Patents by Inventor Shoichi Saitoh
Shoichi Saitoh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20170102618Abstract: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 ?m or greater amount to a density of 30 particles/ml or less.Type: ApplicationFiled: December 21, 2016Publication date: April 13, 2017Applicant: FUJIFILM CorporationInventors: Keita KATO, Sou KAMIMURA, Yuichiro ENOMOTO, Kaoru IWATO, Shohei KATAOKA, Shoichi SAITOH
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Patent number: 9523913Abstract: A pattern forming method comprises (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin containing a repeating unit having a group capable of decomposing by the action of an acid to produce a polar group, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of a repeating unit represented by the following formula (I) is less than 20 mol % based on all repeating units in the resin (A) and the resin (A) contains a repeating unit having a non-phenolic aromatic group other than the repeating unit represented by the specific formula.Type: GrantFiled: December 2, 2013Date of Patent: December 20, 2016Assignee: FUJIFILM CorporationInventors: Keita Kato, Michihiro Shirakawa, Hidenori Takahashi, Shoichi Saitoh, Fumihiro Yoshino
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Patent number: 9482947Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.Type: GrantFiled: September 24, 2013Date of Patent: November 1, 2016Assignee: FUJIFILM CorporationInventors: Shuhei Yamaguchi, Hidenori Takahashi, Michihiro Shirakawa, Shohei Kataoka, Shoichi Saitoh, Fumihiro Yoshino
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Publication number: 20160291461Abstract: There are provided a pattern forming method in which, in self-organization lithography using a graphoepitaxy method, high miniaturization of patterns can be achieved with high quality and high efficiency by a pattern forming method including (i) a step of forming a block copolymer layer containing a specific first block copolymer or a specific second block copolymer on a specific substrate, (ii) a step of phase-separating the block copolymer layer, and (iii) a step of selectively removing at least one phase of a plurality of phases of the block copolymer layer, an electronic device manufacturing method using the pattern forming method and the electronic device, and a block copolymer used in the pattern forming method and the production method thereof.Type: ApplicationFiled: June 3, 2016Publication date: October 6, 2016Applicant: FUJIFILM CorporationInventors: Hayato YOSHIDA, Hiroo TAKIZAWA, Keizo KIMURA, Shoichi SAITOH, Eriko MITANI
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Patent number: 9316910Abstract: Provided is a pattern forming method that is excellent in roughness performance such as line width roughness and exposure latitude, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method. The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes 65 mol % or more of a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all repeating units in the resin and at least one kind of repeating unit represented by the following General Formula (I) or (II), (2) exposing the film, and (3) developing the exposed film using a developer that contains an organic solvent.Type: GrantFiled: February 27, 2012Date of Patent: April 19, 2016Assignee: FUJIFILM CorporationInventors: Shohei Kataoka, Hidenori Takahashi, Shuhei Yamaguchi, Shoichi Saitoh, Michihiro Shirakawa, Fumihiro Yoshino
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Publication number: 20150253662Abstract: According to an exemplary embodiment of the present invention, there is provided an actinic ray-sensitive or radiation-sensitive resin composition includes an aromatic group and a resin (A) that may include (i) a repeating unit having a group capable of decomposing by the action of an acid to generate a polar group and (ii) a repeating unit having a polar group other than a phenolic hydroxyl group, wherein the total content of the repeating units (i) and (ii) is 51 mol % or more based on the entire repeating units in the resin (A).Type: ApplicationFiled: May 26, 2015Publication date: September 10, 2015Applicant: FUJIFILM CORPORATIONInventors: Keita KATO, Michihiro SHIRAKAWA, Hidenori TAKAHASHI, Shoichi SAITOH, Fumihiro YOSHINO
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Patent number: 9120288Abstract: The pattern forming method of the invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit (a) represented by the following general formula (I), a compound (B) capable of generating an organic acid upon irradiation with actinic rays or radiation, and a nitrogen-containing organic compound (NA) having a group capable of leaving by the action of an acid, (ii) exposing the film, and (iii) developing the film after the exposure using a developer including an organic solvent to form a negative type pattern, in the general formula (I), R0 represents a hydrogen atom or a methyl group, and each of R1, R2, and R3 independently represents a linear or branched alkyl group.Type: GrantFiled: September 13, 2012Date of Patent: September 1, 2015Assignee: FUJIFILM CorporationInventors: Hidenori Takahashi, Shuhei Yamaguchi, Shohei Kataoka, Michihiro Shirakawa, Fumihiro Yoshino, Shoichi Saitoh
