The present invention provides a method of controlling a reactive sputtering system used in coating processes. More specifically, the present invention provides a microprocessor-based control system for reactive gases in a sputtering system, particularly during the start-up phase of operation. The preferred demand for such a reactive gas is predicted for every stage of the operation, and the reactive gas supply is amenable to predictive control provided by object program-driven mathematical formulae. The injection of reactive gas using time-advanced, sequential, mathematically-derived procedures simplifies overall system operation and provides a system with an optimal amount of reactive gas at an optimal time.Type: GrantFiled: August 24, 2005Date of Patent: December 3, 2013Assignee: University of South FloridaInventor: Shinzo Onishi
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Patent number: 8384169Abstract: The present invention provides a DC high voltage converter having an oscillator driver, main switch array and topological enhanced capacitors. The switch array utilizes MEM cantilevers and topological capacitors for charge storages for the generation of a high voltage output from a low voltage input.Type: GrantFiled: November 30, 2011Date of Patent: February 26, 2013Assignee: University of South FloridaInventors: Lawrence Langebrake, Shinzo Onishi, Scott Samson, Raj Popuri
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Patent number: 8093967Abstract: The present invention provides a DC high voltage converter having an oscillator driver, main switch array and topological enhanced capacitors. The switch array utilizes MEM cantilevers and topological capacitors for charge storages for the generation of a high voltage output from a low voltage input utilizing the chattering motion of the cantilever.Type: GrantFiled: March 16, 2007Date of Patent: January 10, 2012Assignee: University of South FloridaInventors: Weidong Wang, Shinzo Onishi
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Patent number: 8088638Abstract: The present invention provides a DC high voltage converter having an oscillator driver, main switch array and topological enhanced capacitors. The switch array utilizes MEM cantilevers and topological capacitors for charge storages for the generation of a high voltage output from a low voltage input.Type: GrantFiled: March 16, 2007Date of Patent: January 3, 2012Assignee: University of South FloridaInventors: Lawrence Lagebrake, Shinzo Onishi, Scott Samson, Raj Popuri
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Patent number: 8083907Abstract: A hydrogen storage system using a coiled nano-foil hydride and methods for forming the hydrogen absorbing nano-foil coil without backing materials. Intercalation of hydrogen in metal hydrides allows for large amounts of hydrogen to be stored at atmospheric temperatures and pressures. Nano-films provide a large surface area for storage of hydrogen. Excessive heating of the system is avoided by use of a modified magnetron source, and the deposition rate is increased by employing stronger magnetic fields. The foil formed is capable of storage and of mechanical self-support without breakage and expansion up to 20% of its initial volume.Type: GrantFiled: September 24, 2004Date of Patent: December 27, 2011Assignee: University of South FloridaInventors: Shinzo Onishi, Melynda Calves
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Patent number: 7829409Abstract: In accordance with the present invention, a novel method to fabricate topological capacitors is provided. The fabrication method of the instant invention is based upon a reversed surface topology utilizing deep reactive ion etching to establish conductive capacitive elements and non-conductive capacitive element groups.Type: GrantFiled: February 27, 2007Date of Patent: November 9, 2010Assignee: University of South FloridaInventors: Shinzo Onishi, Lawrence C. Langebrake
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Publication number: 20100118465Abstract: In accordance with the present invention, a novel method to fabricate topological capacitors is provided. The fabrication method of the instant invention is based upon a reversed surface topology utilizing deep reactive ion etching to establish conductive capacitive elements and non-conductive capacitive element groups.Type: ApplicationFiled: February 27, 2007Publication date: May 13, 2010Applicant: UNIVERSITY OF SOUTH FLORIDAInventors: Shinzo Onishi, L.C. Langebrake
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Patent number: 7201485Abstract: The present invention includes a novel method to fabricate corner cube retroreflectors, CCRs, where a majority of the wafer area acts as CCRs as compared to a maximum of 33% in previous MEMS CCRs. The present invention also allows for the fabrication of moveable cantilevers which operate at one-third the voltage as compared to a conventional planar cantilever.Type: GrantFiled: August 16, 2004Date of Patent: April 10, 2007Assignee: University of South FloridaInventors: Rahul Agarwal, Shekhar Bhansali, Shinzo Onishi, Scott Samson
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Publication number: 20040055883Abstract: A target for physical vapor deposition (PVD) and methods for depositing nonmagnetic materials are described. Power is introduced into the chamber through the target to produce plasma. The planar magnetron system is chosen for its high deposition rates. Since the permanent magnets are behind the target in traditional system, the magnetic target interferes with the required magnetic fields on the target. To eliminate this problem, permanent magnets are arranged on the target surface. Strong magnetic fields on the target can now be maintained for high deposition rates. The permanent magnets may be covered by a relatively thin, suitable protective film or by a film of the same material as the target.Type: ApplicationFiled: September 17, 2003Publication date: March 25, 2004Inventor: Shinzo Onishi
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Patent number: 6623610Abstract: A target for physical-vapor deposition (PVD) and methods for depositing magnetic materials are described Radio frequency (RF) or direct current (DC) power is introduced into the chamber through the target to produce plasma. The planar magnetron system is chosen for its high deposition rates. Since the permanent magnets are behind the target in the traditional system, a magnetic target interferes with the required magnetic fields on the target. To eliminate this problem permanent magnets are arranged on the surface and a magnetic target is used as a part of the magnetic circuit. Strong magnetic fields on the target can now be maintained for high deposition rates. The permanent magnets may be covered by a relatively thin, suitable protective-film or by a film of the same material as the target.Type: GrantFiled: March 2, 2002Date of Patent: September 23, 2003Inventor: Shinzo Onishi
