Patents by Inventor Shoichi Terada

Shoichi Terada has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210284930
    Abstract: A cleaning composition which can remove a layer of interest using a conventional apparatus, such as a coater, a baking furnace and a cleaning chamber, installed in semiconductor manufacturing equipment while preventing the damage or deformation of layers other than the layer of interest, such as a substrate and an interlayer insulation film; a cleaning method using the cleaning composition; and a method for producing a semiconductor employing the cleaning method. A layer of interest formed on a substrate is cleaned with a cleaning composition containing a component capable of decomposing the layer of interest and a film-forming polymer. An example of the layer of interest is a hard mask film. An example of the component is at least one of a basic compound and an acidic compound.
    Type: Application
    Filed: September 22, 2017
    Publication date: September 16, 2021
    Inventors: Isao HIRANO, Kazumasa WAKIYA, Shoichi TERADA, Junji NAKAMURA, Takayuki TOSHIMA
  • Publication number: 20200098593
    Abstract: A washing method, a washing device, a storage medium, and a washing composition for enabling effective removal of a layer to be processed by decomposing or degenerating the layer to be processed at a higher temperature than conventionally. In a state where a substrate provided with a layer to be processed is heated, the substrate is supplied with vapor of a component that can decompose the layer to be processed, and thereafter the layer to be processed that has reacted with the component is removed from the substrate. As the component, a nitric acid or a sulfonic acid is preferable. As the sulfonic acid, a fluorinated alkyl sulfonic acid is preferable.
    Type: Application
    Filed: February 2, 2018
    Publication date: March 26, 2020
    Inventors: Isao HIRANO, Shoichi TERADA, Junji NAKAMURA, Takayuki TOSHIMA
  • Patent number: 10591823
    Abstract: A substrate processing apparatus includes a hot plate which supports and heats a substrate, a light source which emits etching energy beam such that the etching energy beam etches the substrate held by the hot plate, a window device which is positioned between the light source and the hot plate and transmits the etching energy beam emitted by the light source toward the substrate, and an adjusting device which adjusts emission amounts of the etching energy beam from portions of the window device toward the substrate such that the adjusting device reduces difference in etching amounts of portions of the substrate.
    Type: Grant
    Filed: December 18, 2015
    Date of Patent: March 17, 2020
    Assignee: TOKYO ELECTRON LIMITED
    Inventors: Keisuke Yoshida, Yuzo Ohishi, Keisuke Sasaki, Shoichi Terada
  • Publication number: 20190279861
    Abstract: The present disclosure relates to a processing liquid supplying unit configured to supply a processing liquid that contains a removing agent of an adhered substance and a solvent having a boiling point lower than a boiling point of the removing agent to a substrate, a substrate heating unit configured to subsequently heat the substrate at a predetermined temperature that is equal to or higher than the boiling point of the solvent in the processing liquid and is lower than the boiling point of the removing agent, and a rinsing liquid supplying unit configured to subsequently supply a rinsing liquid to the substrate so as to remove the adhered substance from the substrate.
    Type: Application
    Filed: May 23, 2019
    Publication date: September 12, 2019
    Inventors: Takayuki Toshima, Shoichi Terada, Junji Nakamura
  • Patent number: 10347482
    Abstract: The present disclosure relates to a processing liquid supplying unit configured to supply a processing liquid that contains a removing agent of an adhered substance and a solvent having a boiling point lower than a boiling point of the removing agent to a substrate, a substrate heating unit configured to subsequently heat the substrate at a predetermined temperature that is equal to or higher than the boiling point of the solvent in the processing liquid and is lower than the boiling point of the removing agent, and a rinsing liquid supplying unit configured to subsequently supply a rinsing liquid to the substrate so as to remove the adhered substance from the substrate.