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Publication number: 20140299499Abstract: The refill lead case includes a case body provided with an opening portion, a lid attachment member attached to the opening portion of the case body, and a lid body attached to the lid attachment member in a slidable manner. The lid body is provided with a slide operation portion located at the front surface side of the lid attachment member and a bridge portion that is integrally molded with the slide operation portion, protrudes toward the rear surface side of the lid attachment member, and extends in the slide direction of the lid body. The bridge portion includes slope surfaces formed at the left and right sides while ridge lines are centered therebetween. When the lid body takes a downward posture, the refill leads accommodated in the case body are distributed inside the case body with respect to the ridge lines as a boundary.Type: ApplicationFiled: April 3, 2014Publication date: October 9, 2014Applicant: MITSUBISHI PENCIL COMPANY, LIMITEDInventor: Shoichi Saitoh
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Publication number: 20140234762Abstract: A pattern forming method including: a process of forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin including a Repeating Unit (a1) having a group capable of being decomposed by acid and generating a carboxyl group, and a compound capable of generating acid through irradiation of actinic rays or radiation; a process of exposing the film; and a process of developing the exposed film using a developer including an organic solvent to form a negative tone pattern, wherein the value X obtained by substituting the number of each atom included in the Repeating Unit (a1) after being decomposed by acid and generating a carboxyl group in the following formula is 0<X?5.Type: ApplicationFiled: May 8, 2014Publication date: August 21, 2014Applicant: FUJIFILM CorporationInventors: Shuhei YAMAGUCHI, Hidenori TAKAHASHI, Michihiro SHIRAKAWA, Shohei KATAOKA, Shoichi SAITOH, Fumihiro YOSHINO
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Publication number: 20140127629Abstract: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 ?m or greater amount to a density of 30 particles/ml or less.Type: ApplicationFiled: January 13, 2014Publication date: May 8, 2014Applicant: FUJIFILM CorporationInventors: Keita KATO, Sou KAMIMURA, Yuichiro ENOMOTO, Kaoru IWATO, Shohei KATAOKA, Shoichi SAITOH
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Publication number: 20140087310Abstract: A pattern forming method comprises (i) a step of forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing: (A) a resin containing a repeating unit having a group capable of decomposing by the action of an acid to produce a polar group, (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation, and (C) a solvent, (ii) a step of exposing the film, and (iii) a step of developing the exposed film by using an organic solvent-containing developer to form a negative pattern, wherein the content of a repeating unit represented by the following formula (I) is less than 20 mol % based on all repeating units in the resin (A) and the resin (A) contains a repeating unit having a non-phenolic aromatic group other than the repeating unit represented by the specific formula.Type: ApplicationFiled: December 2, 2013Publication date: March 27, 2014Applicant: FUJIFILM CorporationInventors: Keita KATO, Michihiro SHIRAKAWA, Hidenori TAKAHASHI, Shoichi SAITOH, Fumihiro YOSHINO
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Patent number: 8663907Abstract: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 ?m or greater amount to a density of 30 particles/ml or less.Type: GrantFiled: August 24, 2011Date of Patent: March 4, 2014Assignee: FUJIFILM CorporationInventors: Keita Kato, Sou Kamimura, Yuichiro Enomoto, Kaoru Iwato, Shohei Kataoka, Shoichi Saitoh
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Publication number: 20140045117Abstract: A pattern forming method, includes: (i) a step of forming a film from an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a1) a repeating unit capable of decomposing by an action of an acid to produce a carboxyl group, represented by the following formula (I) as defined in the specification and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film; and (iii) a step of performing a development by using a developer containing an organic solvent to form a negative pattern.Type: ApplicationFiled: September 24, 2013Publication date: February 13, 2014Applicant: FUJIFILM CorporationInventors: Shuhei YAMAGUCHI, Hidenori TAKAHASHI, Michihiro SHIRAKAWA, Shohei KATAOKA, Shoichi SAITOH, Fumihiro YOSHINO