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Publication number: 20030164288Abstract: A target for physical-vapor deposition (PVD) and methods for depositing magnetic materials are described. Radio frequency (RF) or direct current (DC) power is introduced into the chamber through the target to produce plasma. The planar magnetron system is chosen for its high deposition rates. Since the permanent magnets are behind the target in the traditional system, a magnetic target interferes with the required magnetic fields on the target. To eliminate this problem permanent magnets are arranged on the surface and a magnetic target is used as a part of the magnetic circuit. Strong magnetic fields on the target can now be maintained for high deposition rates. The permanent magnets may be covered by a relatively thin, suitable protective-film or by a film of the same material as the target.Type: ApplicationFiled: March 2, 2002Publication date: September 4, 2003Inventor: Shinzo Onishi
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Publication number: 20030089680Abstract: Disclosed is a method and apparatus for the etching of a thin film upon a photomask. The etching is carried out in a reactor via an inductively coupled pulsed plasma. Pulsing of the plasma is achieved by regulating the time period (or duty cycle) in which the plasma is generated. It has been found that by decreasing the duty cycle, high etch selectively can be achieved and feature sizes can be faithfully maintained.Type: ApplicationFiled: October 22, 2002Publication date: May 15, 2003Inventors: David J. Johnson, Shinzo Onishi, Christopher Constantine
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Patent number: 6258217Abstract: A sputtering system and magnet array for depositing metal and metal-reactive gas coatings onto a substrate. The magnet array is designed for use in a rotating magnetron. The magnet array includes a plurality of magnets disposed on a plate. The plurality of magnets is arranged such that a closed-loop magnetic path is formed. The shape of the magnetic path is a double-lobe structure that includes first and second lobes that are symmetric to one another about an axis in the plane of the plate that intersects the center of rotation of the plate. The magnets are arranged in several rows. A first row of magnets has a double-lobe structure that corresponds to the first and second lobes of the magnetic path. Second and third rows of magnets are arranged in the shape of rings inside the first and second lobes of the magnetic path magnetic path. The lobe structure of the magnetic path can be circular or elliptical in shape.Type: GrantFiled: September 29, 1999Date of Patent: July 10, 2001Assignee: Plasma-Therm, Inc.Inventors: Edmond A. Richards, Paul R. Fournier, David Johnson, Abdul Lateef, David G. Lishan, Shinzo Onishi, Mark D. Kenney
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Patent number: 5938612Abstract: An ultrasonic transducer array having a plurality of transducer elements, at least some of which have multiple piezoelectric and electrode layers. The resonant frequency of the transducer elements may range from 500 kHz to 300 MHz or more. A single array may have transducer elements of different resonant frequencies, and the array may be sparsely populated. Highest frequencies are typically obtained when the piezoelectric layers are made from vapor deposited PZT in accordance with a disclosed deposition process. The array may have a 1-D configuration, 1.5-D or 2-D, configuration. The array may be positioned in a probe.Type: GrantFiled: May 5, 1997Date of Patent: August 17, 1999Assignee: Creare Inc.Inventors: Robert Kline-Schoder, Shinzo Onishi
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Patent number: 5906580Abstract: An ultrasonic imaging system capable of transmitting and receiving ultrasound over a wide frequency range, i.e., 500 KHz-300 MHz. Ultrasound may be transmitted from a single transducer array at multiple frequencies simultaneously or sequentially via separate, acoustically isolated transducer elements, each having a unique resonant frequency. Signal-to-noise ratio may be enhanced through use of multiple piezoelectric layer transmit transducer elements and single piezoelectric layer receive transducer elements, both on a single transducer array. Aspect ratios approaching unity for transducer elements of the array may be obtained, which can be used to reduce grating lobes. Sparsely populated transducer arrays are included in the imaging system. Methods of ultrasound imaging and ultrasound therapy obtainable with the present imaging system are included in the invention.Type: GrantFiled: May 5, 1997Date of Patent: May 25, 1999Assignee: Creare Inc.Inventors: Robert Kline-Schoder, David Kynor, Shinzo Onishi
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Patent number: 5336997Abstract: New core geometries to increase the sensing range of proximity transducers in general, and eddy current killed oscillator mode sensors, in particular. A theoretical analysis yields electromagnetic parameters that facilitate prediction of the sensing capability of any ferrite core geometry. The results of this analysis is applied to a multitude of Finite Element Analysis models to study changes in maximum sensing distance due to ferrite core geometry modifications. This yielded preferred embodiments for shielded and unshielded sensors.Type: GrantFiled: September 21, 1992Date of Patent: August 9, 1994Assignee: Virginia Tech Intellectual Properties, Inc.Inventors: Kofi D. Anim-Appiah, Sedki M. Riad, Shinzo Onishi
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Patent number: 4779994Abstract: The invention is a heat flux gage applied to a surface, for the measurement of surface heat transfer. All elements of the gage are thin films, deposited on the surface by sputtering or an equivalent process. The gage comprises a plurality of thermocouple junctions connected as a differential thermopile, with hot and cold junctions on the two faces of a planar thermal resistance element. Electrical insulating and protective layers are deposited between the surface and the gage, and over the exterior of the gage. The gage output signal is a voltage indicative of heat flux.Type: GrantFiled: October 15, 1987Date of Patent: October 25, 1988Assignee: Virginia Polytechnic Institute and State UniversityInventors: Thomas E. Diller, Shinzo Onishi