Patents by Inventor Shogo Tsubota

Shogo Tsubota has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230321628
    Abstract: Provided is an absorption method of an element belonging to periods 4 to 6 and groups 3 to 15 of the periodic table. The method includes: preparing mesoporous alumina that satisfies at least one of the following items: (1) a surface hydroxyl content is 3.5 mmol/g or more; (2) a low-temperature CO2 desorption amount in CO2 thermal desorption amount spectrometry is 5 ┬Ámol/g or more; and (3) a low-temperature NH3 desorption amount in NH3 thermal desorption amount spectrometry is 25 ┬Ámol/g or more; and bringing a liquid containing an absorption target element in contact with the mesoporous alumina to absorb the absorption target element in the mesoporous alumina. The absorption target element is at least one type selected from the group consisting of an element belonging to periods 4 to 6 and groups 3 to 15 of the periodic table.
    Type: Application
    Filed: August 5, 2021
    Publication date: October 12, 2023
    Applicant: FUJIMI INCORPORATED
    Inventors: Robert HEPBURN, Shogo TSUBOTA
  • Publication number: 20230313011
    Abstract: The present invention provides a means capable of further improving stability and washability under acidic conditions. The present invention is sulfonic acid-modified colloidal silica having an amount of sulfonic acid groups per 1 g of particles of 1.5 ?mol/g or more and 13.0 ?mol/g or less.
    Type: Application
    Filed: March 17, 2023
    Publication date: October 5, 2023
    Applicant: FUJIMI INCORPORATED
    Inventors: Shogo TSUBOTA, Keiji ASHITAKA, Masaaki ITO, Tatsuhiko HIRANO, Shota SUZUKI
  • Patent number: 11767224
    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.
    Type: Grant
    Filed: September 22, 2022
    Date of Patent: September 26, 2023
    Assignee: FUJIMI INCORPORATED
    Inventors: Yusuke Kawasaki, Shogo Tsubota, Masaaki Ito, Jun Shinoda, Keiji Ashitaka
  • Publication number: 20230159347
    Abstract: Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up the porous metal oxide; the pore forming agent is an inorganic compound that generates a gas by decomposing at a temperature equal to or lower than a temperature at which the metal oxide precursor is sintered; and the slurry is prepared using 50 parts by weight or more of the pore forming agent with respect to 100 parts by weight of the metal source.
    Type: Application
    Filed: January 9, 2023
    Publication date: May 25, 2023
    Applicant: FUJIMI INCORPORATED
    Inventors: Shogo TSUBOTA, Robert HEPBURN
  • Publication number: 20230056027
    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.
    Type: Application
    Filed: September 22, 2022
    Publication date: February 23, 2023
    Applicant: FUJIMI INCORPORATED
    Inventors: Yusuke KAWASAKI, Shogo TSUBOTA, Masaaki ITO, Jun SHINODA, Keiji ASHITAKA
  • Publication number: 20230016801
    Abstract: The surface-modified colloidal silica according to an aspect of the present invention contains colloidal silica, and a surface-modifying group for modifying a surface of the colloidal silica, which has a polyoxyalkylene chain having a weight average molecular weight of 20,000 or more.
    Type: Application
    Filed: June 23, 2022
    Publication date: January 19, 2023
    Applicant: Fujimi Incorporated
    Inventors: Shogo Tsubota, Masaaki Ito, Keiji Ashitaka, Jun Shinoda, Yusuke Kawasaki
  • Patent number: 11554967
    Abstract: Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up the porous metal oxide; the pore forming agent is an inorganic compound that generates a gas by decomposing at a temperature equal to or lower than a temperature at which the metal oxide precursor is sintered; and the slurry is prepared using 50 parts by weight or more of the pore forming agent with respect to 100 parts by weight of the metal source.
    Type: Grant
    Filed: January 19, 2017
    Date of Patent: January 17, 2023
    Assignee: FUJIMI INCORPORATED
    Inventors: Shogo Tsubota, Robert Hepburn
  • Patent number: 11530335
    Abstract: To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica. Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.
    Type: Grant
    Filed: June 21, 2019
    Date of Patent: December 20, 2022
    Assignee: FUJIMI INCORPORATED
    Inventors: Keiji Ashitaka, Shogo Tsubota
  • Patent number: 11518682
    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.
    Type: Grant
    Filed: March 13, 2020
    Date of Patent: December 6, 2022
    Assignee: FUJIMI INCORPORATED
    Inventors: Yusuke Kawasaki, Shogo Tsubota, Masaaki Ito, Jun Shinoda, Keiji Ashitaka
  • Patent number: 11499070
    Abstract: To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica. Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.
    Type: Grant
    Filed: January 19, 2016
    Date of Patent: November 15, 2022
    Assignee: FUJIMI INCORPORATED
    Inventors: Keiji Ashitaka, Shogo Tsubota
  • Publication number: 20210139342
    Abstract: Provided is a method for producing a porous metal oxide. The method includes: preparing a slurry by mixing a metal source, a pore forming agent and an aqueous solvent; drying the slurry to obtain a metal oxide precursor; and sintering the metal oxide precursor to generate a porous metal oxide. The metal source is an organometallic compound or hydrolyzate thereof containing a metal that makes up the porous metal oxide; the pore forming agent is an inorganic compound that generates a gas by decomposing at a temperature equal to or lower than a temperature at which the metal oxide precursor is sintered; and the slurry is prepared using 50 parts by weight or more of the pore forming agent with respect to 100 parts by weight of the metal source.