    Type: Grant
    Filed: July 27, 2017
    Date of Patent: July 9, 2019
    Assignee: Tokyo Electron Limited
    Inventors: Takayuki Toshima, Shoichi Terada, Junji Nakamura
  • Patent number: 10237959
    Abstract: A discharge lamp lighting device includes a control unit adapted to control a frequency of the AC electric current supplied to a discharge lamp by a feeding unit, in different manners within a first term and a second term which are alternately repeated, the control unit is adapted to control the frequency of the AC electric current such that, within the first term, the frequency of the AC electric current becomes at least one frequency out of plural set frequencies, and is further adapted to control the frequency of the AC electric current, based on a predetermined frequency and an electric current within the previous first term, such that, within the second term, the frequency of the AC electric current becomes a frequency lower than this predetermined frequency.
    Type: Grant
    Filed: October 16, 2018
    Date of Patent: March 19, 2019
    Assignee: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Kosuke Saka, Minoru Fukuda, Shigeyoshi Matsumoto, Shoichi Terada
  • Publication number: 20190053361
    Abstract: A discharge lamp lighting device includes a control unit adapted to control a frequency of the AC electric current supplied to a discharge lamp by a feeding unit, in different manners within a first term and a second term which are alternately repeated, the control unit is adapted to control the frequency of the AC electric current such that, within the first term, the frequency of the AC electric current becomes at least one frequency out of plural set frequencies, and is further adapted to control the frequency of the AC electric current, based on a predetermined frequency and an electric current within the previous first term, such that, within the second term, the frequency of the AC electric current becomes a frequency lower than this predetermined frequency.
    Type: Application
    Filed: October 16, 2018
    Publication date: February 14, 2019
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Kosuke SAKA, Minoru FUKUDA, Shigeyoshi MATSUMOTO, Shoichi TERADA
  • Publication number: 20180040468
    Abstract: The present disclosure relates to a processing liquid supplying unit configured to supply a processing liquid that contains a removing agent of an adhered substance and a solvent having a boiling point lower than a boiling point of the removing agent to a substrate, a substrate heating unit configured to subsequently heat the substrate at a predetermined temperature that is equal to or higher than the boiling point of the solvent in the processing liquid and is lower than the boiling point of the removing agent, and a rinsing liquid supplying unit configured to subsequently supply a rinsing liquid to the substrate so as to remove the adhered substance from the substrate.
    Type: Application
    Filed: July 27, 2017
    Publication date: February 8, 2018
    Inventors: Takayuki Toshima, Shoichi Terada, Junji Nakamura
  • Patent number: 9744551
    Abstract: Disclosed is a coating apparatus capable of enhancing the film thickness uniformity. The coating apparatus includes a nozzle and a moving mechanism. The nozzle includes a storage chamber that stores a coating liquid and a slit-like flow path that is in communication with the storage chamber, and discharges the coating liquid through a discharge port formed at a front end of the flow path. The moving mechanism moves the nozzle and the substrate relatively to each other along a surface of the substrate. Also, in the flow path provided in the nozzle, flow resistance at the central portion in the longitudinal direction is larger than that at both end portions in the longitudinal direction.
    Type: Grant
    Filed: June 18, 2013
    Date of Patent: August 29, 2017
    Assignee: Tokyo Electron Limited
    Inventors: Takayuki Ishii, Takahiro Sakamoto, Takahiro Kitano, Shoichi Terada
  • Publication number: 20170231074
    Abstract: A discharge lamp lighting device includes a control unit adapted to control a frequency of the AC electric current supplied to a discharge lamp by a feeding unit, in different manners within a first term and a second term which are alternately repeated, the control unit is adapted to control the frequency of the AC electric current such that, within the first term, the frequency of the AC electric current becomes at least one frequency out of plural set frequencies, and is further adapted to control the frequency of the AC electric current, based on a predetermined frequency and an electric current within the previous first term, such that, within the second term, the frequency of the AC electric current becomes a frequency lower than this predetermined frequency.
