Patents by Inventor Sho Abe
Sho Abe has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240081481Abstract: An upper includes an upper body covering the instep of a foot. An upper body includes a first layer, a second layer disposed with a gap from the first layer, and a third layer connecting the first layer and the second layer. A part of the upper body is disposed with a low stiffness region having lower stiffness than an adjacent region. At least a part of the low stiffness region has a point in which the third layer is not disposed. A plurality of holes is disposed in at least a part of a portion of the first layer and the second layer of the low stiffness region corresponding to the point in which the third layer is not disposed.Type: ApplicationFiled: January 21, 2021Publication date: March 14, 2024Inventors: Chihaya SUZUKI, Seiji YANO, Hiroki NAKAMURA, Satoru ABE, Sho TAKAMASU
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Patent number: 9841350Abstract: This invention is directed to a testing apparatus for testing a vehicle drive system by connecting load devices to the vehicle drive system, wherein the testing apparatus includes a handle operation amount input part for inputting a handle operation amount corresponding to a handle operation of a vehicle, an accelerator operation amount input part for inputting an accelerator operation amount corresponding to an accelerator operation of the vehicle, a brake operation amount input part for inputting a brake operation amount corresponding to a brake operation of the vehicle, and a control part for controlling the load devices based on the operation amounts simultaneously inputted by at least two of the handle operation amount input part, the accelerator operation amount input part and the brake operation amount input part.Type: GrantFiled: December 23, 2014Date of Patent: December 12, 2017Assignee: Horiba, Ltd.Inventors: Mineyuki Komada, Hiroyuki Ikeda, Sho Abe
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Publication number: 20150185110Abstract: This invention is directed to a testing apparatus for testing a vehicle drive system by connecting load devices to the vehicle drive system, wherein the testing apparatus includes a handle operation amount input part for inputting a handle operation amount corresponding to a handle operation of a vehicle, an accelerator operation amount input part for inputting an accelerator operation amount corresponding to an accelerator operation of the vehicle, a brake operation amount input part for inputting a brake operation amount corresponding to a brake operation of the vehicle, and a control part for controlling the load devices based on the operation amounts simultaneously inputted by at least two of the handle operation amount input part, the accelerator operation amount input part and the brake operation amount input part.Type: ApplicationFiled: December 23, 2014Publication date: July 2, 2015Inventors: Mineyuki KOMADA, Hiroyuki IKEDA, Sho ABE
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Patent number: 9005872Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a basic-compound component (C) and an acid-generator component (B) which generates acid upon exposure, the component (B) including a compound represented by formula (b1), and the component (C) including at least one compound represented by formulas (c1) to (c3) (wherein Z1 represents a ring skeleton-containing hydrocarbon group, Q1 represents a divalent linking group containing oxygen, Y1 represents a fluorinated alkylene group, M+ represents an organic cation, R1 represents a fluorinated alkyl group or a hydrocarbon group, L1+ and L2+ represents a sulfonium or an iodonium, Z2 represents a hydrogen atom or a hydrocarbon group, Y2 represents a single bond or a divalent linking group containing no fluorine, R2 represents an organic group, Y3 represents an alkylene group or an arylene group; and Rf represents a fluorine-containing hydrocarbon group).Type: GrantFiled: February 16, 2012Date of Patent: April 14, 2015Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Hiroaki Shimizu, Sho Abe, Hideto Nito
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Patent number: 8859187Abstract: A novel method of forming a resist pattern in which thickness loss from the resist pattern is reduced, and a negative resist composition that can be used in this method of forming a resist pattern. The method of forming a resist pattern includes: forming a first resist film by applying a first resist composition to a support, forming a first resist pattern by selectively exposing the first resist film through a first mask pattern and then developing the first resist film, forming a second resist film by applying a negative resist composition containing an ether-based organic solvent (S?) having no hydroxyl groups onto the support having the first resist pattern formed thereon, and forming a resist pattern by selectively exposing the second resist film through a second mask pattern and then developing the second resist film.Type: GrantFiled: October 19, 2007Date of Patent: October 14, 2014Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Ken Tanaka, Sho Abe, Shigeru Yokoi
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Patent number: 8632960Abstract: A method of forming a resist pattern, including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, conducting exposure of the resist film, and patterning the resist film by a negative tone development using a developing solution containing an organic solvent, wherein the base component (A) includes a resin component (A1) containing a structural unit (a0) derived from an acrylate ester containing an acid decomposable group which generates an alcoholic hydroxy group by the action of acid to thereby exhibit increased hydrophilicity.Type: GrantFiled: February 16, 2011Date of Patent: January 21, 2014Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Hirano, Takahiro Dazai, Daiju Shiono, Sho Abe