    Type: Application
    Filed: January 19, 2017
    Publication date: May 13, 2021
    Applicant: FUJIMI INCORPORATED
    Inventors: Shogo TSUBOTA, Robert HEPBURN
  • Publication number: 20210087067
    Abstract: There is provided a method for producing a silica sol including: a first step of adding an organic acid to at least one of liquid (A) containing an alkaline catalyst, water, and a first organic solvent and liquid (C) containing water; and a second step of mixing the liquid (A) with liquid (B) containing an alkoxysilane or its condensate and a second organic solvent, and the liquid (C) to make a reaction liquid after the first step.
    Type: Application
    Filed: September 16, 2020
    Publication date: March 25, 2021
    Applicant: FUJIMI INCORPORATED
    Inventors: Keiji ASHITAKA, Yusuke KAWASAKI, Masaaki ITO, Jun SHINODA, Shogo TSUBOTA
  • Patent number: 10913857
    Abstract: According to the present invention, there is provided a means for producing an aluminum hydroxide-coated SiC particle powder having a coating layer containing aluminum hydroxide on a surface of SiC particles. The present invention relates to a method for producing an aluminum hydroxide-coated SiC particle powder, which includes a coating step of maintaining a pH of a dispersion containing SiC particles, sodium aluminate, and water in a range of from 9 to 12 and forming coated particles having a coating layer containing aluminum hydroxide on a surface of the SiC particles.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: February 9, 2021
    Assignee: FUJIMI INCORPORATED
    Inventors: Shogo Tsubota, Souma Taguchi, Keiji Ashitaka, Naoya Miwa
  • Publication number: 20200308009
    Abstract: The present invention provides a means capable of suppressing the formation of fine particles in a method for producing a silica sol.
    Type: Application
    Filed: March 13, 2020
    Publication date: October 1, 2020
    Applicant: FUJIMI INCORPORATED
    Inventors: Yusuke KAWASAKI, Shogo TSUBOTA, Masaaki ITO, Jun SHINODA, Keiji ASHITAKA
  • Publication number: 20200216677
    Abstract: According to the present invention, there is provided a means for producing an aluminum hydroxide-coated SiC particle powder having a coating layer containing aluminum hydroxide on a surface of SiC particles. The present invention relates to a method for producing an aluminum hydroxide-coated SiC particle powder, which includes a coating step of maintaining a pH of a dispersion containing SiC particles, sodium aluminate, and water in a range of from 9 to 12 and forming coated particles having a coating layer containing aluminum hydroxide on a surface of the SiC particles.
    Type: Application
    Filed: September 28, 2018
    Publication date: July 9, 2020
    Applicant: FUJIMI INCORPORATED
    Inventors: Shogo TSUBOTA, Souma TAGUCHI, Keiji ASHITAKA, Naoya MIWA
  • Patent number: 10570322
    Abstract: Disclosed herein is a polishing composition comprising a pH of 6 or less, sulfonic acid-modified colloidal silica obtained by immobilizing sulfonic acid on surfaces of silica particles, and water, wherein the sulfonic acid-modified colloidal silica is derived from sulfonic acid-modified aqueous anionic silica sol produced by a production method comprising: a first reaction step of obtaining a reactant by heating raw colloidal silica having a number distribution ratio of 10% or less of microparticles having a particle diameter of 40% or less relative to a volume average particle diameter based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope in the presence of a silane coupling agent having a functional group chemically convertible to a sulfonic acid group; and a second reaction step of converting the functional group to a sulfonic acid group by treating the reactant.
    Type: Grant
    Filed: January 10, 2019
    Date of Patent: February 25, 2020
    Assignee: FUJIMI INCORPORATED
    Inventors: Keiji Ashitaka, Shogo Tsubota
  • Publication number: 20190309190
    Abstract: To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica. Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.
    Type: Application
    Filed: June 21, 2019
    Publication date: October 10, 2019
    Applicant: FUJIMI INCORPORATED
    Inventors: Keiji ASHITAKA, Shogo TSUBOTA
  • Publication number: 20190309191
    Abstract: To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica. Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.
    Type: Application
    Filed: June 21, 2019
    Publication date: October 10, 2019
    Applicant: FUJIMI INCORPORATED
    Inventors: Keiji ASHITAKA, Shogo TSUBOTA
  • Publication number: 20190144728
    Abstract: Disclosed herein is a polishing composition comprising a pH of 6 or less, sulfonic acid-modified colloidal silica obtained by immobilizing sulfonic acid on surfaces of silica particles, and water, wherein the sulfonic acid-modified colloidal silica is derived from sulfonic acid-modified aqueous anionic silica sol produced by a production method comprising: a first reaction step of obtaining a reactant by heating raw colloidal silica having a number distribution ratio of 10% or less of microparticles having a particle diameter of 40% or less relative to a volume average particle diameter based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope in the presence of a silane coupling agent having a functional group chemically convertible to a sulfonic acid group; and a second reaction step of converting the functional group to a sulfonic acid group by treating the reactant.
    Type: Application
    Filed: January 10, 2019
    Publication date: May 16, 2019
    Applicant: FUJIMI INCORPORATED
    Inventors: Keiji ASHITAKA, Shogo TSUBOTA
  • Publication number: 20170362465
    Abstract: To provide modified colloidal silica capable of improving the stability of the polishing speed with time when used as abrasive grains in a polishing composition for polishing a polishing object that contains a material to which charged modified colloidal silica easily adheres, such as a SiN wafer, and to provide a method for producing the modified colloidal silica. Modified colloidal silica, being obtained by modifying raw colloidal silica, wherein the raw colloidal silica has a number distribution ratio of 10% or less of microparticles having a particle size of 40% or less relative to a volume average particle size based on Heywood diameter (equivalent circle diameter) as determined by image analysis using a scanning electron microscope.
    Type: Application
    Filed: January 19, 2016
    Publication date: December 21, 2017
    Applicant: FUJIMI INCORPORATED
    Inventors: Keiji ASHITAKA, Shogo TSUBOTA