Patents by Inventor Shiwen Huang

Shiwen Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11951778
    Abstract: A sound absorber is configured as a rectangular hexahedral box and forms a porous double-layer Helmholtz resonance sound absorbing structure, at the same time, the sound absorber in the form of a box forms a structural resonance sound absorbing device itself, and the first-order natural mode frequency of the device is identical to that of a wheel air chamber. When the box-type sound absorbing structure is assembled in a wheel, double functions of absorbing acoustic resonance of the wheel air chamber under the organic combination of Helmholtz resonance sound absorption and structural resonance sound absorption can be realized.
    Type: Grant
    Filed: January 19, 2020
    Date of Patent: April 9, 2024
    Assignee: CITIC Dicastal Co., LTD
    Inventors: Shiwen Xu, Mingbo Chen, Minglei Li, Shaobing Huang, Tiefeng Hu, Shuwei Feng, Dadong Wang, Weidong Liu
  • Publication number: 20240113288
    Abstract: This application relates to a negative electrode plate, a secondary battery and apparatus thereof. The secondary battery of the present application comprises a negative electrode plate, the negative electrode plate comprises a composite current collector and a negative electrode active material layer disposed on at least one surface of the composite current collector, the negative electrode active material layer comprises a silicon-based active material, the silicon-based active material accounts for 0.5 wt % to 50 wt % of total mass of the negative electrode active material layer, and the composite current collector comprises a polymer support layer and a metal conductive layer disposed on at least one surface of the polymer support layer. The secondary battery and the negative electrode plate achieve good coordination between the current collector and the negative electrode active material layer.
    Type: Application
    Filed: November 30, 2023
    Publication date: April 4, 2024
    Applicant: Contemporary Amperex Technology Co., Limited
    Inventors: Cheng LI, Qisen HUANG, Xin LIU, Changliang SHENG, Shiwen WANG, Xianghui LIU, Jia PENG, Mingling LI, Chengdu LIANG
  • Publication number: 20210120749
    Abstract: Provided is an artificial inoculation method for bacterial panicle blight of rice. The method includes the steps of S1. preparing an inoculum using a bacteria solution of Burkholderia glumae; S2. inoculating at the booting stage of rice; S3. adopting an inoculation method of injection, and injecting the inoculum prepared in the step S1 into the hollow booting part of a rice stalk from bottom to top by an injector; and S4. calculating the incidence rate and disease index after inoculation according to the number of diseased panicles and the number of diseased grains.
    Type: Application
    Filed: September 8, 2020
    Publication date: April 29, 2021
    Applicant: China National Rice Research Insititute
    Inventors: Yuxuan HOU, Shiwen HUANG, Lianmeng LIU, Ling WANG
  • Patent number: 9230576
    Abstract: Embodiments disclosed herein generally relate to a magnetic head having a sensor stack and a bias material that is aligned in a direction perpendicular to a media facing surface. The sensor stack and a first portion of the bias material are laterally bookended by synthetic antiferromagnetic (SAF) structures, and a second portion of the bias material is laterally bookended by a dielectric material. In this configuration, the SAF structures are decoupled from the bias material, which minimizes the disturbance to the bias material.
    Type: Grant
    Filed: September 8, 2014
    Date of Patent: January 5, 2016
    Assignee: HGST NETHERLANDS B.V.
    Inventors: Hardayal Singh Gill, Shiwen Huang, Quang Le, Guangli Liu, Xiaoyong Liu, Suping Song
  • Publication number: 20140268420
    Abstract: A magnetic write head having a write pole with a novel configuration improving write field strength and field gradient while also reducing adjacent track interference and far track interference. The write pole is configured with a pole tip portion that has a narrow track width, preferably 15-30 degrees and a main yoke portion with a larger flare angle of about 45 degrees. The write pole also has an intermediate portion located between the pole tip and main pole portions. The intermediate portion includes a first portion adjacent to the pole tip that has a flare angle greater than the flare angle of the main yoke and has a second portion with a flare angle less than the flare angle of the yoke.
    Type: Application
    Filed: March 14, 2013
    Publication date: September 18, 2014
    Applicant: HGST NETHERLANDS B.V.
    Inventors: Yingjian Chen, Shiwen Huang, Terence T. L. Lam, Mun H. Park, Kyusik Shin, Yi Zheng, Yuming Zhou
  • Patent number: 8801943
    Abstract: The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.
    Type: Grant
    Filed: July 28, 2011
    Date of Patent: August 12, 2014
    Assignee: HGST Netherlands B.V.
