Patents by Inventor Shizue Ogawa

Shizue Ogawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8518182
    Abstract: A substrate processing apparatus comprising: a processing chamber which is to accommodate at least one substrate; a gas supply system which is to supply processing gas into the processing chamber; an exhaust system which is to exhaust atmosphere in the processing chamber; and at least one pair of electrodes which are to bring the processing gas into an active state and which are accommodated in protection tubes such that the electrodes can be inserted into and pulled out from the protection tubes, wherein the electrodes are accommodated in the protection tube in a state where at least a portion of the electrodes is bent, and the electrodes are formed of flexible members, is disclosed.
    Type: Grant
    Filed: May 6, 2011
    Date of Patent: August 27, 2013
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Shizue Ogawa, Kazuyuki Toyoda, Motonari Takebayashi, Tadashi Kontani, Nobuo Ishimaru
  • Publication number: 20110209664
    Abstract: A substrate processing apparatus comprising: a processing chamber which is to accommodate at least one substrate; a gas supply system which is to supply processing gas into the processing chamber; an exhaust system which is to exhaust atmosphere in the processing chamber; and at least one pair of electrodes which are to bring the processing gas into an active state and which are accommodated in protection tubes such that the electrodes can be inserted into and pulled out from the protection tubes, wherein the electrodes are accommodated in the protection tube in a state where at least a portion of the electrodes is bent, and the electrodes are formed of flexible members, is disclosed.
    Type: Application
    Filed: May 6, 2011
    Publication date: September 1, 2011
    Inventors: Shizue Ogawa, Kazuyuki Toyoda, Motonari Takebayashi, Tadashi Kontani, Nobuo Ishimaru
  • Patent number: 7958842
    Abstract: A substrate processing apparatus comprising: a processing chamber which is to accommodate at least one substrate; a gas supply system which is to supply processing gas into the processing chamber; an exhaust system which is to exhaust atmosphere in the processing chamber; and at least one pair of electrodes which are to bring the processing gas into an active state and which are accommodated in protection tubes such that the electrodes can be inserted into and pulled out from the protection tubes, wherein the electrodes are accommodated in the protection tube in a state where at least a portion of the electrodes is bent, and the electrodes are formed of flexible members, is disclosed.
    Type: Grant
    Filed: February 16, 2005
    Date of Patent: June 14, 2011
    Assignee: Hitachi Kokusai Electric Inc.
    Inventors: Shizue Ogawa, Kazuyuki Toyoda, Motonari Takebayashi, Tadashi Kontani, Nobuo Ishimaru
  • Publication number: 20080153308
    Abstract: A substrate processing apparatus comprising: a processing chamber which is to accommodate at least one substrate; a gas supply system which is to supply processing gas into the processing chamber; an exhaust system which is to exhaust atmosphere in the processing chamber; and at least one pair of electrodes which are to bring the processing gas into an active state and which are accommodated in protection tubes such that the electrodes can be inserted into and pulled out from the protection tubes, wherein the electrodes are accommodated in the protection tube in a state where at least a portion of the electrodes is bent, and the electrodes are formed of flexible members, is disclosed.
    Type: Application
    Filed: February 16, 2005
    Publication date: June 26, 2008
    Applicant: HITACHI KOKUSAI ELECTRIC INC.
    Inventors: Shizue Ogawa, Kazuyuki Toyoda, Motonari Takebayashi, Tadashi Kontani, Nobuo Ishimaru