Patents by Inventor Shiyu LIANG

Shiyu LIANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11854144
    Abstract: The embodiments of the present disclosure disclose subsurface scattering calculation method for translucent material rendering, which relates to the clipping and polynomial fitting of brute-force Monte Carlo photon tracking experimental results to accurately represent the energy attenuation of subsurface scattering in distance. On this basis, an average free path and a single scattering rate are used to determine the relationship of each term in the multinomial fitting formula so as to facilitate the calculation and adjustment of the reflection profile. In the end, through a new real-time importance sampling solution, the outgoing radiation from any point on the object surface is calculated by the Monte Carlo method. This importance sampling solution is also applicable to any other subsurface scattering calculation model. By combining this subsurface scattering calculation result with other results, such as highlight reflection, any translucent material object can be rendered accurately and efficiently.
    Type: Grant
    Filed: January 17, 2022
    Date of Patent: December 26, 2023
    Assignee: Beihang University
    Inventors: Yang Gao, Shiyu Liang, Aimin Hao, Hongyu Wu
  • Publication number: 20230053410
    Abstract: The embodiments of the present disclosure disclose subsurface scattering calculation method for translucent material rendering, which relates to the clipping and polynomial fitting of brute-force Monte Carlo photon tracking experimental results to accurately represent the energy attenuation of subsurface scattering in distance. On this basis, an average free path and a single scattering rate are used to determine the relationship of each term in the multinomial fitting formula so as to facilitate the calculation and adjustment of the reflection profile. In the end, through a new real-time importance sampling solution, the outgoing radiation from any point on the object surface is calculated by the Monte Carlo method. This importance sampling solution is also applicable to any other subsurface scattering calculation model. By combining this subsurface scattering calculation result with other results, such as highlight reflection, any translucent material object can be rendered accurately and efficiently.
    Type: Application
    Filed: January 17, 2022
    Publication date: February 23, 2023
    Inventors: Yang GAO, Shiyu LIANG, Aimin HAO, Hongyu WU