Patents by Inventor Shogo Hiramatsu
Shogo Hiramatsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11453785Abstract: The present invention provides a method that enables production of a surface-treated colored inorganic particle with which the desired color tone can be consistently reproduced as intended with no variation occurring in the color tone of the compositions produced with the particle, within each production and over multiple production runs. The invention relates to a method for producing a surface-treated colored inorganic particle, comprising spray drying a mixture of a dispersion [I] and a solution [II], wherein the dispersion [I] is a dispersion of inorganic particles having an average particle diameter of 0.005 to 5 ?m dispersed in a solvent with a pigment, and the solution [II] is a solution of a surface treatment agent hydrolyzed in the presence of a hydrolysis aid.Type: GrantFiled: December 18, 2017Date of Patent: September 27, 2022Assignee: KURARAY NORITAKE DENTAL INC.Inventors: Takehiro Kameya, Shogo Hiramatsu, Masashi Inoue
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Publication number: 20220071746Abstract: A dental mill blank can be fabricated, through a milling process, into a highly aesthetic dental prosthesis having an opalescent quality characteristic of natural teeth and also having a sufficient chroma level. Such a dental mill blank may include: 40 mass % or more of an inorganic filler, the dental mill blank satisfying conditions (1) and (2): (1) a specimen with a thickness of 1.20±0.01 mm has a chromaticity satisfying ?0.5?a*black?2.5 and 12.0?b*black?25.0 in the L*a*b* color system when measured against a black background; and (2) the specimen with a thickness of 1.20±0.01 mm has an opalescence value of 17.5 or more.Type: ApplicationFiled: December 27, 2019Publication date: March 10, 2022Applicant: KURARAY NORITAKE DENTAL INC.Inventor: Shogo HIRAMATSU
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Patent number: 10626494Abstract: In one embodiment of the invention, a protective film formation chamber for forming a carbon protective film on a magnetic film includes: a gas introduction part which introduces a source gas to a vacuum vessel; a discharge electrode having a discharge surface at a position facing a substrate conveyed to a predetermined position in the vacuum vessel; a plasma formation part which applies voltage between the discharge surface and the substrate conveyed to the predetermined position; a permanent magnet being provided on a back side of the discharge surface and having a first magnet and a second magnet provided such that their magnetic poles facing the discharge surface are opposite to each other; and a no-erosion-portion mask being provided in parallel to the discharge surface and covering an area of the discharge surface surrounding a portion facing the permanent magnet.Type: GrantFiled: December 16, 2013Date of Patent: April 21, 2020Assignee: CANON ANELVA CORPORATIONInventors: Hiroshi Yakushiji, Masahiro Shibamoto, Kazuto Yamanaka, Shogo Hiramatsu, Susumu Karino
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Publication number: 20190315970Abstract: The present invention provides a method that enables production of a surface-treated colored inorganic particle with which the desired color tone can be consistently reproduced as intended with no variation occurring in the color tone of the compositions produced with the particle, within each production and over multiple production runs. The invention relates to a method for producing a surface-treated colored inorganic particle, comprising spray drying a mixture of a dispersion [I] and a solution [II], wherein the dispersion [I] is a dispersion of inorganic particles having an average particle diameter of 0.005 to 5 ?m dispersed in a solvent with a pigment, and the solution [II] is a solution of a surface treatment agent hydrolyzed in the presence of a hydrolysis aid.Type: ApplicationFiled: December 18, 2017Publication date: October 17, 2019Applicant: KURARAY NORITAKE DENTAL INC.Inventors: Takehiro KAMEYA, Shogo HIRAMATSU, Masashi INOUE
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Publication number: 20140230728Abstract: A vacuum processing apparatus includes a process chamber, a load lock chamber connected to the process chamber, and a transfer device configured to transfer a substrate from the load lock chamber to the process chamber. The transfer device is configured to move the substrate by gravity. The transfer device includes a guide configured to form a transfer path when the substrate moves by the gravity, and a stopper configured to limit movement of the substrate by the gravity when holding the substrate, and cancel the limitation when moving the substrate.Type: ApplicationFiled: April 28, 2014Publication date: August 21, 2014Applicant: CANON ANELVA CORPORATIONInventors: Yuji Kajihara, Shogo Hiramatsu, Kazuto Yamanaka, Takashi Ueda, Kazutoshi Yoshibayashi, Kenji Sato, Hajime Sahase, Hirohisa Hirayanagi, Masahiro Atsumi
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Publication number: 20140174355Abstract: In one embodiment of the invention, a protective film formation chamber for forming a carbon protective film on a magnetic film includes: a gas introduction part which introduces a source gas to a vacuum vessel; a discharge electrode having a discharge surface at a position facing a substrate conveyed to a predetermined position in the vacuum vessel; a plasma formation part which applies voltage between the discharge surface and the substrate conveyed to the predetermined position; a permanent magnet being provided on a back side of the discharge surface and having a first magnet and a second magnet provided such that their magnetic poles facing the discharge surface are opposite to each other; and a no-erosion-portion mask being provided in parallel to the discharge surface and covering an area of the discharge surface surrounding a portion facing the permanent magnet.Type: ApplicationFiled: December 16, 2013Publication date: June 26, 2014Applicant: CANON ANELVA CORPORATIONInventors: Hiroshi YAKUSHIJI, Masahiro SHIBAMOTO, Kazuto YAMANAKA, Shogo HIRAMATSU, Susumu KARINO