    Type: Application
    Filed: August 5, 2015
    Publication date: August 10, 2017
    Applicant: USHIO DENKI KABUSHIKI KAISHA
    Inventors: Kosuke SAKA, Minoru FUKUDA, Shigeyoshi MATSUMOTO, Shoichi TERADA
  • Publication number: 20160181133
    Abstract: A substrate processing apparatus includes a hot plate which supports and heats a substrate, a light source which emits etching energy beam such that the etching energy beam etches the substrate held by the hot plate, a window device which is positioned between the light source and the hot plate and transmits the etching energy beam emitted by the light source toward the substrate, and an adjusting device which adjusts emission amounts of the etching energy beam from portions of the window device toward the substrate such that the adjusting device reduces difference in etching amounts of portions of the substrate.
    Type: Application
    Filed: December 18, 2015
    Publication date: June 23, 2016
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Keisuke YOSHIDA, Yuzo OHISHI, Keisuke SASAKI, Shoichi TERADA
  • Patent number: 8888920
    Abstract: The present invention is an imprint system including an imprint unit transferring a transfer pattern to a coating film formed on a substrate using a template having the transfer pattern formed on a front surface thereof to form a predetermined pattern in the coating film, the imprint system including: a substrate carry-in/out station connected to the imprint unit, capable of keeping a plurality of the substrates, and carrying the substrate into/out of the imprint unit side; and a template carry-in/out station connected to the imprint unit, capable of keeping a plurality of the templates, and carrying the template into/out of the imprint unit side at a predetermined timing.
    Type: Grant
    Filed: June 11, 2010
    Date of Patent: November 18, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Shoichi Terada, Yoshio Kimura, Takahiro Kitano
  • Patent number: 8840728
    Abstract: The present invention is a template treatment apparatus forming a film of a release agent on a template having a transfer pattern formed on a front surface thereof, the template treatment apparatus including: a treatment station forming a film of a release agent on the front surface of the template; and a template carry-in/out station capable of keeping a plurality of the templates, and carrying the template into/out of the treatment station, wherein the treatment station includes: a cleaning unit cleaning the front surface of the template; a coating unit applying a release agent to the cleaned front surface of the template; a heating unit baking the applied release agent; and a carry unit carrying the template to the cleaning unit, the coating unit, and the heating unit.
    Type: Grant
    Filed: June 21, 2010
    Date of Patent: September 23, 2014
    Assignee: Tokyo Electron Limited
    Inventors: Shoichi Terada, Yoshio Kimura, Takahiro Kitano
  • Publication number: 20140000517
    Abstract: Disclosed is a coating apparatus capable of enhancing the film thickness uniformity. The coating apparatus includes a nozzle and a moving mechanism. The nozzle includes a storage chamber that stores a coating liquid and a slit-like flow path that is in communication with the storage chamber, and discharges the coating liquid through a discharge port formed at a front end of the flow path. The moving mechanism moves the nozzle and the substrate relatively to each other along a surface of the substrate. Also, in the flow path provided in the nozzle, flow resistance at the central portion in the longitudinal direction is larger than that at both end portions in the longitudinal direction.
    Type: Application
    Filed: June 18, 2013
    Publication date: January 2, 2014
    Inventors: Takayuki Ishii, Takahiro Sakamoto, Takahiro Kitano, Shoichi Terada
  • Patent number: 8522712
    Abstract: In a template treatment of forming a film of a release agent on a treatment surface of a template, the treatment surface of the template is first cleaned. Thereafter, in a coating unit, the release agent is applied to the treatment surface of the template. The release agent on the template is then dried. Then, alcohol is applied to the release agent on the template to make the release agent adhere to the treatment surface of the template and to remove an unreacted portion of the release agent. Thereafter, the alcohol on the template is dried and removed. In this manner, a film of the release agent is formed in a predetermined film thickness on the treatment surface of the template.
