Patents by Inventor Shiro Tan
Shiro Tan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9177921Abstract: A method for manufacturing a semiconductor device with a treated member, includes: subjecting an adhesive support having a substrate and an adhesive layer capable of increasing or decreasing in adhesiveness upon irradiation with an actinic ray, radiation or heat to irradiation of the adhesive layer with an actinic ray, radiation or heat, adhering a first surface of a to-be-treated member to the adhesive layer of the adhesive support, applying a mechanical or chemical treatment to a second surface different from the first surface of the to-be-treated member to obtain a treated member, and detaching a first surface of the treated member from the adhesive layer of the adhesive support, wherein the irradiation of the adhesive layer with an actinic ray, radiation or heat is conducted so that adhesiveness decreases toward an outer surface from an inner surface on the substrate side of the adhesive layer.Type: GrantFiled: July 7, 2014Date of Patent: November 3, 2015Assignee: FUJIFILM CorporationInventors: Shiro Tan, Kazuhiro Fujimaki, Yu Iwai, Ichiro Koyama, Atsushi Nakamura
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Publication number: 20150093879Abstract: The invention is directed to a temporary adhesive for production of semiconductor device, containing (A) a polymer compound having an acid group, (B) a diluent, and (C) a solvent, an adhesive support including a substrate and an adhesive layer formed from the temporary adhesive for production of semiconductor device, and a production method of semiconductor device having a member processed including: adhering a first surface of a member to be processed to a substrate through an adhesive layer formed from the temporary adhesive for production of semiconductor device as claimed; conducting a mechanical or chemical processing on a second surface which is different from the first surface of the member to be processed to obtain the member processed; and releasing the first surface of the member processed from the adhesive layer.Type: ApplicationFiled: December 11, 2014Publication date: April 2, 2015Applicant: FUJIFILM CORPORATIONInventors: Kazuhiro FUJIMAKI, Ichiro KOYAMA, Atsushi NAKAMURA, Yu IWAI, Shiro TAN
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Publication number: 20140322893Abstract: A method for manufacturing a semiconductor device with a treated member, includes: subjecting an adhesive support having a substrate and an adhesive layer capable of increasing or decreasing in adhesiveness upon irradiation with an actinic ray, radiation or heat to irradiation of the adhesive layer with an actinic ray, radiation or heat, adhering a first surface of a to-be-treated member to the adhesive layer of the adhesive support, applying a mechanical or chemical treatment to a second surface different from the first surface of the to-be-treated member to obtain a treated member, and detaching a first surface of the treated member from the adhesive layer of the adhesive support, wherein the irradiation of the adhesive layer with an actinic ray, radiation or heat is conducted so that adhesiveness decreases toward an outer surface from an inner surface on the substrate side of the adhesive layer.Type: ApplicationFiled: July 7, 2014Publication date: October 30, 2014Applicant: FUJIFILM CORPORATIONInventors: Shiro TAN, Kazuhiro FUJIMAKI, Yu IWAI, Ichiro KOYAMA, Atsushi NAKAMURA
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Publication number: 20140318697Abstract: A method for manufacturing a semiconductor device with a treated member, includes: subjecting an adhesive support having a substrate and an adhesive layer capable of increasing or decreasing in adhesiveness upon irradiation with an actinic ray or radiation to pattern exposure of the adhesive layer to provide a high adhesive region and a low adhesive region in the adhesive layer, adhering a first surface of a to-be-treated member to the adhesive layer of the adhesive support, applying a mechanical or chemical treatment to a second surface different from the first surface of the to-be-treated member to obtain a treated member, and detaching the first surface of the treated member from the adhesive layer of the adhesive support.Type: ApplicationFiled: July 10, 2014Publication date: October 30, 2014Applicant: FUJIFILM CORPORATIONInventors: Shiro TAN, Kazuhiro FUJIMAKI, Atsushi NAKAMURA, Yu IWAI, Ichiro KOYAMA
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Patent number: 7144678Abstract: A lithographic printing plate precursor comprises: a support; and an image-forming layer including a fluoroaliphatic group-containing copolymer, wherein the fluoroaliphatic group-containing copolymer contains a repeating unit corresponding to monomer (i) below and a repeating unit corresponding to monomer (ii) below: (i) a specified fluoroaliphatic group-containing monomer, and (ii) at least one of a poly(oxyalkylene) acrylate and a poly(oxyalkylene) methacrylate.Type: GrantFiled: April 1, 2002Date of Patent: December 5, 2006Assignee: Fuji Photo Film Co., Ltd.Inventors: Shiro Tan, Kazuo Fujita, Akira Nishioka