    Inventors: Shiwen Huang, Fenglin Liu, Qiping Zhong, Kyusik Shin, Yingjian Chen
  • Patent number: 8730617
    Abstract: In one embodiment, a magnetic head includes a main pole having a trapezoidal cross-section at a media-facing surface thereof and a flared shape with a greater width in a cross-track direction at positions away from the media-facing surface, a leading shield positioned near a leading side of the main pole, wherein a leading gap is provided between the main pole and the leading shield, side shields positioned on both sides of the main pole in the cross-track direction adjacent the media-facing surface of the main pole, with side gaps provided between the main pole and both of the side shields, and a trailing gap provided on a trailing side of the main pole at the media-facing surface thereof, with a throat height of the side shields being less than the throat height of the side shields at a position closer to the trailing gap than the leading gap.
    Type: Grant
    Filed: February 20, 2013
    Date of Patent: May 20, 2014
    Assignee: HGST Netherlands B.V.
    Inventors: Wen-Chien D. Hsiao, Shiwen Huang, Edward H. P. Lee, Valeri Synogatch, Sue S. Zhang, Yi Zheng, Yuming Zhou
  • Patent number: 8508886
    Abstract: A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.
    Type: Grant
    Filed: September 28, 2011
    Date of Patent: August 13, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Yingjian Chen, Shiwen Huang, Edward Hin Pong Lee, Mun Hyoun Park, Kyusik Shin, Yuming Zhou
  • Patent number: 8470186
    Abstract: A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.
    Type: Grant
    Filed: November 24, 2010
    Date of Patent: June 25, 2013
    Assignee: HGST Netherlands B.V.
    Inventors: Yingjian Chen, Shiwen Huang, Fenglin Liu, Kyusik Shin
  • Publication number: 20130078483
    Abstract: A write head for use in a magnetic disk drive and methods of manufacturing the same. When a non-magnetic reactive ion etching (RIE) stop layer is used in a damascene main pole fabrication process, the leading edge shield and the side shield have a magnetic separation. By replacing a non-magnetic RIE stop layer with a magnetic RIE stop layer, no removal of the RIE stop layer around the main pole is necessary. Additionally, the leading edge shield and the side shield will magnetically join together without extra processing as there will be no magnetic separation between the leading edge shield and the side shield.
    Type: Application
    Filed: September 28, 2011
    Publication date: March 28, 2013
    Inventors: Yingjian CHEN, Shiwen HUANG, Edward Hin Pong LEE, Mun Hyoun PARK, Kyusik SHIN, Yuming ZHOU
  • Publication number: 20130026131
    Abstract: The present disclosure describes a method for manufacturing a full wraparound shield damascene write head through the implementation of a three layered (tri-layered) hard mask. According to an embodiment of the invention, the various layers of hard mask are used for different purposes during the formation of a write head. The wraparound shield head of the present invention exhibits improved physical characteristics that further result in improved performance characteristics. Use of the hard mask layers according to the present invention allows for use of manufacturing processes that can be more closely controlled than those processes used in other processes. For example, smaller dimension lithographic techniques can be used. Also, reliance on certain CMP processes is not necessary where the use of CMP processes is not as well-controlled as deposition or lithographic techniques as is possible using the present invention.
    Type: Application
    Filed: July 28, 2011
    Publication date: January 31, 2013
    Applicant: Hitachi Global Storage Technologies Netherlands B.V.
    Inventors: Shiwen Huang, Fenglin Liu, Qiping Zhong, Kyusik Shin, Yingjian Chen
  • Patent number: 8345383
    Abstract: A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section.
    Type: Grant
    Filed: September 22, 2011
    Date of Patent: January 1, 2013
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Yan, Feiyue Li, Shiwen Huang, Jiun-Ting Lee, Yoshitaka Sasaki
  • Publication number: 20120125885
    Abstract: A perpendicular write head having a wrap around shield and a conformal side gap. In fabricating the write head, the leading edge shield may be chemical mechanical polished down to a level that is substantially even with a chemical mechanical polishing stop layer. Because the leading edge shield and the chemical mechanical polishing stop layer are used as RIE stop for trench RIE, a fully conformal side shield may be formed with a LTE/LES.
    Type: Application
    Filed: November 24, 2010
    Publication date: May 24, 2012
    Inventors: YINGJIAN CHEN, Shiwen Huang, Fenglin Liu, Kyusik Shin
  • Publication number: 20120012555
    Abstract: A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section.