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Patent number: 8658048Abstract: The present invention aims to prevent decreases in etching rate due to adhesion of an etched film to a substrate holder. A method of manufacturing a magnetic recording medium includes: forming a first film on a substrate holder not yet having a substrate mounted thereon; mounting a substrate on the substrate holder having the first film formed thereon, the substrate having a resist layer formed on a multilayer film including a magnetic film layer, the resist layer having a predetermined pattern; and processing the magnetic film layer into a shape based on the predetermined pattern by performing dry etching on the substrate. The first film is a film that is not etched as easily as the films in the multilayer film to be removed by the dry etching.Type: GrantFiled: October 31, 2011Date of Patent: February 25, 2014Assignee: Canon Anelva CorporationInventors: Kazuto Yamanaka, Shogo Hiramatsu
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Publication number: 20130269607Abstract: The present invention provides a plasma CVD apparatus capable of performing film formation while controlling the temperature of a substrate as well as film properties. A process chamber according to one embodiment of the present invention includes a holder configured to hold a substrate, magnetic-field producing means configured to produce magnetic fields inside the process chamber, shields configured to suppress film deposition on the magnetic-field producing means, heat dissipating sheets configured to suppress heating of the magnetic-field producing means, and moving means configured to move the magnetic-field producing means. The magnetic-field producing means is characterized in being moved in such a direction as to increase or decrease the volume of a space between the magnetic-field producing means and the holder.Type: ApplicationFiled: June 6, 2013Publication date: October 17, 2013Inventors: Ge XU, Kazuto YAMANAKA, Tsutomu HIROISHI, Shogo HIRAMATSU
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Publication number: 20130273263Abstract: The objective of the present invention is to provide a plasma CVD apparatus capable of improving the speed of carbon film deposition onto a substrate to be processed, decreasing the cleaning frequency by reducing deposition on members other than the substrate to be processed, and being manufactured inexpensively. One embodiment of the present invention is a CVD apparatus including a vacuum vessel, magnetic-field producing means for producing a magnetic field inside the vacuum vessel, plasma producing means for producing a plasma inside the vacuum vessel, and a substrate holder configured to hold a substrate inside the vacuum vessel, and the plasma producing means has an electrode provided inside the substrate holder and a power source configured to apply voltage to the electrode.Type: ApplicationFiled: June 11, 2013Publication date: October 17, 2013Inventors: Ge XU, Kazuto YAMANAKA, Tsutomu HIROISHI, Shogo HIRAMATSU
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Publication number: 20130264194Abstract: The present invention provides a method of manufacturing a carbon film and a plasma CVD method capable of performing film formation while controlling the temperature of a substrate as well as film properties. A process chamber according to one embodiment of the present invention includes a holder configured to hold a substrate, magnetic-field producing means configured to produce magnetic fields inside the process chamber, shields configured to suppress film deposition on the magnetic-field producing means, heat dissipating sheets configured to suppress heating of the magnetic-field producing means, and moving means configured to move the magnetic-field producing means. The magnetic-field producing means is characterized in being moved in such a direction as to increase or decrease the volume of a space between the magnetic-field producing means and the holder.Type: ApplicationFiled: June 6, 2013Publication date: October 10, 2013Inventors: Ge XU, Kazuto YAMANAKA, Tsutomu HIROISHI, Shogo HIRAMATSU
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Publication number: 20120103934Abstract: The present invention aims to prevent decreases in etching rate due to adhesion of an etched film to a substrate holder. A method of manufacturing a magnetic recording medium includes: forming a first film on a substrate holder not yet having a substrate mounted thereon; mounting a substrate on the substrate holder having the first film formed thereon, the substrate having a resist layer formed on a multilayer film including a magnetic film layer, the resist layer having a predetermined pattern; and processing the magnetic film layer into a shape based on the predetermined pattern by performing dry etching on the substrate. The first film is a film that is not etched as easily as the films in the multilayer film to be removed by the dry etching.Type: ApplicationFiled: October 31, 2011Publication date: May 3, 2012Applicant: CANON ANELVA CORPORATIONInventors: Kazuto Yamanaka, Shogo Hiramatsu