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Patent number: 7105270Abstract: The present invention provides a copolymer comprising repeating units derived from (A) at least one fluoroalkyl (meth) acrylate represented by the following general formula (I) or (II): wherein, X1 represents —O— or —NR3—; R1 represents —H or —CH3; R3 represents a hydrogen atom, a substituted or unsubstituted alkyl group having 1 to 12 carbon atoms, a substituted or unsubstituted cycloalkyl group having 3 to 12 carbon atoms, a substituted or unsubstituted aryl group having 6 to 12 carbon atoms or a substituted or unsubstituted aralkyl group having 7 to 24 carbon atoms; R2 represents H or F; m is an integer ranging from 0 to 10; n is an integer of 2 or 3; and o and p each represents an integer of 1 or 2, and (B) at least one polyoxyalkylene group-containing ethylenically unsaturated monomer, and also provides an image-forming composition, a presensitized plate useful for preparing a lithographic printing plate, a paint composition or a photo resist composition comprising the copolymer.Type: GrantFiled: January 29, 2003Date of Patent: September 12, 2006Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuo Fujita, Shiro Tan
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Publication number: 20060040115Abstract: A film formed by chemical vapor deposition of a diamantane or adamantane compound having a particular substituent or a composition containing the compound.Type: ApplicationFiled: August 16, 2005Publication date: February 23, 2006Inventors: Katsuyuki Watanabe, Shiro Tan
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Patent number: 6830872Abstract: Disclosed is planographic printing plate precursor comprising a support having disposed thereon an image forming layer containing a fluorine macromolecular compound having a structural unit derived from a monomer represented by the following general formula (I). In the general formula (I), R0 represents a hydrogen atom, a methyl group, a cyano group or a halogen atom. X represents a single bond or a divalent connecting group. R1 to R6 each independently represent a hydrogen atom, an alkyl group, a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom. Further, at least one of R1 to R6 represents a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom.Type: GrantFiled: September 20, 2002Date of Patent: December 14, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuyoshi Mizutani, Shiro Tan
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Patent number: 6780562Abstract: A lithographic printing plate precursor comprises an image forming layer containing at least one polymer compound having a fluoroaliphatic group on the side chain, wherein the fluoroaliphatic group is derived from a fluoroaliphatic compound produced by a telomerization or oligomerization method.Type: GrantFiled: August 29, 2001Date of Patent: August 24, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Tadahiro Sorori, Shiro Tan
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Patent number: 6740470Abstract: A lithographic printing plate precursor comprises: a support; and an image-forming layer including a copolymer containing a specific fluoroaliphatic group and a repeating unit corresponding to at least one of a poly(oxyalkylene) acrylate and a poly(oxyalkylene) methacrylate.Type: GrantFiled: February 8, 2002Date of Patent: May 25, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Shiro Tan, Tadahiro Sorori, Akira Nishioka
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Patent number: 6709800Abstract: A presensitized plate for preparing a lithographic printing plate comprises a substrate provided thereon with a light-sensitive layer containing a fluoro-aliphatic group-containing copolymer prepared by copolymerizing at least (A) an addition polymerizable monomer having, on a side chain, a fluoro-aliphatic group in which hydrogen atoms are replaced with fluorine atoms and (B) a (meth)acrylate having an ester chain represented by a specific general formula. The use of the foregoing specific fluorine atom-containing polymer permits the formation of a light-sensitive layer having uniform surface condition without causing abnormality in the surface quality due to the foaming phenomenon observed during the production and also permits the production of a positive light-sensitive resin composition having excellent solubility and dispersibility in a developer.Type: GrantFiled: August 5, 2002Date of Patent: March 23, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuo Fujita, Shiro Tan
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Patent number: 6692883Abstract: A positive photoresist composition is disclosed, comprising a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, a resin having a structural unit containing a specific group and capable of decomposing under the action of an acid to increase the solubility in an alkali developer, and a compound capable of generating an acid upon irradiation with actinic rays or radiation.Type: GrantFiled: April 20, 2001Date of Patent: February 17, 2004Assignee: Fuji Photo Film Co., Ltd.Inventors: Fumiyuki Nishiyama, Toru Fujimori, Shiro Tan
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Patent number: 6660445Abstract: The present invention relates to a photosensitive compound comprising a vinyl polymer compound which is insoluble in water and soluble in an aqueous alkaline solution and o-naphthoquinonediazide compound, wherein said vinyl polymer compound is a copolymer comprising at least one monomer unit derived from monomer compound (A): a compound having an alkaline-soluble group represented by general formula (I), (II) or (III) as defined in the specification, and at least one monomer unit derived from monomer compound (B): (meth)acrylate having poly(oxyalkylene) chain. A lithographic printing plate prepared from a presensitized plate having a photosensitive layer of said photosensitive compound of the present invention shows improvement of abrasion resistance, printing durability, chemical resistance, development latitude, and contamination property.Type: GrantFiled: October 5, 2001Date of Patent: December 9, 2003Assignee: Fuji Photo Film Co., Ltd.Inventors: Kazuo Fujita, Shiro Tan
