Patents by Inventor Shoichi Uchino

Shoichi Uchino has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090201443
    Abstract: A liquid crystal display device preventing a liquid crystal display panel from damage by bending of a light-transmissive substrate and capable of curving a display surface of the panel is provided. The liquid crystal display device comprising: a liquid crystal display panel having a liquid crystal layer sealed between a pair of light-transmissive substrates having pixel formation electrodes on inner surfaces thereof, and formed by assembling positive and negative curved surfaces with respect to one direction; a backlight mounted on a rear surface of the panel along a curved shape of the panel and having at least one light emission device irradiating illumination light toward the rear surface; and a resin member held in a space between peripheral portions where the panel is opposed to the backlight, and fixing and holding a curved state, is provided. Distortion of the light transmissive glass substrates by bending of the panel is eased.
    Type: Application
    Filed: August 7, 2008
    Publication date: August 13, 2009
    Inventors: Susumu Sasaki, Hitoshi Azuma, Takao Ebine, Tomio Yaguchi, Shoichi Uchino, Akiko Iwata
  • Patent number: 7553208
    Abstract: A manufacturing method of organic electroluminescence display device according to the present invention performs (1) a first step for forming a non-affinity region in a surface of an anode provided in each of pixels arranged on a glass substrate by exposing the glass substrate in a saturated vapor pressure of an organic solvent, (2) a second step for forming an affinity region in a central portion of the anode surface spaced from its edges by irradiating the central portion of the anode surface with ultraviolet light, and (3) a third step for forming polymer material layers which constitute an organic electroluminescent element in the each of the pixels in the affinity region by blowing off polymer material solutions onto the affinity region of the anode in the each of the pixels, in this order, to simplify entire steps in, to reduce cost for, and to improve productivity of the manufacturing process of the organic electroluminescence display device thereby.
    Type: Grant
    Filed: December 15, 2006
    Date of Patent: June 30, 2009
    Assignee: Hitachi Displays, Ltd.
    Inventors: Akiko Yasukawa, Shoichi Uchino, Emiko Yamada, Nobuaki Hayashi
  • Publication number: 20090051640
    Abstract: A flexible display device bendable in a certain direction is realized. R, G, and B pixels are arranged in a mosaic pattern. The display is bendable in a first direction, but is not assumed to be bent in a second direction. A data line extends in the first direction and a select line extends in the second direction. In order to prevent accumulation of distortion in the data line and breakage of the data line when the display is bent in the first direction, the data line is formed into a crank shape. Accordingly, even when the display is bent, an amount of distortion accumulated in the data line corresponds to only a length thereof in the first direction, and therefore, the distortion can be reduced. As a result, breakage of a wire in a flexible display can be prevented.
    Type: Application
    Filed: August 21, 2008
    Publication date: February 26, 2009
    Inventors: Masahiro Tanaka, Hitoshi Azuma, Shoichi Uchino, Tomio Yaguchi, Akiko Iwata
  • Publication number: 20090045752
    Abstract: The invention provides a display device which can reduce breaking of a TFT substrate at the time of connecting a wiring member to the TFT substrate after decreasing a thickness of the TFT substrate and a manufacturing method of the display device. A TFT substrate and a counter substrate are adhered to each other to form a display panel. After connecting a wiring member to a line connection portion of the display panel, a portion of the display panel to be etched is masked. An etching protective film formed of an organic film is applied to the masked display panel by coating. Thereafter, a mask is peeled off together with the etching protective film formed on the mask and the display panel is immersed in an etchant thus polishing an exposed surface of a glass substrate to a predetermined thickness. Thereafter, a chemical polishing protective film formed on a wiring member is removed.
    Type: Application
    Filed: August 12, 2008
    Publication date: February 19, 2009
    Inventors: Hitoshi AZUMA, Susumu SASAKI, Takao EBINE, Tomio YAGUCHI, Shoichi UCHINO, Akiko IWATA
  • Publication number: 20070279347
    Abstract: The present invention enhances the repeatability of a low gray scale display of an image display device which uses oil layers. The enhancement of the repeatability of a low gray scale display can be realized by an image display device which includes a first insulation layer, a second insulation layer, a first oil layer which is arranged between the first insulation layer and the second insulation layer and, at the same time, is provided on a first insulation layer side, a second oil layer which is arranged between the first insulation layer and the second insulation layer and, at the same time, is provided on a second insulation layer side, first electrodes which are arranged outside the first insulation layer, and second electrodes which are arranged outside the second insulation layer.
