Abstract: A technology secures favorable appearance of an SiC member. The SiC member includes: an SiC substrate having a front face and a back face; and a first SiC coat provided on the front face of the SiC substrate. The SiC substrate has first polycrystalline layers and second polycrystalline layers stacked alternately across a plurality of layers as polycrystalline layers having film properties different from each other. At least one of the first polycrystalline layers and at least one of the second polycrystalline layers appear on the front face. The first SiC coat is a polycrystalline layer having the same film property as that of any one of the first polycrystalline layer and the second polycrystalline layer.