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Publication number: 20030207202Abstract: The present invention provides a copolymer comprising repeating units derived from (A) at least one fluoroalkyl (meth) acrylate represented by the following general formula (I) or (II): 1Type: ApplicationFiled: January 29, 2003Publication date: November 6, 2003Applicant: Fuji Photo Film Co., Ltd.Inventors: Kazuo Fujita, Shiro Tan
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Patent number: 6638683Abstract: A positive photoresist composition comprises the combination of (a) Resin A obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (I) and (b) Resin B obtained from an alkali-soluble resin containing phenolic hydroxyl groups by replacing from 10 to 80% of the phenolic hydroxyl groups each with a group represented by formula (II) or (III) or a nonpolymeric dissolution inhibitive compound which has at least one kind of group selected from tertiary alkyl ester groups and tertiary alkyl carbonate groups; wherein R1, W, n, and R4 are as defined in the specification.Type: GrantFiled: June 24, 1998Date of Patent: October 28, 2003Assignee: Fuji Photo Film Co., Ltd.Inventors: Shiro Tan, Toshiaki Aoai, Toru Fujimori
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Patent number: 6630280Abstract: A positive photoresist composition comprising: (a) a resin having structural units represented by the following formulae (X) and being capable of decomposing by, the action of an acid to increase the solubility in an alkali developer, and (b) a compound capable of generating an acid with irradiation of actinic ray or radiation: wherein R1 and R2, which may be the same or different, each represents a hydrogen atom or an alkyl group having from 1 to 4 carbon atoms, R3 and R4, which may be the same or different, each represents a hydrogen atom or a linear, branched or cyclic alkyl group which may have a substituent, R5 represents a linear, branched or cyclic alkyl group which may have a substituent, an aryl group which may have a substituent or an aralkyl group which may have a substituent, m represents an integer of from 1 to 20, and n represents an integer of from 0 to 5.Type: GrantFiled: February 24, 2000Date of Patent: October 7, 2003Assignee: Fuji Photo Film Co., Ltd.Inventors: Toru Fujimori, Shiro Tan
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Publication number: 20030170559Abstract: Disclosed is planographic printing plate precursor comprising a support having disposed thereon an image forming layer containing a fluorine macromolecular compound having a structural unit derived from a monomer represented by the following general formula (I). In the general formula (I), R0 represents a hydrogen atom, a methyl group, a cyano group or a halogen atom. X represents a single bond or a divalent connecting group. R1 to R6 each independently represent a hydrogen atom, an alkyl group, a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom. Further, at least one of R1 to R6 represents a fluorine atom or an alkyl group in which at least one hydrogen atom is substituted with a fluorine atom.Type: ApplicationFiled: September 20, 2002Publication date: September 11, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Kazuyoshi Mizutani, Shiro Tan
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Publication number: 20030148209Abstract: A presensitized plate for preparing a lithographic printing plate comprises a substrate provided thereon with a light-sensitive layer containing a fluoro-aliphatic group-containing copolymer prepared by copolymerizing at least (A) an addition polymerizable monomer having, on a side chain, a fluoro-aliphatic group in which hydrogen atoms are replaced with fluorine atoms and (B) a (meth)acrylate having an ester chain represented by a specific general formula. The use of the foregoing specific fluorine atom-containing polymer permits the formation of a light-sensitive layer having uniform surface condition without causing abnormality in the surface quality due to the foaming phenomenon observed during the production and also permits the production of a positive light-sensitive resin composition having excellent solubility and dispersibility in a developer.Type: ApplicationFiled: August 5, 2002Publication date: August 7, 2003Inventors: Kazuo Fujita, Shiro Tan
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Publication number: 20030075066Abstract: A lithographic printing plate precursor comprises: a support; and an image-forming layer including a copolymer containing a specific fluoroaliphatic group and a repeating unit corresponding to at least one of a poly(oxyalkylene) acrylate and a poly(oxyalkylene) methacrylate.Type: ApplicationFiled: February 8, 2002Publication date: April 24, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Shiro Tan, Tadahiro Sorori, Akira Nishioka
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Publication number: 20030073034Abstract: A lithographic printing plate precursor comprises: a support; and an image-forming layer including a fluoroaliphatic group-containing copolymer, wherein the fluoroaliphatic group-containing copolymer contains a repeating unit corresponding to monomer (i) below and a repeating unit corresponding to monomer (ii) below:Type: ApplicationFiled: March 29, 2002Publication date: April 17, 2003Applicant: FUJI PHOTO FILM CO., LTD.Inventors: Shiro Tan, Kazuo Fujita, Akira Nishioka