    Type: Application
    Filed: May 22, 2007
    Publication date: December 6, 2007
    Inventors: Takahiko Muneyoshi, Nobuaki Hayashi, Shoichi Uchino, Tomio Yaguchi, Akiko Iwata
  • Publication number: 20070172979
    Abstract: The present invention relates to a manufacturing method which uses an ink jet method for forming various kinds of thin films in an electronic device such as an organic EL panel or an organic thin film transistor and ink suitably used in the method. The manufacturing method manufactures an electronic device such as an organic layer which forms a pixel portion of a hole injection layer or the like of an organic EL panel or an active layer of an organic thin film transistor using ink composition which is formed by adding tertiary-alcohol into ink which uses water as a main solvent. As the tertiary-alcohol, 3-methyl-1-butyn-3-ol may be used. An addition quantity of alcohol with respect to ink is set to a value which falls within a range from approximately 25wt % to 40wt %.
    Type: Application
    Filed: January 19, 2007
    Publication date: July 26, 2007
    Inventors: Shoichi Uchino, Akiko Iwata, Yoshihiro Arai, Hitoshi Azuma, Tomio Yaguchi
  • Publication number: 20070145902
    Abstract: In an image display apparatus using an FED or an organic EL element, image display that is high in illumination uniformity and high in image quality can be performed. A display element with a matrix structure which conducts linear sequential driving which determines the luminance by a current is used, a threshold voltage of a cathode line immediately before one select period has been terminated where a control electrode line is sequentially driven is measured by a threshold voltage measuring section, the measured threshold voltage is recorded for each of the pixels, and a driving signal at the time of selecting the pixel is corrected by using the value of the recorded threshold voltage, to thereby control electric charge that is emitted from a cathode.
    Type: Application
    Filed: October 24, 2006
    Publication date: June 28, 2007
    Inventors: Tomio Yaguchi, Kiyoshige Kinugawa, Shigeyuki Nishitani, Takahiko Muneyoshi, Susumu Sasaki, Shoichi Uchino, Akiko Iwata, Makoto Okai, Tetsuya Yamazaki, Nobuaki Hayashi
  • Publication number: 20070087646
    Abstract: A manufacturing method of organic electroluminescence display device according to the present invention performs (1) a first step for forming a non-affinity region in a surface of an anode provided in each of pixels arranged on a glass substrate by exposing the glass substrate in a saturated vapor pressure of an organic solvent, (2) a second step for forming an affinity region in a central portion of the anode surface spaced from its edges by irradiating the central portion of the anode surface with ultraviolet light, and (3) a third step for forming polymer material layers which constitute an organic electroluminescent element in the each of the pixels in the affinity region by blowing off polymer material solutions onto the affinity region of the anode in the each of the pixels, in this order, to simplify entire steps in, to reduce cost for, and to improve productivity of the manufacturing process of the organic electroluminescence display device thereby.
    Type: Application
    Filed: December 15, 2006
    Publication date: April 19, 2007
    Inventors: Akiko Yasukawa, Shoichi Uchino, Emiko Yamada, Nobuaki Hayashi
  • Publication number: 20060045959
    Abstract: The present invention provides a method which can form a uniform amorphous film using an organic low molecular weight material which is refined by distillation or sublimation. The viscosity of ink is regulated by mixing two kinds of solvents so as to increase a surface tension of the ink and the solubility of the organic material in a drying step whereby an amorphous film made of an organic material is selectively formed in a recessed region defined by a partition wall layer using an ink jet method.
