Patents by Inventor Shiv Shailendar

Shiv Shailendar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250044684
    Abstract: A method of forming a printhead of an electrochemical deposition system includes applying at least one first photosensitive resist layer onto a substrate comprising a connection circuit, exposing a portion of the at least one first photosensitive resist layer to a first light such that a first-layer region is defined, applying at least one second photosensitive resist layer onto the at least one first photosensitive resist layer, and exposing a portion of the at least one second photosensitive resist layer to a second light such that a second-layer region, at least partially overlapping the first-layer region, is defined. The method further includes developing the at least one first photosensitive resist layer and the at least one second photosensitive resist layer to remove the second-layer region and at least a portion of the first-layer region, such that an aperture is formed with an overhang portion.
    Type: Application
    Filed: January 31, 2024
    Publication date: February 6, 2025
    Inventors: Edward White, Shiv Shailendar, Ryan Nicholl, David Pain
  • Publication number: 20240218546
    Abstract: Described herein are electrochemical-additive manufacturing (ECAM) systems comprising electrophoretically-deposited masks selectively covering a set of individually-addressable electrodes (pixels) in the electrode arrays (printheads). For example, an electrophoretically-deposited mask, comprising one or more patches, can be used to block the electric current through certain array portions thereby preventing electrolytic deposition on the corresponding portions of the deposition electrode during ECAM processes. In some examples, electrode array portions can be masked to cover damaged portions (e.g., stuck-on control circuits, electrically and/or ionically conductive passages in the electrode array) and/or to form special patterns of inactive array portions (that no longer need to be controlled using deposition control circuits). Such electrophoretically-deposited masks can be formed in an ECAM system or an external system. The mask forming can be a single-stage process or a multi-stage process.
    Type: Application
    Filed: June 21, 2023
    Publication date: July 4, 2024
    Applicant: Fabric8Labs, Inc.
    Inventors: Sean Stone, Kareemullah Shaik, Shiv Shailendar
  • Publication number: 20240218545
    Abstract: Described herein are methods and systems for additive manufacturing of parts comprising electrolytic deposits and electrophoretic deposits. Such methods and methods provide various new ways for integrating different materials into composite parts. Specifically, an additive manufacturing system comprises an electrode array with individually-addressable electrodes. Each individually-addressable electrode is coupled to a separate deposition control circuit, which selectively connects this electrode to a power supply. When forming a composite part, the electrode array can control the location of each electrolytic deposit (by controlling the current flow through each individually-addressable electrode) and each electrophoretic deposit (by controlling the electric field distribution). An electrolyte solution or an electrophoretic suspension is provided between the electrode array and deposition electrode to form corresponding deposits.
    Type: Application
    Filed: June 27, 2023
    Publication date: July 4, 2024
    Applicant: Fabric8Labs, Inc.
    Inventors: Michael Matthews, David Pain, Sean Stone, Kareemullah Shaik, Charles Nicholas Pateros, Shiv Shailendar