Patents by Inventor Shixuan Xin

Shixuan Xin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200062874
    Abstract: The present invention relates to a metallocene complex with a heteroatom-containing ?-ligand, having a chemical structure represented by formula (I) as below: wherein M is a transition metal element from Group 3, Group 4, Group 5 and Group 6 in the periodic table, including lanthanides and actinides; X, being the same as or different from each other, is selected from hydrogen, halogen, an alkyl group R, an alkoxyl group OR, a mercapto group SR, a carboxyl group OCOR, an amino group NR2, a phosphino group PR2, —OR?O— and OSO2CF3; n is an integer from 1 to 4 and is not zero; the charge number resulted from multiplying n by the charge number of X equals to the charge number of the central metal atom M minus 2; Q is a divalent radical; A is a ?-ligand; and Z is a ?-ligand; the process for producing the same; a catalyst system of the same; and use of the catalyst system.
    Type: Application
    Filed: November 1, 2019
    Publication date: February 27, 2020
    Inventors: Shixuan XIN, Xiaomei LANG, Shan XUE, Xinle LI, Hongfan HU, Xin SUN, Xueqin ZHANG, Shengyuan ZHOU, Yin RAN, Botian LI, Bochao ZHU, Junji JIA, Jingping QU, Yuming SONG, Yamei XIE, Ying MU, Wei GAO, Jinglong LIU
  • Publication number: 20180079843
    Abstract: The present invention relates to a metallocene complex with a heteroatom-containing ?-ligand, having a chemical structure represented by formula (I) as below: wherein M is a transition metal element from Group 3, Group 4, Group 5 and Group 6 in the periodic table, including lanthanides and actinides; X, being the same as or different from each other, is selected from hydrogen, halogen, an alkyl group R, an alkoxyl group OR, a mercapto group SR, a carboxyl group OCOR, an amino group NR2, a phosphino group PR2, —ORoO— and OSO2CF3; n is an integer from 1 to 4 and is not zero; the charge number resulted from multiplying n by the charge number of X equals to the charge number of the central metal atom M minus 2; Q is a divalent radical; A is a ?-ligand; and Z is a ?-ligand; the process for producing the same; a catalyst system of the same; and use of the catalyst system.
    Type: Application
    Filed: February 5, 2016
    Publication date: March 22, 2018
    Inventors: Shixuan XIN, Xiaomei LANG, Shan XUE, Xinle LI, Hongfan HU, Xin SUN, Xueqin ZHANG, Shengyuan ZHOU, Yin RAN, Botian LI, Bochao ZHU, Junji JIA, Jingping QU, Yuming SONG, Yamei XIE, Ying MU, Wei GAO, Jinglong LIU
  • Patent number: 8618319
    Abstract: A novel catalyst component for producing a crystalline ?-olefin polymer or ?-olefin/(meth)acrylate copolymer having few branches, especially a polymer having a high molecular weight, and a method for producing an ?-olefin polymer or an ?-olefin/(meth)acrylate copolymer using the catalyst component. A metal complex represented by the following general formula (D), as well as a method for producing an ?-olefin polymer and a method for producing an ?-olefin/(meth)acrylate copolymer using the metal complex.
    Type: Grant
    Filed: April 27, 2009
    Date of Patent: December 31, 2013
    Assignees: Japan Polypropylene Corporation, Japan Polyethylene Corporation
    Inventors: Fumihiko Shimizu, Shixuan Xin, Akio Tanna, Shiho Goromaru, Koushi Matsubara
  • Publication number: 20110213110
    Abstract: A novel catalyst component for producing a crystalline ?-olefin polymer or ?-olefin/(meth)acrylate copolymer having few branches, especially a polymer having a high molecular weight, and a method for producing an ?-olefin polymer or an ?-olefin/(meth)acrylate copolymer using the catalyst component. A metal complex represented by the following general formula (D), as well as a method for producing an ?-olefin polymer and a method for producing an ?-olefin/(meth)acrylate copolymer using the metal complex.
    Type: Application
    Filed: April 27, 2009
    Publication date: September 1, 2011
    Applicants: JAPAN POLYPROPYLENE CORPORATION, JAPAN POLYETHYLENE CORPORATION
    Inventors: Fumihiko Shimizu, Shixuan Xin, Akio Tanna, Shiho Goromaru, Koushi Matsubara
  • Publication number: 20060270794
    Abstract: Soft propylene-based resin compositions, which comprise substantially the following block (I) and block (II): Block (I): propylene-based polymer having propylene unit chain segments that bond in a mode of head-to-tail bonding, in which the chain segment has an isotactic block-containing stereoblock structure; Block (II): copolymer containing at least propylene and ethylene, exhibit good flexibility, transparency, and heat resistance.
    Type: Application
    Filed: August 2, 2006
    Publication date: November 30, 2006
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Fumihiko Shimizu, Kenjirou Takayanagi, Naomasa Sato, Fumiyoshi Yamada, Shixuan Xin
  • Patent number: 7105604
    Abstract: Soft propylene-based resin compositions, which comprise substantially the following block (I) and block (II): Block (I): propylene-based polymer having propylene unit chain segments that bond in a mode of head-to-tail bonding, in which the chain segment has an isotactic block-containing stereoblock structure; Block (II): copolymer containing at least propylene and ethylene, exhibit good flexibility, transparency, and heat resistance.
    Type: Grant
    Filed: July 29, 2004
    Date of Patent: September 12, 2006
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Fumihiko Shimizu, Kenjirou Takayanagi, Naomasa Sato, Fumiyoshi Yamada, Shixuan Xin
  • Publication number: 20050131160
    Abstract: Soft propylene-based resin compositions, which comprise substantially the following block (I) and block (II): Block (I): propylene-based polymer having propylene unit chain segments that bond in a mode of head-to-tail bonding, in which the chain segment has an isotactic block-containing stereoblock structure; Block (II): copolymer containing at least propylene and ethylene, exhibit good flexibility, transparency, and heat resistance.
    Type: Application
    Filed: July 29, 2004
    Publication date: June 16, 2005
    Applicant: MITSUBISHI CHEMICAL CORPORATION
    Inventors: Fumihiko Shimizu, Kenjirou Takayanagi, Naomasa Sato, Fumiyoshi Yamada, Shixuan Xin