Patents by Inventor Shogo Tsubota
Shogo Tsubota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20250002756Abstract: An object of the present invention is to provide a polishing composition and a polishing method, with which SiN can be selectively polished at a high polishing removal rate as compared with SiO2. The polishing composition contains colloidal silica in which an organic acid is fixed on a surface and a pH adjusting agent, in which an average aspect ratio of the colloidal silica in which the organic acid is fixed on the surface is 1.38 or more.Type: ApplicationFiled: June 27, 2024Publication date: January 2, 2025Applicant: FUJIMI INCORPORATEDInventors: Shota Suzuki, Tatsuhiko Hirano, Shogo Tsubota, Masaaki Ito, Yusuke Kawasaki, Keiji Ashitaka
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Publication number: 20240262698Abstract: A silica sol which does not gelate, has a high purity, and contains a high concentration of silica particles is provided. A silica sol containing silica particles and water, wherein a product of an average primary particle size of the silica particles and an average circularity of the silica particles is 15.0 or more and 31.2 or less, a concentration of the silica particles is 20 mass % or more, a total organic carbon amount per silica particle is less than 10 mass ppm, when the concentration of the silica particles is 20 mass %, a viscosity at 25° C. is 300 mPa·s or less, and a concentration of a metal impurity is less than 1 mass ppm.Type: ApplicationFiled: February 1, 2024Publication date: August 8, 2024Applicant: FUJIMI INCORPORATEDInventors: Shogo TSUBOTA, Masaaki ITO, Keiji ASHITAKA, Yusuke KAWASAKI, Kazuaki IWASAKI
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Patent number: 12012337Abstract: Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up the porous metal oxide; the pore forming agent is an inorganic compound that generates a gas by decomposing at a temperature equal to or lower than a temperature at which the metal oxide precursor is sintered; and the slurry is prepared using 50 parts by weight or more of the pore forming agent with respect to 100 parts by weight of the metal source.Type: GrantFiled: January 9, 2023Date of Patent: June 18, 2024Assignee: FUJIMI INCORPORATEDInventors: Shogo Tsubota, Robert Hepburn
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Publication number: 20230321628Abstract: Provided is an absorption method of an element belonging to periods 4 to 6 and groups 3 to 15 of the periodic table. The method includes: preparing mesoporous alumina that satisfies at least one of the following items: (1) a surface hydroxyl content is 3.5 mmol/g or more; (2) a low-temperature CO2 desorption amount in CO2 thermal desorption amount spectrometry is 5 µmol/g or more; and (3) a low-temperature NH3 desorption amount in NH3 thermal desorption amount spectrometry is 25 µmol/g or more; and bringing a liquid containing an absorption target element in contact with the mesoporous alumina to absorb the absorption target element in the mesoporous alumina. The absorption target element is at least one type selected from the group consisting of an element belonging to periods 4 to 6 and groups 3 to 15 of the periodic table.Type: ApplicationFiled: August 5, 2021Publication date: October 12, 2023Applicant: FUJIMI INCORPORATEDInventors: Robert HEPBURN, Shogo TSUBOTA
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Publication number: 20230313011Abstract: The present invention provides a means capable of further improving stability and washability under acidic conditions. The present invention is sulfonic acid-modified colloidal silica having an amount of sulfonic acid groups per 1 g of particles of 1.5 ?mol/g or more and 13.0 ?mol/g or less.Type: ApplicationFiled: March 17, 2023Publication date: October 5, 2023Applicant: FUJIMI INCORPORATEDInventors: Shogo TSUBOTA, Keiji ASHITAKA, Masaaki ITO, Tatsuhiko HIRANO, Shota SUZUKI
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Patent number: 11767224Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.Type: GrantFiled: September 22, 2022Date of Patent: September 26, 2023Assignee: FUJIMI INCORPORATEDInventors: Yusuke Kawasaki, Shogo Tsubota, Masaaki Ito, Jun Shinoda, Keiji Ashitaka
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Publication number: 20230159347Abstract: Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up the porous metal oxide; the pore forming agent is an inorganic compound that generates a gas by decomposing at a temperature equal to or lower than a temperature at which the metal oxide precursor is sintered; and the slurry is prepared using 50 parts by weight or more of the pore forming agent with respect to 100 parts by weight of the metal source.Type: ApplicationFiled: January 9, 2023Publication date: May 25, 2023Applicant: FUJIMI INCORPORATEDInventors: Shogo TSUBOTA, Robert HEPBURN
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Publication number: 20230056027Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.Type: ApplicationFiled: September 22, 2022Publication date: February 23, 2023Applicant: FUJIMI INCORPORATEDInventors: Yusuke KAWASAKI, Shogo TSUBOTA, Masaaki ITO, Jun SHINODA, Keiji ASHITAKA
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Publication number: 20230016801Abstract: The surface-modified colloidal silica according to an aspect of the present invention contains colloidal silica, and a surface-modifying group for modifying a surface of the colloidal silica, which has a polyoxyalkylene chain having a weight average molecular weight of 20,000 or more.Type: ApplicationFiled: June 23, 2022Publication date: January 19, 2023Applicant: Fujimi IncorporatedInventors: Shogo Tsubota, Masaaki Ito, Keiji Ashitaka, Jun Shinoda, Yusuke Kawasaki
