Abstract: The present application discloses display substrate having a base substrate; an insulating layer on the base substrate; and an electrode layer on a side of the insulating layer distal to the base substrate and having a plurality of electrode blocks. The insulating layer has a first side distal to the base substrate and a second side opposite to the first side and proximal to the base substrate. Each of the plurality of electrode blocks has a third side distal to the base substrate and a fourth side opposite to the third side and proximal to the base substrate. The first side of the insulating layer in the inter-electrode block region has a first height relative to a surface of the base substrate greater than a second height of the fourth side of an adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate.

Abstract: The present application discloses display substrate having a base substrate; an insulating layer on the base substrate; and an electrode layer on a side of the insulating layer distal to the base substrate and having a plurality of electrode blocks. The insulating layer has a first side distal to the base substrate and a second side opposite to the first side and proximal to the base substrate. Each of the plurality of electrode blocks has a third side distal to the base substrate and a fourth side opposite to the third side and proximal to the base substrate. The first side of the insulating layer in the inter-electrode block region has a first height relative to a surface of the base substrate greater than a second height of the fourth side of an adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate.

Abstract: The present application discloses an array substrate having a plurality of first thin film transistors and a plurality of second thin film transistors. Each of the plurality of first thin film transistors includes a silicon active layer. The array substrate includes a base substrate; a silicon layer having a plurality of silicon active layers respectively for the plurality of first thin film transistors; and a UV absorption layer on a side of the silicon layer distal to the base substrate, and including a plurality of UV absorption blocks. Each of the plurality of UV absorption blocks is on a side of the one of the plurality of silicon active layers distal to the base substrate, and is insulated from the one of the plurality of silicon active layers.

Abstract: A display substrate, a manufacturing method thereof, and a display device are provided, in the field of display technology. The display substrate includes a base substrate, and a thin-film transistor, a light-emitting device, an encapsulation structure, and a conductive film layer sequentially disposed on the base substrate in a direction away from the base substrate. Since the display substrate includes a conductive film layer on a side of the encapsulation structure away from the base substrate, when the protective film layer on the side of the conductive film layer away from the base substrate is peeled off, static electricity generated by the separation of the film layer can be released to the conductive film layer, avoiding electron transition to the active layer of the thin-film transistor in the display substrate to cause offset of the threshold voltage of the thin-film transistor. The display brightness uniformity of the display substrate can be ensured.

Abstract: An array substrate, a method for manufacturing the same, a display panel and a display device are disclosed. The array substrate includes: a substrate, and a planarization layer and a pixel definition layer sequentially disposed on the substrate, a protrusion is disposed on the planarization layer, the pixel definition layer is provided with an opening, and the protrusion is disposed in a region defined by the opening. The method for manufacturing the array substrate includes: forming a planarization layer on which a protrusion is disposed; forming a pixel definition layer, the pixel definition layer is provided with an opening, and the protrusion is disposed in a region defined by the opening.

Abstract: The present application discloses an array substrate having a plurality of first thin film transistors and a plurality of second thin film transistors. Each of the plurality of first thin film transistors includes a silicon active layer. The array substrate includes a base substrate; a silicon layer having a plurality of silicon active layers respectively for the plurality of first thin film transistors; and a UV absorption layer on a side of the silicon layer distal to the base substrate, and including a plurality of UV absorption blocks. Each of the plurality of UV absorption blocks is on a side of the one of the plurality of silicon active layers distal to the base substrate, and is insulated from the one of the plurality of silicon active layers.

Abstract: The present application discloses display substrate having a base substrate; an insulating layer on the base substrate; and an electrode layer on a side of the insulating layer distal to the base substrate and having a plurality of electrode blocks. The insulating layer has a first side distal to the base substrate and a second side opposite to the first side and proximal to the base substrate. Each of the plurality of electrode blocks has a third side distal to the base substrate and a fourth side opposite to the third side and proximal to the base substrate. The first side of the insulating layer in the inter-electrode block region has a first height relative to a surface of the base substrate greater than a second height of the fourth side of an adjacent electrode of the plurality of electrode blocks relative to the surface of the base substrate.

Abstract: The present disclosure provides a method for manufacturing an OLED display substrate, including a step of forming a pattern of a pixel definition layer on a substrate through a patterning process. A bottom wall of the pixel definition layer is formed on the substrate, a top wall of the pixel definition layer is arranged parallel to the bottom wall, and a side wall of the pixel definition layer is angled relative to the top wall at an acute angle.

Abstract: Embodiments of the present disclosure provide a flexible display panel, a method of manufacturing the flexible display panel, and a flexible display apparatus. The flexible display panel comprises: a reinforced insulating layer of an inorganic material, wherein the reinforced insulating layer comprises a reinforced region, and is formed with a reinforcing hole in the reinforced region; an organic material filled in the reinforcing hole; and at least one insulating film which is disposed on at least one of both sides of the reinforced insulating layer and which is in contact with the reinforced insulating layer at least in the reinforced region.

Abstract: The present disclosure provides an OLED substrate and a manufacturing method thereof, a display device and a manufacturing method thereof, and belongs to the technical field of display technology. A manufacturing method for an OLED substrate of the present disclosure includes: forming, by a patterning process, a pattern including first electrodes of OLED devices and a pixel defining layer provided above the first electrodes above the base substrate, wherein the pixel defining layer includes a plurality of pixel partition walls spaced apart from each other, each of the pixel partition walls defines one of the first electrodes.