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Publication number: 20140011134Abstract: A pattern forming method contains (i) a step of forming a film by an actinic ray-sensitive or radiation-sensitive resin composition containing (P) a resin having (a) a repeating unit represented by the specific formula, and (B) a compound capable of generating an organic acid upon irradiation with an actinic ray or radiation; (ii) a step of exposing the film, and (iii) a step of developing the film by using an organic solvent-containing developer to form a negative pattern.Type: ApplicationFiled: August 28, 2013Publication date: January 9, 2014Applicant: FUJIFILM CORPORATIONInventors: Hidenori TAKAHASHI, Shuhei YAMAGUCHI, Shohei KATAOKA, Michihiro SHIRAKAWA, Fumihiro YOSHINO, Shoichi SAITOH
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Publication number: 20130078432Abstract: The pattern forming method of the invention includes (i) forming a film using an actinic ray-sensitive or radiation-sensitive resin composition containing a resin (P) having a repeating unit (a) represented by the following general formula (I), a compound (B) capable of generating an organic acid upon irradiation with actinic rays or radiation, and a nitrogen-containing organic compound (NA) having a group capable of leaving by the action of an acid, (ii) exposing the film, and (iii) developing the film after the exposure using a developer including an organic solvent to form a negative type pattern, in the general formula (I), R0 represents a hydrogen atom or a methyl group, and each of R1, R2, and R3 independently represents a linear or branched alkyl group.Type: ApplicationFiled: September 13, 2012Publication date: March 28, 2013Applicant: FUJIFILM CORPORATIONInventors: Hidenori TAKAHASHI, Shuhei YAMAGUCHI, Shohei KATAOKA, Michihiro SHIRAKAWA, Fumihiro YOSHINO, Shoichi SAITOH
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Publication number: 20120219913Abstract: Provided is a pattern forming method that is excellent in roughness performance such as line width roughness and exposure latitude, and an actinic-ray-sensitive or radiation-sensitive resin composition and a resist film used for the pattern forming method. The pattern forming method includes (1) forming a film using an actinic-ray-sensitive or radiation-sensitive resin composition containing a resin that includes 65 mol % or more of a repeating unit having a group which generates a polar group by being degraded by the action of an acid based on all repeating units in the resin and at least one kind of repeating unit represented by the following General Formula (I) or (II), (2) exposing the film, and (3) developing the exposed film using a developer that contains an organic solvent.Type: ApplicationFiled: February 27, 2012Publication date: August 30, 2012Applicant: FUJIFILM CORPORATIONInventors: Shohei KATAOKA, Hidenori TAKAHASHI, Shuhei YAMAGUCHI, Shoichi SAITOH, Michihiro SHIRAKAWA, Fumihiro YOSHINO
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Publication number: 20120052449Abstract: Provided is a method of forming pattern including (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) developing the exposed film with a developer containing a first organic solvent, wherein in the developer, particles each having a diameter of 0.3 ?m or greater amount to a density of 30 particles/ml or less.Type: ApplicationFiled: August 24, 2011Publication date: March 1, 2012Applicant: FUJIFILM CORPORATIONInventors: Keita KATO, Sou KAMIMURA, Yuichiro ENOMOTO, Kaoru IWATO, Shohei KATAOKA, Shoichi SAITOH
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Publication number: 20120028196Abstract: An embodiment of the method of forming a pattern, comprises (a) forming a chemically amplified resist composition into a film, (b) exposing the film to light, and (c) processing the exposed film with an organic processing liquid, wherein the processing liquid contains an organic solvent whose normal boiling point is 175° C. or higher, the organic solvent being contained in the processing liquid in a content of less than 30 mass %.Type: ApplicationFiled: July 27, 2011Publication date: February 2, 2012Applicant: FUJIFILM CORPORATIONInventors: Sou KAMIMURA, Kaoru IWATO, Yuichiro ENOMOTO, Shohei KATAOKA, Keita KATO, Shoichi SAITOH
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Patent number: D350125Type: GrantFiled: October 15, 1992Date of Patent: August 30, 1994Assignee: Sento KreiInventor: Shoichi Saitoh