    Type: Grant
    Filed: November 10, 2010
    Date of Patent: September 3, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Koukichi Hiroshiro, Takanori Nishi, Takahiro Kitano, Shoichi Terada
  • Patent number: 8468943
    Abstract: The present invention provides a method for applying an application liquid between a template and a substrate, and transferring the transfer pattern onto the application liquid. The template is inclinedly arranged with respect to the substrate in a manner that a first distance between a first end portion of the template and the substrate is a distance that causes a capillary action of the application liquid to occur, and a second distance between a second end portion of the template that opposes the first end portion and the substrate is a distance that does not cause the capillary action of the application liquid to occur. Thereafter, the application liquid is supplied from an outer side of the first end portion to the first end portion. Thereafter, the second end portion and the substrate are relatively moved so that the second distance becomes equal to the first distance.
    Type: Grant
    Filed: August 25, 2010
    Date of Patent: June 25, 2013
    Assignee: Tokyo Electron Limited
    Inventors: Koukichi Hiroshiro, Takanori Nishi, Shoichi Terada, Takahiro Kitano
  • Patent number: 8410697
    Abstract: A light source device which can also advantageously control the growth of the projection using the DMD type is achieved in a light source device which has an ultrahigh pressure discharge lamp) in which the silica glass discharge vessel is filled with greater than or equal to 0.15 mg/mm3 mercury and bromine; a feed device; an oval reflector; and a color wheel by the electrode on the side of the opening of the oval reflector of the discharge lamp having an increased diameter, and the relation 0.06<W/I2<0.96 between the volume W (mm3) of the tip area with increased diameter and the current value I being satisfied.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: April 2, 2013
    Assignee: Ushiodenki Kabushiki Kaisha
    Inventors: Kazuhiro Goto, Akihiko Sugitani, Shoichi Terada, Takahiro Toma
  • Publication number: 20120152136
    Abstract: The present invention provides a method for applying an application liquid between a template and a substrate, and transferring the transfer pattern onto the application liquid. The template is inclinedly arranged with respect to the substrate in a manner that a first distance between a first end portion of the template and the substrate is a distance that causes a capillary action of the application liquid to occur, and a second distance between a second end portion of the template that opposes the first end portion and the substrate is a distance that does not cause the capillary action of the application liquid to occur. Thereafter, the application liquid is supplied from an outer side of the first end portion to the first end portion. Thereafter, the second end portion and the substrate are relatively moved so that the second distance becomes equal to the first distance.
    Type: Application
    Filed: August 25, 2010
    Publication date: June 21, 2012
    Applicant: Tokyo Electron Limited
    Inventors: Koukichi Hiroshiro, Takanori Nishi, Shoichi Terada, Takahiro Kitano
  • Publication number: 20120097336
    Abstract: The present invention is a template treatment apparatus forming a film of a release agent on a template having a transfer pattern formed on a front surface thereof, the template treatment apparatus including: a treatment station forming a film of a release agent on the front surface of the template; and a template carry-in/out station capable of keeping a plurality of the templates, and carrying the template into/out of the treatment station, wherein the treatment station includes: a cleaning unit cleaning the front surface of the template; a coating unit applying a release agent to the cleaned front surface of the template; a heating unit baking the applied release agent; and a carry unit carrying the template to the cleaning unit, the coating unit, and the heating unit.
    Type: Application
    Filed: June 21, 2010
    Publication date: April 26, 2012
    Applicant: TOKYO ELECTRON LIMITED
    Inventors: Shoichi Terada, Yoshio Kimura, Takahiro Kitano
  • Publication number: 20120086142
    Abstract: The present invention is a system including: an imprint unit transferring a transfer pattern to a coating film on a substrate using a template to form a predetermined pattern in the coating film; a treatment station connected to the imprint unit and performing a predetermined treatment on the template; a template carry-in/out station connected to the treatment station, capable of keeping templates, and carrying the template in/out from/to the treatment station; a carry line provided through the imprint unit and carrying the template between the imprint unit and the treatment station; and a substrate carry-in/out station connected to the imprint unit, capable of keeping substrates, and carrying the substrate in/out from/to the imprint unit.
    Type: Application
    Filed: June 21, 2010
    Publication date: April 12, 2012
    Applicant: Tokyo Electron Limited
    Inventors: Shoichi Terada, Yoshio Kimura, Takahiro Kitano