Abstract: An OLED display panel and a method for manufacturing the same are provided. By successively forming a first organic film layer, a metal film layer, and a second organic film layer on a substrate layer, a width of the metal film layer is greater than a width of the first organic film layer in a peripheral region of the OLED display panel, to form an inverted trapezoid-shaped bottom-cut structure. An included angle between an edge of the first organic film layer and the metal film layer is relatively large, and if an inorganic film layer is further formed subsequently, the inorganic film layer may have a relatively small thickness at this position, which makes it easier for a crack to occur and a fracture to appear, as such, when cutting is performed using a laser, splitting of the inorganic film layer will be terminated at this position.

Abstract: A fingerprint recognition sensor includes a plurality of fingerprint recognition units arranged in an array. Each of the fingerprint recognition units includes a base substrate, an image capturing device disposed on one side of the substrate, and a first grating structure and a second grating structure sequentially disposed on the other side of the base substrate, the first grating structure has a first imaging hole at a position opposite to the image capturing device and the second grating structure has a second imaging hole at a position opposite to the image capturing device, and an extending direction of a slit of the first grating structure is perpendicular to an extending direction of a slit of the second grating structure.

Abstract: A display substrate, a manufacturing method thereof, and a display device are provided, in the field of display technology. The display substrate includes a base substrate, and a thin-film transistor, a light-emitting device, an encapsulation structure, and a conductive film layer sequentially disposed on the base substrate in a direction away from the base substrate. Since the display substrate includes a conductive film layer on a side of the encapsulation structure away from the base substrate, when the protective film layer on the side of the conductive film layer away from the base substrate is peeled off, static electricity generated by the separation of the film layer can be released to the conductive film layer, avoiding electron transition to the active layer of the thin-film transistor in the display substrate to cause offset of the threshold voltage of the thin-film transistor. The display brightness uniformity of the display substrate can be ensured.

Abstract: The present invention provides a method for manufacturing an array substrate, including; a step of providing a substrate; a step of making an electrode layer on the substrate; and a step of making a spacer layer and a spacer column on the electrode layer; wherein the spacer column is made by heat-treatment while the spacer layer is being formed, and a method for manufacturing an array substrate. The method for manufacturing an array substrate provided by the present invention can not only shorten the production cycle, lower the production cost, but also avoid the threshold voltage drift of the TFT due to the irradiation of a large area of ultraviolet rays.

Abstract: The present disclosure provides in some embodiments a method for manufacturing an OLED display substrate, including a step of forming a PS on a substrate with an anode and a step of forming a pattern of a pixel definition layer. The step of forming the PS is performed no later than the step of forming the pattern of the pixel definition layer. According to the present disclosure, the PS is able to be formed prior to the formation of the pattern of the pixel definition layer, or the PS and the pattern of the pixel definition layer are formed simultaneously through one single patterning process.

Abstract: The present disclosure provides an OLED substrate and a manufacturing method thereof, a display device and a manufacturing method thereof, and belongs to the technical field of display technology. A manufacturing method for an OLED substrate of the present disclosure includes: forming, by a patterning process, a pattern including first electrodes of OLED devices and a pixel defining layer provided above the first electrodes above the base substrate, wherein the pixel defining layer includes a plurality of pixel partition walls spaced apart from each other, each of the pixel partition walls defines one of the first electrodes.

Abstract: The present disclosure discloses a method for fabricating a display substrate, belonging to the technical field of displaying. The method includes: providing a base substrate having an array of Thin Film Transistors; forming a photoresist pattern on the base substrate, the photoresist pattern including a hollow region for forming a spacer pattern; forming a spacer material in the hollow region; and peeling the photoresist pattern so that the spacer material in the hollow region forms the spacer pattern.

Abstract: Embodiments of the present disclosure provide a flexible display panel, a method of manufacturing the flexible display panel, and a flexible display apparatus. The flexible display panel comprises: a reinforced insulating layer of an inorganic material, wherein the reinforced insulating layer comprises a reinforced region, and is formed with a reinforcing hole in the reinforced region; an organic material filled in the reinforcing hole; and at least one insulating film which is disposed on at least one of both sides of the reinforced insulating layer and which is in contact with the reinforced insulating layer at least in the reinforced region.

Abstract: An OLED display panel and a method for manufacturing the same are provided. By successively forming a first organic film layer, a metal film layer, and a second organic film layer on a substrate layer, a width of the metal film layer is greater than a width of the first organic film layer in a peripheral region of the OLED display panel, to form an inverted trapezoid-shaped bottom-cut structure. An included angle between an edge of the first organic film layer and the metal film layer is relatively large, and if an inorganic film layer is further formed subsequently, the inorganic film layer may have a relatively small thickness at this position, which makes it easier for a crack to occur and a fracture to appear, as such, when cutting is performed using a laser, splitting of the inorganic film layer will be terminated at this position.

Abstract: The present disclosure provides a method for manufacturing an OLED display substrate, including a step of forming a pattern of a pixel definition layer on a substrate through a patterning process. A bottom wall of the pixel definition layer is formed on the substrate, a top wall of the pixel definition layer is arranged parallel to the bottom wall, and a side wall of the pixel definition layer is angled relative to the top wall at an acute angle.