Abstract: A methanol production system of the present disclosure includes: a reformer including a reaction furnace configured to reform methane in a raw material gas to produce a reformed gas containing CO and H2; a reduced-gas generator configured to reduce CO2 to produce a reduced gas containing CO; and a methanol-containing gas generator configured to produce a methanol-containing gas which contains methanol from a reformed gas produced in the reaction furnace and a reduced gas produced in the reduced-gas generator.

Abstract: A methanol production system of the present disclosure includes: a reformer including a reaction furnace configured to reform methane in a raw material gas to produce a reformed gas containing CO and H2; a reduced-gas generator configured to reduce CO2 to produce a reduced gas containing CO; and a methanol-containing gas generator configured to produce a methanol-containing gas which contains methanol from a reformed gas produced in the reaction furnace and a reduced gas produced in the reduced-gas generator.

Abstract: The invention relates to a print making apparatus and provides a technique which makes it possible to achieve a generally high processing speed without depending upon enhancement of the processing speed of individual processing apparatus. A number of stations (S1 to S4) at least equal to the number of steps of a plate making procedure are arranged in order, and a plurality of processing apparatus (30 to 34) corresponding one by one to the steps of the plate making procedure are disposed in order of the plate making procedure at the stations (S1 to S4). A transport apparatus (11) successively transports a plurality of printing plates (1) from one to another one of the stations in order of the plate making procedure.

Abstract: According to the present invention, there is provided a polishing pad for polishing the surface of wafers for creating semiconductor integrated circuits, wherein said pad has a high polishing speed, said polishing is uniform, and said pad has a long life. Preferably, the polishing pad of the present invention comprises nonwoven fabric (base matrix) and a nonporous photo-setting resin that fills the space between the nonwoven fabric, and can be produced by impregnating the base matrix with a photo-sensitive resin composition containing at least one selected from the group consisting of a hydrophilic photopolymeric polymer or oligomer, and/or a hydrophilic photopolymeric monomer, and then photo-setting the same.

Abstract: The present invention relates to an imprinter unit, and is for the purpose of facilitating the plate replacement to reduce the work load. In an imprinter apparatus capable of replacing a portion of or all of a common pattern to be printed in a printer with a different pattern, there is provided a plate cylinder on which a press plate is mounted and a blanket cylinder to which a pattern on the press plate is transferred. The press plate is a gapless press plate having no joint.

Abstract: An offset press is equipped with a printer and a writable regenerative platemaker. The printer includes a plate cylinder on which a printing plate is fitted, and a transfer cylinder to which an image on the printing plate is transferred. The regenerative platemaker is formed integrally with the printer and is used to write the image to the printing plate. The printing plate is constructed of a gapless printing plate. The printing plate can be removed from and fitted on the plate cylinder by being moved along the axial direction of the plate cylinder.

Abstract: An offset press is equipped with a printer and a regenerative platemaker. The printer includes a plate cylinder on which a printing plate is fitted, and a transfer cylinder to which an image on the printing plate is transferred. The regenerative platemaker is arranged near the printer and is used to write the image to the printing plate.