Abstract: A heterocyclic derivative of the formula (I) ##STR1## wherein each symbol is as defined in the specification, and pharmaceutically acceptable salts thereof. The compound (I) of the present invention and pharmaceutically acceptable salts thereof exhibit superior ACAT inhibitory activity and lipoperoxidation inhibitory activity in mammals, and are useful as ACAT inhibitors and lipoperoxidation inhibitors. Specifically, they are useful for the prophylaxis and treatment of arteriosclerosis, hyperlipemia, arteriosclerosis in diabetes, and cerebrovascular and cardiovascular ischemic diseases.

Abstract: A photosensitive resin composition for cast molding, which has an ultraviolet transmittance of 0.05-5% as measured at a 1-mm thickness.

Abstract: Heterocyclic derivatives of the formula (I) ##STR1## wherein each symbol is as defined in the specification, pharmaceutically acceptable salts thereof and method of producing them. Pharmaceutical compositions containing the heterocyclic derivative or a pharmaceutically acceptable salt thereof, particularly, ACAT inhibitors and lipoperoxidation inhibitors. The heterocyclic derivatives and pharmaceutically acceptable salts thereof of the present invention show superior ACAT inhibitory activity and lipoperoxidation inhibitory activity, and are useful as ACAT inhibitors and hyperlipemia inhibitors. To be specific, they are useful for the prevention and treatment of arteriosclerotic lesions of arteriosclerosis, hyperlipemia and diabetes, as well as ischemic diseases of brain, heart and the like.

Abstract: An imidazole derivative of the formula (I) ##STR1## wherein each symbol is as defined in the specification, or a pharmacologically acceptable salt thereof is described. A method for producing the compound or its salt, and its pharmaceutical use, particularly as an agent for the prophylaxis and treatment of the diseases induced by thromboxane A.sub.2 or histamine are described. Also, compounds of the formula (II) and (IV) ##STR2## wherein each symbol is as defined in the specification are described. The imidazole derivative and its parmacologically acceptable salt are useful as agents for the prophylaxis and treatment of the diseases induced by thromboxane A.sub.2 or histamine, and the intermediate compounds (II) and (IV) are novel compounds.

Abstract: A photoresin printing plate having a Shore A hardness at 20.degree. C. of 25 to 60, an impact resilience at 20.degree. C. of 35% or more as measured by a falling ball method and a surface tack at 20.degree. C. of 40 g/cm or less has been found not only to be capable of providing prints having an image of high precision but also to be capable of releasing the paper dust or the like, which has adhered to the printing plate, in a short period of time during the printing operation, so that it did not become necessary to interrupt the printing operation in order to clean the printing plate, which leads to an efficient production of the prints.

Abstract: Disclosed is a photosensitive elastomer composition comprising (1) a thermoplastic block copolymer comprising at least one monovinyl substituted aromatic hydrocarbon polymer block and at least one conjugated diene polymer block, wherein a monovinyl substituted aromatic hydrocarbon content (A) is 10 to 35% by weight, and the vinyl content (V) of a conjugated diene is 20 to 50%, and the (A) and the (V) satisfy the formula: 40.ltoreq.(A)+(V).ltoreq.70; (2) an ethylenically unsaturated compound component; and (3) a photopolymerization initiator.

Abstract: A method for producing a photocured image structure, comprising providing a selectively photocured elastomer composition layer having a photocured image portion and an uncured portion, and contacting the selectively photocured elastomer composition layer with a developer comprising a specific ester and optionally a specific alcohol in a specific volume ratio, to wash-out the uncured portion and develop the photocured image portion, thereby obtaining the photocured image structure. By this method, not only is the swelling of the image structure minimized but also the danger of relief breakage and orange peel formation is eliminated, so that an excellent photocured image structure can be produced by a simple operation.

Abstract: A mask element for selective sandblasting comprising a support film layer and, superimposed thereon in the following order, a retainer film layer of a water-insoluble cellulose derivative and a photoresist layer of a pattern mask, said photoresist layer of pattern mask being adapted to adhere to the surface of an article body to be engraved with a strength such that the mask is not detached therefrom during sandblasting. By the use of the mask element of the present invention, a pattern exactly corresponding to that of the mask, even if it is very fine, can be engraved on an article body nicely.

Abstract: The actinic radiation-exposed or unexposed areas, whichever are relatively low in abrasion resistance, formed in a photosensitive composition layer superimposed on a substrate are selectively removed by blowing an abrasive material against the layer, thereby to obtain a desired image in the layer. By utilizing an article body intended for engraving a pattern as the substrate and by further blowing an abrasive material against the article body until the article body comes to have a pattern of desired depth, a pattern-engraved article can be advantageously produced. The above processes are extremely advantageous over the prior art because any solvent is not needed for the development so that the treatment of the waste solvent and the drying step can be eliminated and because a pattern-engraved article can be produced by the dry process in which the number of necessary steps is reduced.

Abstract: A process for preparing a mask for sandblasting, in which there is employed a transparent soluble peel-aid film layer superimposed on a transparent protective film layer to cover a liquid photopolymerizable composition layer. According to the process, the protective film can be readily stripped and a mask for sandblasting which has a strong adherence to articles to be engraved can be produced efficiently without occurrence of troubles, such as chipping of high-precision portions, e.g. fine dots and lines, of polymeric images.

Abstract: A novel photosensitive elastomeric composition comprising a thermoplastic elastomer, an ethylenically unsaturated compound, a photopolymerization initiator and an N-substituted maleimide compound. The composition of the present invention is excellent in photosensitivity. The composition of the present invention is useful especially for the manufacture of flexographic printing elements.

Abstract: A novel photosensitive elastomeric composition comprising a thermoplastic elastomeric block copolymer, an ethylenically unsaturated compound derived from fumaric acid or maleic acid and a photopolymerization initiator. The composition of the present invention is excellent in various properties, especially in heat stability. The composition of the present invention is useful, especially for the manufacture of flexographic printing elements.