    Type: Application
    Filed: September 22, 2011
    Publication date: January 19, 2012
    Inventors: Cherng-Chyi Yan, Feiyue Li, Shiwen Huang, Jiun-Ting Lee, Yoshitaka Sasaki
  • Publication number: 20120008236
    Abstract: Improved writability and a sharper neck transition are achieved in a PMR writer with a yoke that has essentially vertical sidewalls and a write pole that has sidewalls with a beveled angle. An alumina mold is made with a negative differential bevel angle by employing a two mask process. A first photoresist layer is patterned and etched to form a rectangular trench in an alumina layer. The trench extends beyond the intended ABS plane and in the opposite direction into the intended yoke area. A second photoresist layer is patterned into a yoke shape that is partially superimposed over the rectangular trench. After a second RIE process, the yoke opening adjoins the trench at a neck transition point along each long trench side. The volume of magnetic material in the yoke adjacent to the neck is thereby maximized. Dimension control of the main pole becomes independent of ABS positioning errors.
    Type: Application
    Filed: September 15, 2011
    Publication date: January 12, 2012
    Inventors: Jiun-Ting Lee, Shiwen Huang, Moris Dovek
  • Patent number: 8031433
    Abstract: A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section.
    Type: Grant
    Filed: September 5, 2008
    Date of Patent: October 4, 2011
    Assignee: Headway Technologies, Inc.
    Inventors: Cherng-Chyi Yan, Feiyue Li, Shiwen Huang, Jiun-Ting Lee, Yoshitaka Sasaki
  • Patent number: 8027125
    Abstract: Improved writability and a sharper neck transition are achieved in a PMR writer with a yoke that has essentially vertical sidewalls and a write pole that has sidewalls with a beveled angle. An alumina mold is made with a negative differential bevel angle by employing a two mask process. A first photoresist layer is patterned and etched to form a rectangular trench in an alumina layer. The trench extends beyond the intended ABS plane and in the opposite direction into the intended yoke area. A second photoresist layer is patterned into a yoke shape that is partially superimposed over the rectangular trench. After a second RIE process, the yoke opening adjoins the trench at a neck transition point along each long trench side. The volume of magnetic material in the yoke adjacent to the neck is thereby maximized. Dimension control of the main pole becomes independent of ABS positioning errors.
    Type: Grant
    Filed: June 21, 2007
    Date of Patent: September 27, 2011
    Assignee: Headway Technologies, Inc.
    Inventors: Jiun-Ting Lee, Shiwen Huang, Moris Dovek
  • Publication number: 20100061016
    Abstract: A non-conformal integrated side shield structure is disclosed for a PMR write head wherein the sidewalls of the side shield are not parallel to the pole tip sidewalls. Thus, the side gap distance between the leading pole tip edge and side shield is different than the side gap distance between the trailing pole tip edge and side shield. As a result, there is a reduced side fringing field and improved overwrite performance. The side gap distance is constant with increasing distance from the ABS along the main pole layer. A fabrication method is provided where the trailing shield and side shield are formed in the same step to afford a self-aligned shield structure. Adjacent track erasure induced by flux choking at the side shield and trailing shield interface can be eliminated by this design. The invention encompasses a tapered main pole layer in a narrow pole tip section.
    Type: Application
    Filed: September 5, 2008
    Publication date: March 11, 2010
    Inventors: Cherng-Chyi Han, Feiyue Li, Shiwen Huang, Jiun-Ting Lee, Yoshitaka Sasaki
  • Publication number: 20080316644
    Abstract: Improved writability and a sharper neck transition are achieved in a PMR writer with a yoke that has essentially vertical sidewalls and a write pole that has sidewalls with a beveled angle. An alumina mold is made with a negative differential bevel angle by employing a two mask process. A first photoresist layer is patterned and etched to form a rectangular trench in an alumina layer. The trench extends beyond the intended ABS plane and in the opposite direction into the intended yoke area. A second photoresist layer is patterned into a yoke shape that is partially superimposed over the rectangular trench. After a second RIE process, the yoke opening adjoins the trench at a neck transition point along each long trench side. The volume of magnetic material in the yoke adjacent to the neck is thereby maximized. Dimension control of the main pole becomes independent of ABS positioning errors.
    Type: Application
    Filed: June 21, 2007
    Publication date: December 25, 2008
    Inventors: Jiun-Ting Lee, Shiwen Huang, Moris Dovek