Patents by Inventor Shirrji Kishimura

Shirrji Kishimura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Polymers, resist compositions and patterning process
    Publication number: 20050106499
    Abstract: A polymer comprising recurring units of formula (1) and recurring units of formulae (2a) to (2d) wherein R1 is F or fluoroalkyl, R2 is a single bond or an alkylene or fluoroalkylene, R3 and R4 are H, F, alkyl or fluoroalkyl, at least one of R3 and R4 contains F, R5 is H or an acid labile group, R6 is an acid labile group, adhesive group, alkyl or fluoroalkyl, and “a” is 1 or 2 is used as a base resin to formulate a resist composition which has advantages including high transparency to radiation having a wavelength of up to 200 nm, substrate adhesion, developer affinity and dry etching resistance.
    Type: Application
    Filed: October 21, 2004
    Publication date: May 19, 2005
    Inventors: Yuji Harada, Yoshio Kawai, Masaru Sasago, Masayuki Endo, Shirrji Kishimura, Kazuhiko Maeda, Haruhiko Komoriya, Kazuhiro Yamanaka