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Resist composition, method of forming resist pattern, compound and acid generator including the same
Patent number: 8541157Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety.Type: GrantFiled: September 25, 2009Date of Patent: September 24, 2013Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Akiya Kawaue, Yoshiyuki Utsumi, Sho Abe -
Patent number: 8404426Abstract: A negative resist composition including an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C), the alkali-soluble resin component (A) including a polymeric compound (F) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a cross-linking group-containing group.Type: GrantFiled: July 6, 2009Date of Patent: March 26, 2013Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Sho Abe, Daiju Shiono, Tomoyuki Hirano, Takahiro Dazai
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Publication number: 20120214101Abstract: A resist composition including a base component (A) which exhibits changed solubility in a developing solution under action of acid, a basic-compound component (C) and an acid-generator component (B) which generates acid upon exposure, the component (B) including a compound represented by formula (b1), and the component (C) including at least one compound represented by formulas (c1) to (c3) (wherein Z1 represents a ring skeleton-containing hydrocarbon group, Q1 represents a divalent linking group containing oxygen, Y1 represents a fluorinated alkylene group, M+ represents an organic cation, R1 represents a fluorinated alkyl group or a hydrocarbon group, L1+ and L2+ represents a sulfonium or an iodonium, Z2 represents a hydrogen atom or a hydrocarbon group, Y2 represents a single bond or a divalent linking group containing no fluorine, R2 represents an organic group, Y3 represents an alkylene group or an arylene group; and Rf represents a fluorine-containing hydrocarbon group).Type: ApplicationFiled: February 16, 2012Publication date: August 23, 2012Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Hiroaki Shimizu, Sho Abe, Hideto Nito
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Patent number: 8236483Abstract: A method of forming a resist pattern including: forming a resist film on a substrate using a chemically amplified negative resist composition; forming a latent image of a first line and space pattern by subjecting the resist film to first exposure through a photomask; forming a latent image of a second line and space pattern so as to intersect with the latent image of the first line and space pattern by subjecting the resist film to second exposure through a photomask; and subjecting the resist film to developing to form a hole pattern in the resist film.Type: GrantFiled: July 31, 2009Date of Patent: August 7, 2012Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Ando, Sho Abe, Ryoji Watanabe, Komei Hirahara
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Publication number: 20110262864Abstract: A method of forming a resist pattern, including: forming a resist film on a substrate using a resist composition containing a base component (A) which exhibits decreased solubility in an organic solvent under action of an acid and an acid-generator component (B) which generates an acid upon exposure, conducting exposure of the resist film, and patterning the resist film by a negative tone development using a developing solution containing an organic solvent, wherein the base component (A) includes a resin component (A1) containing a structural unit (a0) derived from an acrylate ester containing an acid decomposable group which generates an alcoholic hydroxy group by the action of acid to thereby exhibit increased hydrophilicity.Type: ApplicationFiled: February 16, 2011Publication date: October 27, 2011Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Tomoyuki HIRANO, Takahiro DAZAI, Daiju SHIONO, Sho ABE
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Patent number: 8039199Abstract: A negative resist composition for immersion exposure including a fluorine-containing polymeric compound (F) containing a structural unit having a base dissociable group, an alkali-soluble resin component (A) excluding the fluorine-containing polymeric compound (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C); and a method of forming a resist pattern including applying the negative resist composition for immersion exposure to a substrate to form a resist film, subjecting the resist film to immersion exposure, and subjecting the resist film to alkali developing to form a resist pattern.Type: GrantFiled: April 30, 2009Date of Patent: October 18, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventor: Sho Abe
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Patent number: 8034536Abstract: A novel resist composition and method of forming a resist pattern that can be used in lithography applications. The resist composition includes a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a polymer compound (A1) having a structural unit (a0) represented by general formula (a0-1) shown below, wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms, R2 and R3 each independently represents a hydrogen atom or an alkyl group that may include an oxygen atom at an arbitrary position, or R2 and R3 are bonded together to form an alkylene group, and W represents a cyclic alkylene group that may include an oxygen atom at an arbitrary position.Type: GrantFiled: May 26, 2009Date of Patent: October 11, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Jun Iwashita, Shogo Matsumaru, Sho Abe