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Patent number: 11554967Abstract: Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up the porous metal oxide; the pore forming agent is an inorganic compound that generates a gas by decomposing at a temperature equal to or lower than a temperature at which the metal oxide precursor is sintered; and the slurry is prepared using 50 parts by weight or more of the pore forming agent with respect to 100 parts by weight of the metal source.Type: GrantFiled: January 19, 2017Date of Patent: January 17, 2023Assignee: FUJIMI INCORPORATEDInventors: Shogo Tsubota, Robert Hepburn
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Patent number: 11530335Abstract: To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica. Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.Type: GrantFiled: June 21, 2019Date of Patent: December 20, 2022Assignee: FUJIMI INCORPORATEDInventors: Keiji Ashitaka, Shogo Tsubota
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Patent number: 11518682Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.Type: GrantFiled: March 13, 2020Date of Patent: December 6, 2022Assignee: FUJIMI INCORPORATEDInventors: Yusuke Kawasaki, Shogo Tsubota, Masaaki Ito, Jun Shinoda, Keiji Ashitaka
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Patent number: 11499070Abstract: To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica. Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.Type: GrantFiled: January 19, 2016Date of Patent: November 15, 2022Assignee: FUJIMI INCORPORATEDInventors: Keiji Ashitaka, Shogo Tsubota
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Publication number: 20210139342Abstract: Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up the porous metal oxide; the pore forming agent is an inorganic compound that generates a gas by decomposing at a temperature equal to or lower than a temperature at which the metal oxide precursor is sintered; and the slurry is prepared using 50 parts by weight or more of the pore forming agent with respect to 100 parts by weight of the metal source.Type: ApplicationFiled: January 19, 2017Publication date: May 13, 2021Applicant: FUJIMI INCORPORATEDInventors: Shogo TSUBOTA, Robert HEPBURN
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Publication number: 20210087067Abstract: There is provided a method for producing a silica sol including: a first step of adding an organic acid to at least one of liquid (A) containing an alkaline catalyst, water, and a first organic solvent and liquid (C) containing water; and a second step of mixing the liquid (A) with liquid (B) containing an alkoxysilane or its condensate and a second organic solvent, and the liquid (C) to make a reaction liquid after the first step.Type: ApplicationFiled: September 16, 2020Publication date: March 25, 2021Applicant: FUJIMI INCORPORATEDInventors: Keiji ASHITAKA, Yusuke KAWASAKI, Masaaki ITO, Jun SHINODA, Shogo TSUBOTA
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Patent number: 10913857Abstract: According to the present invention, there is provided a means for producing an aluminum hydroxide-coated SiC particle powder having a coating layer containing aluminum hydroxide on a surface of SiC particles. The present invention relates to a method for producing an aluminum hydroxide-coated SiC particle powder, which includes a coating step of maintaining a pH of a dispersion containing SiC particles, sodium aluminate, and water in a range of from 9 to 12 and forming coated particles having a coating layer containing aluminum hydroxide on a surface of the SiC particles.Type: GrantFiled: September 28, 2018Date of Patent: February 9, 2021Assignee: FUJIMI INCORPORATEDInventors: Shogo Tsubota, Souma Taguchi, Keiji Ashitaka, Naoya Miwa
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Publication number: 20200308009Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.Type: ApplicationFiled: March 13, 2020Publication date: October 1, 2020Applicant: FUJIMI INCORPORATEDInventors: Yusuke KAWASAKI, Shogo TSUBOTA, Masaaki ITO, Jun SHINODA, Keiji ASHITAKA
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Publication number: 20200216677Abstract: According to the present invention, there is provided a means for producing an aluminum hydroxide-coated SiC particle powder having a coating layer containing aluminum hydroxide on a surface of SiC particles. The present invention relates to a method for producing an aluminum hydroxide-coated SiC particle powder, which includes a coating step of maintaining a pH of a dispersion containing SiC particles, sodium aluminate, and water in a range of from 9 to 12 and forming coated particles having a coating layer containing aluminum hydroxide on a surface of the SiC particles.Type: ApplicationFiled: September 28, 2018Publication date: July 9, 2020Applicant: FUJIMI INCORPORATEDInventors: Shogo TSUBOTA, Souma TAGUCHI, Keiji ASHITAKA, Naoya MIWA
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Patent number: 10570322Abstract: Disclosed herein is a polishing composition comprising a pH of 6 or less, sulfonic acid-modified colloidal silica obtained by immobilizing sulfonic acid on surfaces of silica particles, and water, wherein the sulfonic acid-modified colloidal silica is derived from sulfonic acid-modified aqueous anionic silica sol produced by a production method comprising: a first reaction step of obtaining a reactant by heating raw colloidal silica having a number distribution ratio of 10% or less of microparticles having a particle diameter of 40% or less relative to a volume average particle diameter based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope in the presence of a silane coupling agent having a functional group chemically convertible to a sulfonic acid group; and a second reaction step of converting the functional group to a sulfonic acid group by treating the reactant.Type: GrantFiled: January 10, 2019Date of Patent: February 25, 2020Assignee: FUJIMI INCORPORATEDInventors: Keiji Ashitaka, Shogo Tsubota
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Publication number: 20190309190Abstract: To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica. Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.Type: ApplicationFiled: June 21, 2019Publication date: October 10, 2019Applicant: FUJIMI INCORPORATEDInventors: Keiji ASHITAKA, Shogo TSUBOTA