    Type: Application
    Filed: August 22, 2005
    Publication date: March 2, 2006
    Inventors: Akiko Yasukawa, Shoichi Uchino, Yoshihiro Arai, Masahiro Tanaka, Masato Ito, Tomio Yaguchi
  • Publication number: 20050003567
    Abstract: A method of manufacture of an organic electroluminescence display device includes (1) a first step of forming a non-affinity region in a surface of an anode provided in each of the pixels arranged on a glass substrate by exposing the glass substrate in a saturated vapor pressure of an organic solvent, (2) a second step of forming an affinity region in a central portion of the anode surface spaced from its edges by irradiating the central portion of the anode surface with ultraviolet light, and (3) a third step of forming polymer material layers which constitute an organic electroluminescent element in each of the pixels in the affinity region by blowing off polymer material solutions onto the affinity region of the anode in the each of the pixels. In this way, it is possible to simplify the steps in, to reduce the cost for, and to improve the productivity of the process of manufacture of the organic electroluminescence display device.
    Type: Application
    Filed: May 25, 2004
    Publication date: January 6, 2005
    Inventors: Akiko Yasukawa, Shoichi Uchino, Emiko Yamada, Nobuaki Hayashi
  • Patent number: 6555295
    Abstract: A very high reflection prevention effect can be produced for a variety of kinds of substrates, including those having transparent films and those having high reflectivity like metallic films, without posing any problem, such as aspect ratios, during the process of forming anti-reflective films This method can form fine and precise resist patterns and therefore improve the yield and reliability of devices to be manufactured. When applied to logic LSIs, this invention enables them to be manufactured at high dimensional precision and increases their operation speeds. While we have shown and described several embodiments in accordance with the present invention, it is understood that the same is not limited thereto, but is susceptible to numerous changes and modifications as is known in the art; and we therefore do not wish to be limited to the details shown and described herein, but intend to cover all such modifications as are encompassed by the scope of the appended claims.
    Type: Grant
    Filed: August 28, 2002
    Date of Patent: April 29, 2003
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 6461776
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.
    Type: Grant
    Filed: January 25, 2002
    Date of Patent: October 8, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Publication number: 20020136970
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.
    Type: Application
    Filed: January 25, 2002
    Publication date: September 26, 2002
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 6355400
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem caused by halation and interference phenomena due to reflected light from the substrate. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper interference film for the exposure light and a lower film having higher exposure light absorbance than the upper film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower film that reflects exposure light and an upper film that is an interference film for the exposure light.
    Type: Grant
    Filed: May 7, 2001
    Date of Patent: March 12, 2002
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 6255036
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: September 18, 2000
    Date of Patent: July 3, 2001
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 6162588
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: November 15, 1999
    Date of Patent: December 19, 2000
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5985517
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: April 1, 1999
    Date of Patent: November 16, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5935765
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film.
    Type: Grant
    Filed: September 24, 1998
    Date of Patent: August 10, 1999
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5846693
    Abstract: Disclosed are methods for forming a resist pattern which solve a problem (dimensional precision degradation) caused by halation and interference phenomena due to reflected light from the substrate, and which are fine and have high precision even with substrates having high reflectivity or substrates having a transparent film or substrates with an uneven surface. A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film. A third method.
    Type: Grant
    Filed: February 10, 1998
    Date of Patent: December 8, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai
  • Patent number: 5733712
    Abstract: A first method forms between the substrate and resist film an anti-reflective film whose photoabsorbance of the exposure light is greater on the substrate surface side than on the resist surface side. A second method forms between the substrate and resist film a two-layer anti-reflective film made up of an upper-layer film which is an interference film for the exposure light and a lower-layer film which has higher exposure light absorbance than the upper-layer film and functions as a light shielding film. A third method forms between the substrate and resist film a two-layer anti-reflective film consisting of a lower-layer film that reflects the exposure light and an upper-layer film that is an interference film for the exposure light. A very high anti-reflection effect can be obtained without aspect ratio problems during the process of forming the anti-reflective film and without being influenced by the kind of substrate including those having a transparent film.
    Type: Grant
    Filed: February 16, 1996
    Date of Patent: March 31, 1998
    Assignee: Hitachi, Ltd.
    Inventors: Toshihiko Tanaka, Shoichi Uchino, Naoko Asai