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Patent number: 8021824Abstract: A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R2 and R3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R2 and R3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R4 and R5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.Type: GrantFiled: February 6, 2008Date of Patent: September 20, 2011Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Jun Iwashita, Sho Abe, Makiko Irie, Takeshi Iwai
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Publication number: 20100081080Abstract: A polymer compound including a structural unit (a0) represented by general formula (a0-1) shown below: wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms; R2 and R3 each independently represents a hydrogen atom, an alkyl group or an alkoxy group, or R2 and R3 may be bonded together to form an alkylene group that may include an oxygen atom or sulfur atom at an arbitrary position, —O— or —S—; R4 and R5 each independently represents a hydrogen atom, an alkyl group that may include an oxygen atom at an arbitrary position, a cycloalkyl group that may include an oxygen atom at an arbitrary position or an alkoxycarbonyl group.Type: ApplicationFiled: February 6, 2008Publication date: April 1, 2010Inventors: Jun Iwashita, Sho Abe, Makiko Irie, Takeshi Iwai
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RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, COMPOUND AND ACID GENERATOR INCLUDING THE SAME
Publication number: 20100081088Abstract: A resist composition including a base component (A) which exhibits changed solubility in an alkali developing solution under the action of acid and an acid-generator component (B) which generates acid upon exposure, wherein the acid-generator component (B) includes an acid generator (B1) composed of a compound having a base dissociable group within a cation moiety.Type: ApplicationFiled: September 25, 2009Publication date: April 1, 2010Applicant: TOKYO OHKA KOGYO CO., LTD.Inventors: Akiya KAWAUE, Yoshiyuki Utsumi, Sho Abe -
Publication number: 20100035178Abstract: A negative resist composition including an alkali-soluble resin component (A), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C), the alkali-soluble resin component (A) including a polymeric compound (F) having a structural unit (f1) containing a base dissociable group and a structural unit (f2) containing a cross-linking group-containing group.Type: ApplicationFiled: July 6, 2009Publication date: February 11, 2010Inventors: Sho Abe, Daiju Shiono, Tomoyuki Hirano, Takahiro Dazai
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Publication number: 20100035192Abstract: A method of forming a resist pattern including: forming a resist film on a substrate using a chemically amplified negative resist composition; forming a latent image of a first line and space pattern by subjecting the resist film to first exposure through a photomask; forming a latent image of a second line and space pattern so as to intersect with the latent image of the first line and space pattern by subjecting the resist film to second exposure through a photomask; and subjecting the resist film to developing to form a hole pattern in the resist film.Type: ApplicationFiled: July 31, 2009Publication date: February 11, 2010Applicant: Tokyo Ohka Kogyo Co., Ltd.Inventors: Tomoyuki Ando, Sho Abe, Ryoji Watanabe, Komei Hirahara
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Publication number: 20090297980Abstract: A novel resist composition and method of forming a resist pattern that can be used in lithography applications. The resist composition includes a base component (A) that exhibits changed solubility in an alkali developing solution under action of acid, and an acid generator component (B) that generates acid upon exposure, wherein the base component (A) contains a polymer compound (A1) having a structural unit (a0) represented by general formula (a0-1) shown below, wherein R1 represents a hydrogen atom, an alkyl group of 1 to 5 carbon atoms or a fluorinated alkyl group of 1 to 5 carbon atoms, R2 and R3 each independently represents a hydrogen atom or an alkyl group that may include an oxygen atom at an arbitrary position, or R2 and R3 are bonded together to form an alkylene group, and W represents a cyclic alkylene group that may include an oxygen atom at an arbitrary position.Type: ApplicationFiled: May 26, 2009Publication date: December 3, 2009Inventors: Jun Iwashita, Shogo Matsumaru, Sho Abe
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Patent number: 7598017Abstract: A negative resist composition including: a fluorine-containing resin component (F) containing a structural unit (f1) represented by a general formula (f1-0) shown below, and a structural unit (f2) having an alkali-soluble group, an alkali-soluble resin component (A) excluding the fluorine-containing resin component (F), an acid generator component (B) that generates acid upon exposure, and a cross-linking component (C). [wherein, R7 represents a fluorinated alkyl group, and a represents either 0 or 1.Type: GrantFiled: October 24, 2008Date of Patent: October 6, 2009Assignee: Tokyo Ohka Kogyo Co., Ltd.Inventors: Jun Iwashita, Kazuhito Sasaki, Sho Abe